DE69618521T2 - Harzmasse mit niedriger Dielektrizitätskonstante - Google Patents
Harzmasse mit niedriger DielektrizitätskonstanteInfo
- Publication number
- DE69618521T2 DE69618521T2 DE69618521T DE69618521T DE69618521T2 DE 69618521 T2 DE69618521 T2 DE 69618521T2 DE 69618521 T DE69618521 T DE 69618521T DE 69618521 T DE69618521 T DE 69618521T DE 69618521 T2 DE69618521 T2 DE 69618521T2
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- dielectric constant
- low dielectric
- low
- constant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/443—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds
- H01B3/445—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from vinylhalogenides or other halogenoethylenic compounds from vinylfluorides or other fluoroethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Paints Or Removers (AREA)
- Organic Insulating Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24322895 | 1995-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69618521D1 DE69618521D1 (de) | 2002-02-21 |
DE69618521T2 true DE69618521T2 (de) | 2002-10-31 |
Family
ID=17100749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69618521T Expired - Fee Related DE69618521T2 (de) | 1995-09-21 | 1996-09-19 | Harzmasse mit niedriger Dielektrizitätskonstante |
Country Status (8)
Country | Link |
---|---|
US (1) | US5905117A (de) |
EP (1) | EP0767467B1 (de) |
JP (1) | JPH09143420A (de) |
KR (1) | KR100428826B1 (de) |
CN (1) | CN1122078C (de) |
DE (1) | DE69618521T2 (de) |
SG (1) | SG74567A1 (de) |
TW (1) | TW420708B (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6660875B1 (en) | 1998-06-09 | 2003-12-09 | Ppt Technologies, Llc | Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate (TEOS) |
US6266475B1 (en) | 1998-07-03 | 2001-07-24 | Asahi Glass Company Ltd. | Optical waveguide |
WO2000012640A1 (en) | 1998-09-01 | 2000-03-09 | Catalysts & Chemicals Industries Co., Ltd. | Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film |
US6391220B1 (en) * | 1999-08-18 | 2002-05-21 | Fujitsu Limited, Inc. | Methods for fabricating flexible circuit structures |
TWI260332B (en) * | 1999-09-16 | 2006-08-21 | Hitachi Chemical Co Ltd | Compositions, methods of forming low dielectric coefficient film using the composition, low dielectric coefficient films, and electronic components having the film |
US20040253462A1 (en) * | 1999-09-16 | 2004-12-16 | Hitachi Chemical Co., Ltd. | Composition, methods for forming low-permittivity film using the composition, low-permittivity film, and electronic part having the low-permittivity film |
EP1160848B1 (de) * | 2000-05-22 | 2011-10-05 | JSR Corporation | Zusammensetzung für die Herstellung einer auf Silika basierenden Schicht |
CN1447981B (zh) * | 2000-08-21 | 2013-08-07 | 陶氏环球技术公司 | 微电子装置制造中用于有机聚合物电介质的硬面层的有机硅酸盐树脂 |
TW594395B (en) * | 2000-09-29 | 2004-06-21 | Nippon Zeon Co | Photoresist composition for insulating film, insulating film for organic electroluminescent element, and process for producing the same |
TW588072B (en) | 2000-10-10 | 2004-05-21 | Shipley Co Llc | Antireflective porogens |
JP3750532B2 (ja) * | 2001-01-29 | 2006-03-01 | 株式会社村田製作所 | 薄膜回路基板及びその製造方法 |
US6455443B1 (en) * | 2001-02-21 | 2002-09-24 | International Business Machines Corporation | Method of fabricating low-dielectric constant interlevel dielectric films for BEOL interconnects with enhanced adhesion and low-defect density |
WO2003028070A2 (en) * | 2001-09-27 | 2003-04-03 | Henkel Corporation | Compositions having controlled flowability and thermal properties |
DE10162443A1 (de) * | 2001-12-19 | 2003-07-03 | Bayer Ag | Verfahren zur Herstellung von dielektrischen Schichten unter Verwendung multifunktioneller Carbosilane |
US7307343B2 (en) * | 2002-05-30 | 2007-12-11 | Air Products And Chemicals, Inc. | Low dielectric materials and methods for making same |
US7122880B2 (en) * | 2002-05-30 | 2006-10-17 | Air Products And Chemicals, Inc. | Compositions for preparing low dielectric materials |
KR100515583B1 (ko) * | 2002-06-27 | 2005-09-20 | 주식회사 엘지화학 | 유기실리케이트 중합체 및 이를 함유하는 절연막 |
US6797643B2 (en) * | 2002-10-23 | 2004-09-28 | Applied Materials Inc. | Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power |
US6932092B2 (en) * | 2002-11-22 | 2005-08-23 | Applied Materials, Inc. | Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy |
EP1595926B1 (de) * | 2003-01-27 | 2014-03-26 | Daikin Industries, Ltd. | Beschichtungszusammensetzung |
EP1506982B1 (de) * | 2003-08-15 | 2006-10-04 | Hoden Seimitsu Kako Kenkyusho Co., Ltd. | Chromfreies Mittel zur Behandlung von Metalloberflächen |
US20100130690A1 (en) * | 2005-10-31 | 2010-05-27 | Daikin Industries, Ltd. | Method for molding polytetrafluoroethylene, polytetrafluoroethylene molded body, crosslinkable polytetrafluoroethylene, powdered polytetrafluoroethylene crosslinked body, resin blend composition of matter and resin blend molded body |
JP4493055B1 (ja) * | 2009-07-17 | 2010-06-30 | 大日本塗料株式会社 | 塗料組成物 |
WO2014067816A1 (en) * | 2012-10-31 | 2014-05-08 | Solvay Sa | Process for manufacturing fluoropolymer hybrid composites |
CN105418926B (zh) * | 2014-09-12 | 2018-07-13 | 中国科学院上海高等研究院 | 一种含氟萘乙基硅树脂及其制备方法和应用 |
WO2017145823A1 (ja) * | 2016-02-24 | 2017-08-31 | 旭硝子株式会社 | 塗布液組成物およびこれを用いた膜付き物品の製造方法 |
CN109790349B (zh) * | 2016-10-05 | 2021-09-21 | Agc株式会社 | 含有含氟聚合物的组合物和带含氟聚合物膜的基材的制造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4861667A (en) * | 1986-12-19 | 1989-08-29 | Asahi Glass Company, Ltd. | Coating composition and coated product |
DE69031016T2 (de) * | 1989-02-10 | 1998-02-12 | Kanegafuchi Chemical Ind | Wärmehärtbare Zusammensetzung |
CA2013949C (en) * | 1989-04-06 | 1999-08-24 | Toshiro Nambu | Thermosetting composition |
US5021602A (en) * | 1989-06-09 | 1991-06-04 | The Dow Chemical Company | Reactive compounds containing perfluorocyclobutane rings |
US5037917A (en) * | 1989-06-09 | 1991-08-06 | The Dow Chemical Company | Perfluorocyclobutane ring-containing polymers |
JP2801660B2 (ja) * | 1989-07-21 | 1998-09-21 | 触媒化成工業株式会社 | シリカ系被膜形成用塗布液の製造方法 |
DE69111699T2 (de) * | 1990-06-01 | 1996-04-18 | Asahi Glass Co Ltd | Fluoropolymer-Überzugszusammensetzung und damit beschichteter Gegenstand. |
JP3320440B2 (ja) * | 1992-03-17 | 2002-09-03 | 触媒化成工業株式会社 | 被膜形成用塗布液およびその製造方法 |
US5360869A (en) * | 1992-10-30 | 1994-11-01 | University Of North Carolina At Chapel Hill | Method of making fluorinated copolymers |
JPH06322336A (ja) * | 1993-05-11 | 1994-11-22 | Asahi Glass Co Ltd | 電子部品用接着剤及び物品 |
JPH07331178A (ja) * | 1994-06-14 | 1995-12-19 | Toray Ind Inc | コーティング用組成物およびその製造方法 |
US5656555A (en) * | 1995-02-17 | 1997-08-12 | Texas Instruments Incorporated | Modified hydrogen silsesquioxane spin-on glass |
-
1996
- 1996-08-29 JP JP8229117A patent/JPH09143420A/ja active Pending
- 1996-09-18 TW TW085111393A patent/TW420708B/zh not_active IP Right Cessation
- 1996-09-19 SG SG1996010670A patent/SG74567A1/en unknown
- 1996-09-19 US US08/716,065 patent/US5905117A/en not_active Expired - Fee Related
- 1996-09-19 EP EP96115073A patent/EP0767467B1/de not_active Expired - Lifetime
- 1996-09-19 DE DE69618521T patent/DE69618521T2/de not_active Expired - Fee Related
- 1996-09-20 CN CN96122542A patent/CN1122078C/zh not_active Expired - Fee Related
- 1996-09-21 KR KR1019960041499A patent/KR100428826B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100428826B1 (ko) | 2004-09-18 |
EP0767467A3 (de) | 1998-01-28 |
JPH09143420A (ja) | 1997-06-03 |
CN1165161A (zh) | 1997-11-19 |
DE69618521D1 (de) | 2002-02-21 |
US5905117A (en) | 1999-05-18 |
SG74567A1 (en) | 2000-08-22 |
EP0767467A2 (de) | 1997-04-09 |
TW420708B (en) | 2001-02-01 |
EP0767467B1 (de) | 2002-01-16 |
KR970015670A (ko) | 1997-04-28 |
CN1122078C (zh) | 2003-09-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |