DE69637167D1 - LED-Anordnung mit hoher Auflösung und ihr Herstellungsverfahren - Google Patents
LED-Anordnung mit hoher Auflösung und ihr HerstellungsverfahrenInfo
- Publication number
- DE69637167D1 DE69637167D1 DE69637167T DE69637167T DE69637167D1 DE 69637167 D1 DE69637167 D1 DE 69637167D1 DE 69637167 T DE69637167 T DE 69637167T DE 69637167 T DE69637167 T DE 69637167T DE 69637167 D1 DE69637167 D1 DE 69637167D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing process
- high resolution
- led array
- led
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/12—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
- H01L31/125—Composite devices with photosensitive elements and electroluminescent elements within one single body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0008—Devices characterised by their operation having p-n or hi-lo junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Composite Materials (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Led Devices (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32415995 | 1995-12-13 | ||
JP32415995A JPH09162439A (ja) | 1995-12-13 | 1995-12-13 | Ledアレイ及びその製造方法 |
JP8693996A JP3256128B2 (ja) | 1996-04-09 | 1996-04-09 | 受発光ダイオードアレイチップおよび該チップを用いた受発光ダイオードアレイ、該チップの製造方法 |
JP8693996 | 1996-04-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69637167D1 true DE69637167D1 (de) | 2007-08-30 |
DE69637167T2 DE69637167T2 (de) | 2008-03-20 |
Family
ID=26428010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69637167T Expired - Lifetime DE69637167T2 (de) | 1995-12-13 | 1996-12-12 | LED-Anordnung mit hoher Auflösung und ihr Herstellungsverfahren |
Country Status (3)
Country | Link |
---|---|
US (2) | US5821567A (de) |
EP (1) | EP0779661B1 (de) |
DE (1) | DE69637167T2 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2318448B (en) * | 1996-10-18 | 2002-01-16 | Simage Oy | Imaging detector and method of production |
JPH111027A (ja) * | 1997-04-14 | 1999-01-06 | Oki Electric Ind Co Ltd | Ledアレイおよびプリントヘッドならびに電子写真プリンタ |
JPH11186594A (ja) * | 1997-12-25 | 1999-07-09 | Hitachi Cable Ltd | 発光ダイオードアレイ |
JPH11220161A (ja) * | 1998-01-30 | 1999-08-10 | Oki Electric Ind Co Ltd | 発光ダイオード及び発光ダイオードの製造方法 |
US6198118B1 (en) * | 1998-03-09 | 2001-03-06 | Integration Associates, Inc. | Distributed photodiode structure |
US6548878B1 (en) | 1998-02-05 | 2003-04-15 | Integration Associates, Inc. | Method for producing a thin distributed photodiode structure |
US6753586B1 (en) | 1998-03-09 | 2004-06-22 | Integration Associates Inc. | Distributed photodiode structure having majority dopant gradient and method for making same |
JP3181262B2 (ja) * | 1998-06-04 | 2001-07-03 | スタンレー電気株式会社 | 平面実装型led素子およびその製造方法 |
JP4165785B2 (ja) * | 1999-05-11 | 2008-10-15 | 横河電機株式会社 | フォトダイオードアレイ |
JP4221818B2 (ja) * | 1999-05-28 | 2009-02-12 | 沖電気工業株式会社 | 光半導体素子の製造方法 |
US6677707B1 (en) * | 1999-11-19 | 2004-01-13 | The Regents Of The University Of California | Side-emitting surface mounted light emitting diode |
WO2004006293A2 (en) * | 2001-08-15 | 2004-01-15 | Microcoating Technologies, Inc. | Method of annealing electrically conductive zinc oxide films |
US6825866B2 (en) | 2002-01-10 | 2004-11-30 | Xerox Corporation | LED array architecture for high resolution printbars |
JP2003282939A (ja) * | 2002-03-26 | 2003-10-03 | Oki Degital Imaging:Kk | 半導体発光装置及びその製造方法 |
JP2004087979A (ja) * | 2002-08-28 | 2004-03-18 | Sharp Corp | 受光素子およびその製造方法並びに回路内蔵型受光素子 |
US7053416B2 (en) * | 2003-05-30 | 2006-05-30 | Nichia Corporation | LED display apparatus |
CN100444715C (zh) * | 2006-02-09 | 2008-12-17 | 友达光电股份有限公司 | 用于显示元件的全彩工艺的屏蔽 |
JP5737066B2 (ja) * | 2010-08-26 | 2015-06-17 | 日亜化学工業株式会社 | 半導体発光素子 |
TWI487145B (zh) * | 2010-09-17 | 2015-06-01 | Everlight Electronics Co Ltd | 用於一微型投影系統之發光二極體裝置 |
