DE69402115D1 - Halbleiterlaser - Google Patents
HalbleiterlaserInfo
- Publication number
- DE69402115D1 DE69402115D1 DE69402115T DE69402115T DE69402115D1 DE 69402115 D1 DE69402115 D1 DE 69402115D1 DE 69402115 T DE69402115 T DE 69402115T DE 69402115 T DE69402115 T DE 69402115T DE 69402115 D1 DE69402115 D1 DE 69402115D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/327—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIBVI compounds, e.g. ZnCdSe-laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2214—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on oxides or nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14795793A JP3453787B2 (ja) | 1993-06-18 | 1993-06-18 | 半導体レーザ及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69402115D1 true DE69402115D1 (de) | 1997-04-24 |
DE69402115T2 DE69402115T2 (de) | 1997-11-13 |
Family
ID=15441912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69402115T Expired - Fee Related DE69402115T2 (de) | 1993-06-18 | 1994-06-15 | Halbleiterlaser |
Country Status (6)
Country | Link |
---|---|
US (1) | US5432810A (de) |
EP (1) | EP0630084B1 (de) |
JP (1) | JP3453787B2 (de) |
KR (1) | KR100277398B1 (de) |
DE (1) | DE69402115T2 (de) |
TW (1) | TW274646B (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100303279B1 (ko) * | 1994-08-27 | 2001-12-01 | 윤종용 | 반도체레이저다이오드와그제조방법 |
JP3193976B2 (ja) * | 1996-03-27 | 2001-07-30 | 松下電器産業株式会社 | 高電圧ノイズフィルタ及びマグネトロン装置 |
US5732103A (en) * | 1996-12-09 | 1998-03-24 | Motorola, Inc. | Long wavelength VCSEL |
JP2006012899A (ja) * | 2004-06-22 | 2006-01-12 | Sharp Corp | 半導体レーザ素子および半導体レーザ素子の製造方法 |
DE102018123019A1 (de) * | 2018-09-19 | 2020-03-19 | Osram Opto Semiconductors Gmbh | Gewinngeführter halbleiterlaser und herstellungsverfahren hierfür |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4955031A (en) * | 1988-07-12 | 1990-09-04 | University Of Connecticut | Metal insulator semiconductor heterostructure lasers |
US5029175A (en) * | 1988-12-08 | 1991-07-02 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser |
JPH03237785A (ja) * | 1990-02-15 | 1991-10-23 | Omron Corp | 半導体発光素子およびその製造方法 |
RU2127478C1 (ru) * | 1991-05-15 | 1999-03-10 | Миннесота Майнинг Энд Мэнюфекчуринг Компани | Сине-зеленый лазерный диод |
JPH05275803A (ja) * | 1992-03-27 | 1993-10-22 | Tdk Corp | 半導体レーザ |
JPH0621572A (ja) * | 1992-07-02 | 1994-01-28 | Nec Corp | 半導体レーザ |
-
1993
- 1993-06-18 JP JP14795793A patent/JP3453787B2/ja not_active Expired - Lifetime
-
1994
- 1994-06-15 TW TW083105419A patent/TW274646B/zh active
- 1994-06-15 EP EP94109205A patent/EP0630084B1/de not_active Expired - Lifetime
- 1994-06-15 DE DE69402115T patent/DE69402115T2/de not_active Expired - Fee Related
- 1994-06-16 KR KR1019940013559A patent/KR100277398B1/ko not_active IP Right Cessation
- 1994-06-16 US US08/261,195 patent/US5432810A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0630084B1 (de) | 1997-03-19 |
DE69402115T2 (de) | 1997-11-13 |
KR100277398B1 (ko) | 2001-02-01 |
JPH077220A (ja) | 1995-01-10 |
JP3453787B2 (ja) | 2003-10-06 |
TW274646B (de) | 1996-04-21 |
US5432810A (en) | 1995-07-11 |
EP0630084A1 (de) | 1994-12-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |