DE69423196D1 - Halbleiterlaservorrichtung - Google Patents

Halbleiterlaservorrichtung

Info

Publication number
DE69423196D1
DE69423196D1 DE69423196T DE69423196T DE69423196D1 DE 69423196 D1 DE69423196 D1 DE 69423196D1 DE 69423196 T DE69423196 T DE 69423196T DE 69423196 T DE69423196 T DE 69423196T DE 69423196 D1 DE69423196 D1 DE 69423196D1
Authority
DE
Germany
Prior art keywords
semiconductor laser
laser device
semiconductor
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69423196T
Other languages
English (en)
Other versions
DE69423196T2 (de
Inventor
Shoji Ishizaka
Kiyofumi Muro
Tsuyoshi Fujimoto
Yoshikazu Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of DE69423196D1 publication Critical patent/DE69423196D1/de
Publication of DE69423196T2 publication Critical patent/DE69423196T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00—Functional characteristics
    • H01S2301/18—Semiconductor lasers with special structural design for influencing the near- or far-field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004—Confining in the direction perpendicular to the layer structure
    • H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3409—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers special GRINSCH structures

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geometry (AREA)
  • Semiconductor Lasers (AREA)
DE69423196T 1993-12-24 1994-12-23 Halbleiterlaservorrichtung Expired - Lifetime DE69423196T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32814093 1993-12-24
JP2810294 1994-02-25

Publications (2)

Publication Number Publication Date
DE69423196D1 true DE69423196D1 (de) 2000-04-06
DE69423196T2 DE69423196T2 (de) 2000-08-24

Family

ID=26366142

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69423196T Expired - Lifetime DE69423196T2 (de) 1993-12-24 1994-12-23 Halbleiterlaservorrichtung

Country Status (5)

Country Link
US (1) US5764668A (de)
EP (1) EP0660472B1 (de)
KR (1) KR100228999B1 (de)
CA (1) CA2138912C (de)
DE (1) DE69423196T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11509047A (ja) * 1996-04-24 1999-08-03 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ 放射放出半導体ダイオード及びその製造方法
EP0814548B1 (de) * 1996-06-17 2003-10-29 Fuji Photo Film Co., Ltd. Halbleiterlaser
TW412889B (en) * 1997-09-24 2000-11-21 Nippon Oxygen Co Ltd Semiconductor laser
JPH11163458A (ja) * 1997-11-26 1999-06-18 Mitsui Chem Inc 半導体レーザ装置
EP0935319B1 (de) * 1998-02-04 2002-08-07 Mitsui Chemicals, Inc. Oberflächenemittierender Laser
GB2346735B (en) 1999-02-13 2004-03-31 Sharp Kk A semiconductor laser device
US6298077B1 (en) * 1999-02-16 2001-10-02 Opto Power Corporation GaInAsP/AIGaInP laser diodes with AIGaAs type II carrier blocking layer in the waveguide
US6546032B1 (en) 1999-08-27 2003-04-08 Mitsui Chemicals, Inc. Semiconductor laser apparatus
EP1087480B1 (de) 1999-09-27 2006-11-15 Sanyo Electric Co., Ltd. Halbleiterlaservorrichtung und Herstellungsverfahren
JP4275405B2 (ja) 2000-08-22 2009-06-10 三井化学株式会社 半導体レーザ素子の製造方法
EP1800374B1 (de) * 2004-10-12 2018-05-16 Compound Photonics U.S. Corporation Halbleiterlaserdiode
US20080137701A1 (en) * 2006-12-12 2008-06-12 Joseph Michael Freund Gallium Nitride Based Semiconductor Device with Reduced Stress Electron Blocking Layer
CN102204040B (zh) * 2008-10-31 2013-05-29 奥普拓能量株式会社 半导体激光元件
EP3916817A1 (de) 2016-02-09 2021-12-01 Lumeova, Inc Vorrichtungen und systeme zur ultrabreitbandigen, drahtlosen optischen hochgeschwindigkeitsübertragung
DE102016122147B4 (de) * 2016-11-17 2022-06-23 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Halbleiterlaser
CN114008878A (zh) * 2019-06-24 2022-02-01 华为技术有限公司 具有模式扩展层的半导体激光器
CN111812215B (zh) * 2020-07-22 2021-06-29 南京航空航天大学 一种飞行器结构损伤的监测方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1137605A (en) * 1979-01-15 1982-12-14 Donald R. Scifres High output power laser
JPS56164588A (en) * 1980-05-23 1981-12-17 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light amplifier
JPS58216489A (ja) * 1982-06-10 1983-12-16 Nippon Telegr & Teleph Corp <Ntt> 量子井戸型半導体レ−ザ
JPS60164379A (ja) * 1984-02-06 1985-08-27 Nec Corp 半導体レ−ザ−
JPS62173788A (ja) * 1986-01-28 1987-07-30 Nec Corp 半導体レ−ザ
JPH0212885A (ja) * 1988-06-29 1990-01-17 Nec Corp 半導体レーザ及びその出射ビームの垂直放射角の制御方法
US5003548A (en) * 1988-09-21 1991-03-26 Cornell Research Foundation, Inc. High power (1,4 W)AlGaInP graded-index separate confinement heterostructure visible (λ-658 nm) laser
JPH0371679A (ja) * 1989-08-11 1991-03-27 Kokusai Denshin Denwa Co Ltd <Kdd> 半導体発光素子
JPH0376288A (ja) * 1989-08-18 1991-04-02 Sanyo Electric Co Ltd 埋め込み型半導体レーザ
JPH03290984A (ja) * 1990-04-06 1991-12-20 Matsushita Electron Corp 半導体レーザ
JPH05160515A (ja) * 1991-12-04 1993-06-25 Eastman Kodak Japan Kk 量子井戸型レーザダイオード
EP0578836B1 (de) * 1992-02-05 1999-05-06 Mitsui Chemicals, Inc. Halbleiterlaserelement und damit hergestellter laser
US5467364A (en) * 1992-02-05 1995-11-14 Mitsui Petrochemical Industries, Ltd. Semiconductor laser element and laser device using the same element
JPH05235470A (ja) * 1992-02-24 1993-09-10 Eastman Kodak Japan Kk レーザダイオード
JPH05275798A (ja) * 1992-03-25 1993-10-22 Eastman Kodak Japan Kk レーザダイオード
KR970001896B1 (ko) * 1992-05-27 1997-02-18 엘지전자 주식회사 반도체 레이저 다이오드의 구조 및 그 제조방법
US5319660A (en) * 1992-05-29 1994-06-07 Mcdonnell Douglas Corporation Multi-quantum barrier laser

Also Published As

Publication number Publication date
US5764668A (en) 1998-06-09
KR100228999B1 (ko) 1999-11-01
CA2138912A1 (en) 1995-06-25
DE69423196T2 (de) 2000-08-24
EP0660472A3 (de) 1995-12-20
EP0660472B1 (de) 2000-03-01
EP0660472A2 (de) 1995-06-28
CA2138912C (en) 1999-05-04

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