US8435797B2 (en) | 2010-12-07 | 2013-05-07 | The United States Of America As Represented By The Secretary Of The Army | Electroluminescent diode sensor |
TWI488332B (zh) * | 2012-10-31 | 2015-06-11 | Nisho Image Tech Inc | 發光二極體陣列結構及其列印頭與列印裝置 |
US10451376B2 (en) | 2014-12-16 | 2019-10-22 | Kurt S. SCHULZ | Firearm simulators |
US10895435B2 (en) | 2017-02-27 | 2021-01-19 | Kurt S. SCHULZ | Firearm simulator targets and firearm simulation systems |
CN109378281A (zh) * | 2018-11-21 | 2019-02-22 | 中国科学院上海技术物理研究所 | 一种用于小间距扩散成结表征的测试结构和测试方法 |
US11600544B2 (en) * | 2019-02-27 | 2023-03-07 | Intel Corporation | Chip package with staggered pin pattern |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3942243A (en) * | 1974-01-25 | 1976-03-09 | Litronix, Inc. | Ohmic contact for semiconductor devices |
US4149307A (en) * | 1977-12-28 | 1979-04-17 | Hughes Aircraft Company | Process for fabricating insulated-gate field-effect transistors with self-aligned contacts |
JPS5630776A (en) * | 1979-08-21 | 1981-03-27 | Oki Electric Ind Co Ltd | Manufacture of light emitting element array |
JPS5866370A (ja) * | 1981-10-16 | 1983-04-20 | Oki Electric Ind Co Ltd | 発光ダイオ−ドアレイ |
JPS5999717A (ja) * | 1982-11-29 | 1984-06-08 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS59146875A (ja) * | 1983-02-10 | 1984-08-22 | Matsushita Graphic Commun Syst Inc | Ledアレイヘツド |
US4644342A (en) * | 1984-03-29 | 1987-02-17 | Eastman Kodak Company | Array of light emitting diodes for producing gray scale light images |
JPS60235479A (ja) * | 1984-05-09 | 1985-11-22 | Nec Corp | 発光素子アレイ |
US4634474A (en) * | 1984-10-09 | 1987-01-06 | At&T Bell Laboratories | Coating of III-V and II-VI compound semiconductors |
JP2533078B2 (ja) * | 1984-11-27 | 1996-09-11 | ソニー株式会社 | 不純物拡散方法 |
JPH0727873B2 (ja) * | 1987-11-04 | 1995-03-29 | 三菱電機株式会社 | 化合物半導体へのSi拡散方法 |
JPH0327577A (ja) * | 1989-06-23 | 1991-02-05 | イーストマン・コダックジャパン株式会社 | 発光ダイオ―ドアレイ |
JPH0582463A (ja) * | 1991-03-25 | 1993-04-02 | Mitsubishi Electric Corp | P形不純物の拡散方法及び半導体レーザ |
JPH0613649A (ja) * | 1992-06-26 | 1994-01-21 | Eastman Kodak Japan Kk | 発光素子 |
JPH0685320A (ja) * | 1992-09-02 | 1994-03-25 | Nisshin Steel Co Ltd | 発光ダイオードアレイチップの製造方法 |
JPH0685319A (ja) * | 1992-09-02 | 1994-03-25 | Nisshin Steel Co Ltd | 発光ダイオードアレイチップの製造方法 |
JP3187213B2 (ja) * | 1993-08-25 | 2001-07-11 | 沖電気工業株式会社 | 受発光ダイオード |
US5600157A (en) * | 1993-04-28 | 1997-02-04 | Oki Electric Industry Co., Ltd. | Light-emitting and light-sensing diode array device, and light-emitting and light-sensing diode with improved sensitivity |
JP2857305B2 (ja) * | 1993-10-20 | 1999-02-17 | 沖電気工業株式会社 | Ledアレイおよびその製造方法 |
US5523590A (en) * | 1993-10-20 | 1996-06-04 | Oki Electric Industry Co., Ltd. | LED array with insulating films |
JP3157690B2 (ja) * | 1995-01-19 | 2001-04-16 | 沖電気工業株式会社 | pn接合素子の製造方法 |
JP3563141B2 (ja) * | 1995-01-31 | 2004-09-08 | 沖電気工業株式会社 | Znの固相拡散方法およびLEDの製造方法 |
JP3053750B2 (ja) * | 1995-07-21 | 2000-06-19 | 沖電気工業株式会社 | 端面発光型ledの製造方法 |
JP3258221B2 (ja) * | 1995-12-26 | 2002-02-18 | 沖電気工業株式会社 | 位置合わせ用の認識マークおよびその形成方法、認識マークおよび発光部の形成の兼用マスク、位置合わせ用の認識マークを用いた位置合わせ方法 |
-
1996
- 1996-12-11 US US08/763,860 patent/US5821567A/en not_active Expired - Lifetime
- 1996-12-12 DE DE69637167T patent/DE69637167T2/de not_active Expired - Lifetime
- 1996-12-12 EP EP96119978A patent/EP0779661B1/de not_active Expired - Lifetime
-
1998
- 1998-08-20 US US09/137,073 patent/US6136627A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0779661B1 (de) | 2007-07-18 |
EP0779661A2 (de) | 1997-06-18 |
US5821567A (en) | 1998-10-13 |
US6136627A (en) | 2000-10-24 |
EP0779661A3 (de) | 1999-06-02 |
DE69637167T2 (de) | 2008-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |