DE69901282D1 - Lichtempfindliche Flachdruckplatte - Google Patents

Lichtempfindliche Flachdruckplatte

Info

Publication number
DE69901282D1
DE69901282D1 DE69901282T DE69901282T DE69901282D1 DE 69901282 D1 DE69901282 D1 DE 69901282D1 DE 69901282 T DE69901282 T DE 69901282T DE 69901282 T DE69901282 T DE 69901282T DE 69901282 D1 DE69901282 D1 DE 69901282D1
Authority
DE
Germany
Prior art keywords
printing plate
planographic printing
photosensitive planographic
photosensitive
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69901282T
Other languages
English (en)
Other versions
DE69901282T2 (de
Inventor
Kazuo Fujita
Koichi Kawamura
Noriaki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69901282D1 publication Critical patent/DE69901282D1/de
Application granted granted Critical
Publication of DE69901282T2 publication Critical patent/DE69901282T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
DE1999601282 1998-12-16 1999-12-16 Lichtempfindliche Flachdruckplatte Expired - Lifetime DE69901282T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35736298A JP2000181053A (ja) 1998-12-16 1998-12-16 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69901282D1 true DE69901282D1 (de) 2002-05-23
DE69901282T2 DE69901282T2 (de) 2002-10-31

Family

ID=18453752

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1999601282 Expired - Lifetime DE69901282T2 (de) 1998-12-16 1999-12-16 Lichtempfindliche Flachdruckplatte

Country Status (3)

Country Link
EP (1) EP1011030B1 (de)
JP (1) JP2000181053A (de)
DE (1) DE69901282T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003066607A (ja) * 2001-08-30 2003-03-05 Fuji Photo Film Co Ltd 赤外線レーザ用平版印刷版
DE10310168B4 (de) * 2003-03-08 2007-07-19 Huber Gmbh Wässrige Entwicklerlösung für Offset-Druckplatten
JP2008033229A (ja) * 2006-07-07 2008-02-14 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、離画壁及びその製造方法、カラーフィルタ及びその製造方法、並びに表示装置
CN101462713A (zh) 2007-12-20 2009-06-24 索尼株式会社 处理碳纳米管的方法、碳纳米管以及碳纳米管器件
CN112684662A (zh) * 2021-01-03 2021-04-20 尚健 一种液晶显示装置用黑矩阵

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
US5300628A (en) * 1992-06-29 1994-04-05 Ocg Microelectronic Materials, Inc. Selected chelate resins and their use to remove multivalent metal impurities from resist components
JP3010963B2 (ja) * 1993-02-17 2000-02-21 信越化学工業株式会社 レジスト組成物
EP0843218B1 (de) * 1996-11-14 2008-01-16 FUJIFILM Corporation Photoempfindliche Zusammensetzung

Also Published As

Publication number Publication date
EP1011030A1 (de) 2000-06-21
EP1011030B1 (de) 2002-04-17
DE69901282T2 (de) 2002-10-31
JP2000181053A (ja) 2000-06-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP