DE69625411D1 - Herstellungsverfahren für mehrschichtige Mikrolinsen und deren Verwendung - Google Patents
Herstellungsverfahren für mehrschichtige Mikrolinsen und deren VerwendungInfo
- Publication number
- DE69625411D1 DE69625411D1 DE69625411T DE69625411T DE69625411D1 DE 69625411 D1 DE69625411 D1 DE 69625411D1 DE 69625411 T DE69625411 T DE 69625411T DE 69625411 T DE69625411 T DE 69625411T DE 69625411 D1 DE69625411 D1 DE 69625411D1
- Authority
- DE
- Germany
- Prior art keywords
- microlenses
- multilayer
- manufacturing process
- manufacturing
- multilayer microlenses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US102395P | 1995-07-11 | 1995-07-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69625411D1 true DE69625411D1 (de) | 2003-01-30 |
DE69625411T2 DE69625411T2 (de) | 2003-10-30 |
Family
ID=21694013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69625411T Expired - Lifetime DE69625411T2 (de) | 1995-07-11 | 1996-07-10 | Herstellungsverfahren für mehrschichtige Mikrolinsen und deren Verwendung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5871888A (de) |
EP (1) | EP0753765B1 (de) |
DE (1) | DE69625411T2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3420399B2 (ja) * | 1995-07-28 | 2003-06-23 | キヤノン株式会社 | 発光素子 |
DE19913311A1 (de) * | 1998-03-25 | 1999-09-30 | Fuji Photo Film Co Ltd | Bildverarbeitungsvorrichtung |
US6665014B1 (en) * | 1998-11-25 | 2003-12-16 | Intel Corporation | Microlens and photodetector |
US7129982B1 (en) * | 1999-12-30 | 2006-10-31 | Intel Corporation | Color image sensor with integrated binary optical elements |
WO2001067518A1 (en) | 2000-03-09 | 2001-09-13 | Koninklijke Philips Electronics N.V. | Solid state imaging sensor in a submicron technology and method of manufacturing and use of a solid state imaging sensor |
US6737223B2 (en) * | 2000-08-07 | 2004-05-18 | Shipley Company, L.L.C. | Fiber optic chip with lenslet array and method of fabrication |
US7086134B2 (en) * | 2000-08-07 | 2006-08-08 | Shipley Company, L.L.C. | Alignment apparatus and method for aligning stacked devices |
TW463058B (en) * | 2000-10-20 | 2001-11-11 | Ind Tech Res Inst | Method for fabricating microlens in batch and product manufactured the same |
US20030118071A1 (en) * | 2001-12-20 | 2003-06-26 | Eastman Kodak Company | Laser array and method of making same |
US20040223071A1 (en) * | 2003-05-08 | 2004-11-11 | David Wells | Multiple microlens system for image sensors or display units |
US7193784B2 (en) * | 2003-05-20 | 2007-03-20 | Kansas State University Research Foundation | Nitride microlens |
US7205526B2 (en) * | 2003-12-22 | 2007-04-17 | Micron Technology, Inc. | Methods of fabricating layered lens structures |
US20090186304A1 (en) * | 2008-01-22 | 2009-07-23 | Micron Technology, Inc. | Gravity and pressure enhanced reflow process to form lens structures |
US8373061B2 (en) * | 2008-04-29 | 2013-02-12 | Hewlett-Packard Development Company, L.P. | Photovoltaic cells with stacked light-absorption layers and methods of fabricating the same |
US8217259B2 (en) * | 2009-05-29 | 2012-07-10 | International Business Machines Corporation | Enhanced efficiency solar cells and method of manufacture |
JP5320270B2 (ja) * | 2009-11-25 | 2013-10-23 | 株式会社沖データ | 表示パネルの製造方法 |
CN102812387A (zh) | 2010-03-31 | 2012-12-05 | Ev集团有限责任公司 | 用于制造微透镜的方法和装置 |
SG187696A1 (en) | 2010-09-02 | 2013-03-28 | Ev Group Gmbh | Die tool, device and method for producing a lens wafer |
JP5883447B2 (ja) | 2010-10-26 | 2016-03-15 | エーファウ・グループ・ゲーエムベーハー | レンズウエハーを製造するための方法および装置 |
SG2014012967A (en) | 2012-05-30 | 2014-09-26 | Ev Group E Thallner Gmbh | Method and device for producing a plurality of microlenses |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4689291A (en) * | 1985-08-30 | 1987-08-25 | Xerox Corporation | Pedestal-type microlens fabrication process |
JPH03173472A (ja) * | 1989-12-01 | 1991-07-26 | Mitsubishi Electric Corp | マイクロレンズの形成方法 |
JPH0812904B2 (ja) * | 1990-11-30 | 1996-02-07 | 三菱電機株式会社 | 固体撮像素子の製造方法 |
JPH04239781A (ja) * | 1991-01-23 | 1992-08-27 | Eastman Kodak Japan Kk | Ledアレイチップ |
JP3269644B2 (ja) * | 1991-08-07 | 2002-03-25 | 大日本印刷株式会社 | マイクロレンズの製造方法 |
JPH05326900A (ja) * | 1992-05-18 | 1993-12-10 | Mitsubishi Electric Corp | 固体撮像装置とその製造方法 |
US5605783A (en) * | 1995-01-06 | 1997-02-25 | Eastman Kodak Company | Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers |
-
1996
- 1996-07-10 EP EP96870091A patent/EP0753765B1/de not_active Expired - Lifetime
- 1996-07-10 DE DE69625411T patent/DE69625411T2/de not_active Expired - Lifetime
- 1996-07-11 US US08/680,201 patent/US5871888A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0753765A2 (de) | 1997-01-15 |
US5871888A (en) | 1999-02-16 |
DE69625411T2 (de) | 2003-10-30 |
EP0753765B1 (de) | 2002-12-18 |
EP0753765A3 (de) | 1997-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |