DE69311915D1 - Verfahren zur bildung eines musters mittels elektronenstrahls - Google Patents
Verfahren zur bildung eines musters mittels elektronenstrahlsInfo
- Publication number
- DE69311915D1 DE69311915D1 DE69311915T DE69311915T DE69311915D1 DE 69311915 D1 DE69311915 D1 DE 69311915D1 DE 69311915 T DE69311915 T DE 69311915T DE 69311915 T DE69311915 T DE 69311915T DE 69311915 D1 DE69311915 D1 DE 69311915D1
- Authority
- DE
- Germany
- Prior art keywords
- pattern
- forming
- electron beam
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/887—Nanoimprint lithography, i.e. nanostamp
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Recording Or Reproduction (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP1993/003454 WO1995016274A1 (en) | 1993-12-08 | 1993-12-08 | Method of writing a pattern by an electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69311915D1 true DE69311915D1 (de) | 1997-08-07 |
DE69311915T2 DE69311915T2 (de) | 1998-01-08 |
Family
ID=8165801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69311915T Expired - Fee Related DE69311915T2 (de) | 1993-12-08 | 1993-12-08 | Verfahren zur bildung eines musters mittels elektronenstrahls |
Country Status (6)
Country | Link |
---|---|
US (1) | US5879860A (de) |
EP (1) | EP0729642B1 (de) |
JP (1) | JPH09511096A (de) |
KR (1) | KR100279899B1 (de) |
DE (1) | DE69311915T2 (de) |
WO (1) | WO1995016274A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7279046B2 (en) * | 2002-03-27 | 2007-10-09 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
EP1556737B1 (de) * | 2002-10-21 | 2008-12-31 | Nanoink, Inc. | Verfahren zur herstellung von strukturen im nanometerbereich zur anwendung im bereich der maskenreparatur |
GB2404782B (en) * | 2003-08-01 | 2005-12-07 | Leica Microsys Lithography Ltd | Pattern-writing equipment |
JP4649187B2 (ja) * | 2004-12-07 | 2011-03-09 | 株式会社東芝 | 荷電ビーム描画データの作成方法、荷電ビーム描画方法および荷電ビーム描画装置 |
US8999514B2 (en) * | 2012-02-03 | 2015-04-07 | General Electric Company | Bond coating powder comprising MCrAlY (M=Ni,Fe,Co), method of making, and a method of applying as bond coating |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5957431A (ja) * | 1982-09-27 | 1984-04-03 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPH02218115A (ja) * | 1989-02-20 | 1990-08-30 | Toshiba Corp | パターン形成方法 |
-
1993
- 1993-12-08 DE DE69311915T patent/DE69311915T2/de not_active Expired - Fee Related
- 1993-12-08 KR KR1019960703019A patent/KR100279899B1/ko not_active IP Right Cessation
- 1993-12-08 WO PCT/EP1993/003454 patent/WO1995016274A1/en active IP Right Grant
- 1993-12-08 JP JP7515905A patent/JPH09511096A/ja active Pending
- 1993-12-08 US US08/652,546 patent/US5879860A/en not_active Expired - Fee Related
- 1993-12-08 EP EP94902717A patent/EP0729642B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0729642A1 (de) | 1996-09-04 |
JPH09511096A (ja) | 1997-11-04 |
EP0729642B1 (de) | 1997-07-02 |
WO1995016274A1 (en) | 1995-06-15 |
US5879860A (en) | 1999-03-09 |
KR960706688A (ko) | 1996-12-09 |
KR100279899B1 (ko) | 2001-03-02 |
DE69311915T2 (de) | 1998-01-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69604931D1 (de) | Verfahren zur herstellung einer feldemissionskathode mittels eines teilchenförmigen feldemissionsmaterial | |
DE59406372D1 (de) | Verfahren zum herstellen eines dredidimensionalen objekts | |
DE69324986T2 (de) | Verfahren zur Herstellung eines diffusionsgebundenen Zerstäubungs-Target-Bauteil | |
DE69520327D1 (de) | Verfahren zur Herstellung eines Resistmusters | |
DE69314973T2 (de) | Verfahren zur Herstellung eines Zerstäubungstargets | |
DE69633823D1 (de) | Verfahren zur herstellung eines sputtertargets | |
DE3583423D1 (de) | Verfahren zur erzeugung eines gewuenschten musters auf einem ziel mittels elektronenstrahlbelichtung desselben. | |
DE3672024D1 (de) | Verfahren zur herstellung von bildmustern mittels eines elektronenstrahls hoher stromdichte. | |
DE69227056T2 (de) | Verfahren zur Fehleranalyse unter Verwendung eines Elektronenstrahles | |
DE69032669T2 (de) | Verfahren zur Ansteuerung eines räumlichen Lichtmodulators | |
DE69211070D1 (de) | Elektronenstrahl-Belichtungsverfahren zur Bildung eines Musters auf einem Werkstück mittels einen Elektronenstrahls mit Kompensierung des Angrenzungseffektes | |
DE59305985D1 (de) | Verfahren zum plasmagestützten reaktiven elektronenstrahlbedampfen | |
DE69329374T2 (de) | Verfahren zur Herstellung eines Halbleitersubstrates mittels eines Verbundverfahrens | |
ATE148101T1 (de) | Verfahren zur herstellung eines biphenylderivates | |
DE69411337D1 (de) | Verfahren zur Bildung einer Schaltung mittels eines Lasers und dadurch gebildete Komponente | |
DE69411448D1 (de) | Verfahren zum Herstellen von Silizium enthaltenden Kathoden-Targets | |
DE69314082D1 (de) | Verfahren zur Herstellung eines optischen Bauelements | |
DE59402500D1 (de) | Verfahren zur Kühlung eines Bauteils | |
DE69626197T2 (de) | Verfahren zur beurteilung des profilmusters eines reifens | |
DE69220566T2 (de) | Verfahren zur bildung einer beschichtung mittels aufdampfen | |
DE69311915D1 (de) | Verfahren zur bildung eines musters mittels elektronenstrahls | |
DE69328959D1 (de) | Verfahren zur Herstellung einer elektronischen Anordnung mittels Ionenimplantation | |
DE69406741D1 (de) | Verfahren zur Herstellung eines frequenzmodulierten Rasterbildes | |
DE69501008T2 (de) | Verfahren zur Gravierung eines gravierten Zylinders | |
DE69428031D1 (de) | Verfahren zur bezeichnung eines gebietes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |