DE69431312T2 - Kombinierte Nahfeld- und Atomkraftrastermikroskop, Sonde dafür und Verfahren zur Herstellung der Sonde - Google Patents

Kombinierte Nahfeld- und Atomkraftrastermikroskop, Sonde dafür und Verfahren zur Herstellung der Sonde

Info

Publication number
DE69431312T2
DE69431312T2 DE69431312T DE69431312T DE69431312T2 DE 69431312 T2 DE69431312 T2 DE 69431312T2 DE 69431312 T DE69431312 T DE 69431312T DE 69431312 T DE69431312 T DE 69431312T DE 69431312 T2 DE69431312 T2 DE 69431312T2
Authority
DE
Germany
Prior art keywords
probe
producing
field
atomic force
scanning microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69431312T
Other languages
English (en)
Other versions
DE69431312D1 (de
Inventor
Hiroshi Muramatsu
Norio Chiba
Tatsuaki Ataka
Masamichi Fujihira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Science Corp
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27462752&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69431312(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Application granted granted Critical
Publication of DE69431312D1 publication Critical patent/DE69431312D1/de
Publication of DE69431312T2 publication Critical patent/DE69431312T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/06—SNOM [Scanning Near-field Optical Microscopy] combined with AFM [Atomic Force Microscopy]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/02—Probe holders
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/241—Light guide terminations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/862—Near-field probe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/863—Atomic force probe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/871—Scanning probe structure with environmental regulation means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/949—Radiation emitter using nanostructure
    • Y10S977/95—Electromagnetic energy
    • Y10S977/951—Laser

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
DE69431312T 1993-04-12 1994-04-06 Kombinierte Nahfeld- und Atomkraftrastermikroskop, Sonde dafür und Verfahren zur Herstellung der Sonde Expired - Lifetime DE69431312T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP8495293 1993-04-12
JP27670693 1993-11-05
JP27670493 1993-11-05
JP6052248A JP2704601B2 (ja) 1993-04-12 1994-03-23 走査型近視野原子間力顕微鏡、及びその顕微鏡に使用されるプローブ、及びそのプローブの製造方法

Publications (2)

Publication Number Publication Date
DE69431312D1 DE69431312D1 (de) 2002-10-10
DE69431312T2 true DE69431312T2 (de) 2003-05-15

Family

ID=27462752

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69431312T Expired - Lifetime DE69431312T2 (de) 1993-04-12 1994-04-06 Kombinierte Nahfeld- und Atomkraftrastermikroskop, Sonde dafür und Verfahren zur Herstellung der Sonde
DE69425456T Expired - Fee Related DE69425456T2 (de) 1993-04-12 1994-04-06 Sonde für kombiniertes Nahfeld- und Atomkraftrastermikroskop

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69425456T Expired - Fee Related DE69425456T2 (de) 1993-04-12 1994-04-06 Sonde für kombiniertes Nahfeld- und Atomkraftrastermikroskop

Country Status (7)

Country Link
US (1) US6229609B1 (de)
EP (2) EP0884617B1 (de)
JP (1) JP2704601B2 (de)
KR (1) KR100307461B1 (de)
CA (1) CA2120975A1 (de)
DE (2) DE69431312T2 (de)
TW (1) TW500224U (de)

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US5677978A (en) * 1993-08-08 1997-10-14 Lewis; Aaron Bent probe microscopy
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JP3425615B2 (ja) 1994-03-24 2003-07-14 科学技術庁長官官房会計課長 走査型近視野原子間力顕微鏡
US6339217B1 (en) * 1995-07-28 2002-01-15 General Nanotechnology Llc Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements
US5751683A (en) * 1995-07-24 1998-05-12 General Nanotechnology, L.L.C. Nanometer scale data storage device and associated positioning system
US6337479B1 (en) * 1994-07-28 2002-01-08 Victor B. Kley Object inspection and/or modification system and method
FR2726917B1 (fr) * 1994-11-10 1996-12-27 Univ Bourgogne Plate-forme universelle pour microscope
JP3610108B2 (ja) * 1995-01-13 2005-01-12 キヤノン株式会社 情報処理装置
DE19531802A1 (de) * 1995-08-30 1997-03-06 Guenter Guttroff Verfahren zur Steigerung des optischen Auflösungsvermögens
JP2934739B2 (ja) * 1996-02-20 1999-08-16 セイコーインスツルメンツ株式会社 走査型近視野原子間力顕微鏡
JP2903211B2 (ja) * 1996-04-09 1999-06-07 セイコーインスツルメンツ株式会社 プローブとプローブ製造方法及び走査型プローブ顕微鏡
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US7196328B1 (en) 2001-03-08 2007-03-27 General Nanotechnology Llc Nanomachining method and apparatus
US6802646B1 (en) * 2001-04-30 2004-10-12 General Nanotechnology Llc Low-friction moving interfaces in micromachines and nanomachines
US6787768B1 (en) 2001-03-08 2004-09-07 General Nanotechnology Llc Method and apparatus for tool and tip design for nanomachining and measurement
US6752008B1 (en) 2001-03-08 2004-06-22 General Nanotechnology Llc Method and apparatus for scanning in scanning probe microscopy and presenting results
JP4145985B2 (ja) * 1998-02-10 2008-09-03 セイコーインスツル株式会社 情報記録装置
JP3825568B2 (ja) * 1998-02-23 2006-09-27 エスアイアイ・ナノテクノロジー株式会社 近接場光顕微鏡用プローブとその製造方法および走査型近接場光顕微鏡
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JP4717235B2 (ja) 2000-04-19 2011-07-06 セイコーインスツル株式会社 光導波路プローブおよびその製造方法、ならびに走査型近視野顕微鏡
JP4379758B2 (ja) * 2000-11-13 2009-12-09 日本分光株式会社 近接場顕微鏡
JP3589630B2 (ja) * 2000-12-04 2004-11-17 株式会社東京精密 走査型プローブ顕微鏡
JP4555511B2 (ja) * 2001-01-11 2010-10-06 エスアイアイ・ナノテクノロジー株式会社 光プローブ顕微鏡
US6931710B2 (en) * 2001-01-30 2005-08-23 General Nanotechnology Llc Manufacturing of micro-objects such as miniature diamond tool tips
JP2002296169A (ja) 2001-03-30 2002-10-09 Canon Inc 近接場光プローブ、及び該近接場光プローブを有する近接場光学顕微鏡、近接場光リソグラフィー装置、近接場光ストレージ装置
JP4540254B2 (ja) * 2001-05-21 2010-09-08 オリンパス株式会社 走査型近接場光学顕微鏡
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US20030154149A1 (en) * 2002-02-13 2003-08-14 Dilip Gajendragadkar System and method of creating and executing a restricted stock sale plan
US6650420B2 (en) 2002-02-27 2003-11-18 The United States Of America As Represented By The Secretary Of The Navy Nanoscale vibrometric measurement apparatus and method
US6998689B2 (en) * 2002-09-09 2006-02-14 General Nanotechnology Llc Fluid delivery for scanning probe microscopy
US7491422B2 (en) * 2002-10-21 2009-02-17 Nanoink, Inc. Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate
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JP4423168B2 (ja) * 2004-11-02 2010-03-03 株式会社ミツトヨ 表面性状測定装置
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US8646111B2 (en) * 2006-02-14 2014-02-04 The Regents Of The University Of California Coupled mass-spring systems and imaging methods for scanning probe microscopy
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JP5216509B2 (ja) 2008-03-05 2013-06-19 株式会社日立製作所 走査プローブ顕微鏡およびこれを用いた試料の観察方法
CN102809672A (zh) * 2012-08-06 2012-12-05 中国科学院化学研究所 超分辨共聚焦光学显微镜与扫描探针显微镜联用系统
JP2014059194A (ja) * 2012-09-18 2014-04-03 Hitachi Ltd 走査プローブ顕微鏡およびこれを用いた試料の観察方法
WO2016085989A1 (en) * 2014-11-25 2016-06-02 The Trustees Of The University Of Pennsylvania In situ tribometer and methods of use
US9857216B2 (en) * 2014-12-26 2018-01-02 Ricoh Company, Ltd. Minute object characteristics measuring apparatus
CN105423962A (zh) * 2015-11-05 2016-03-23 黑龙江大学 表面形貌测量教学仪及采用该教学仪测量表面形貌的方法
JP6936964B2 (ja) * 2016-08-26 2021-09-22 大日本印刷株式会社 走査型プローブ顕微鏡
EP3324194B1 (de) * 2016-11-22 2019-06-26 Anton Paar GmbH Abbildung eines spalts zwischen probe und sonde eines rastersondenmikroskops in einer im wesentlichen horizontalen seitenansicht
RU2695027C2 (ru) * 2017-08-14 2019-07-18 Общество с ограниченной ответственностью "НТ-МДТ" Способ детектирования ближнепольного оптического отклика для сканирующего зондового микроскопа
EP3811086A1 (de) * 2018-06-20 2021-04-28 Physik Instrumente (PI) GmbH & Co. Kg Sensorsondenanordnung
CN109186428B (zh) * 2018-09-10 2020-10-27 上海共兴金属制品有限公司 一种镀锌钢板表面平整度精确检测与自动标记设备
CN109828124B (zh) * 2019-03-27 2023-09-22 西南交通大学 一种广配激光头的聚焦高度可调的多探针扫描探测装置
CN111060001A (zh) * 2019-12-27 2020-04-24 广州彩虹五金弹簧有限公司 一种异形弹簧分散目标点的测量装置及其测量方法
CN112309808B (zh) * 2020-11-13 2021-12-28 中国科学院物理研究所 光学聚焦和焦斑连续扫描的透射电子显微镜样品杆系统

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Also Published As

Publication number Publication date
KR940022116A (ko) 1994-10-20
DE69425456D1 (de) 2000-09-14
EP0884617B1 (de) 2002-09-04
TW500224U (en) 2002-08-21
EP0622652A1 (de) 1994-11-02
US6229609B1 (en) 2001-05-08
DE69425456T2 (de) 2001-04-12
JPH07174542A (ja) 1995-07-14
JP2704601B2 (ja) 1998-01-26
DE69431312D1 (de) 2002-10-10
KR100307461B1 (ko) 2001-12-15
EP0884617A1 (de) 1998-12-16
EP0622652B1 (de) 2000-08-09
CA2120975A1 (en) 1994-10-13

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