DE69231756T2 - Optisches Gerät und Verfahren zu seiner Herstellung - Google Patents

Optisches Gerät und Verfahren zu seiner Herstellung

Info

Publication number
DE69231756T2
DE69231756T2 DE69231756T DE69231756T DE69231756T2 DE 69231756 T2 DE69231756 T2 DE 69231756T2 DE 69231756 T DE69231756 T DE 69231756T DE 69231756 T DE69231756 T DE 69231756T DE 69231756 T2 DE69231756 T2 DE 69231756T2
Authority
DE
Germany
Prior art keywords
manufacture
optical device
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69231756T
Other languages
English (en)
Other versions
DE69231756D1 (de
Inventor
Akira Eda
Kiyofumi Muro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of DE69231756D1 publication Critical patent/DE69231756D1/de
Publication of DE69231756T2 publication Critical patent/DE69231756T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383Parallel arrangements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0018Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/005Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0056Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0062Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/124Geodesic lenses or integrated gratings
    • G02B6/1245Geodesic lenses
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/37Non-linear optics for second-harmonic generation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0627Construction or shape of active medium the resonator being monolithic, e.g. microlaser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • H01S3/0606Crystal lasers or glass lasers with polygonal cross-section, e.g. slab, prism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • H01S3/0615Shape of end-face
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0619Coatings, e.g. AR, HR, passivation layer
    • H01S3/0621Coatings on the end-faces, e.g. input/output surfaces of the laser light
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0619Coatings, e.g. AR, HR, passivation layer
    • H01S3/0625Coatings on surfaces other than the end-faces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08095Zig-zag travelling beam through the active medium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308Amplifier arrangements, e.g. MOPA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0267Integrated focusing lens
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18388Lenses
DE69231756T 1991-06-21 1992-06-22 Optisches Gerät und Verfahren zu seiner Herstellung Expired - Fee Related DE69231756T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP15061891 1991-06-21
JP25263091 1991-09-30
JP25812991 1991-10-04

Publications (2)

Publication Number Publication Date
DE69231756D1 DE69231756D1 (de) 2001-05-03
DE69231756T2 true DE69231756T2 (de) 2001-08-02

Family

ID=27319962

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69231756T Expired - Fee Related DE69231756T2 (de) 1991-06-21 1992-06-22 Optisches Gerät und Verfahren zu seiner Herstellung

Country Status (5)

Country Link
US (3) US5999325A (de)
EP (1) EP0523861B1 (de)
KR (1) KR960014113B1 (de)
CA (1) CA2071598C (de)
DE (1) DE69231756T2 (de)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2071598C (en) * 1991-06-21 1999-01-19 Akira Eda Optical device and method of manufacturing the same
US5604081A (en) * 1992-08-14 1997-02-18 Siemens Aktiengesellschaft Method for producing a surface structure with reliefs
FR2704096B1 (fr) * 1993-04-14 1999-05-21 Commissariat Energie Atomique Procede de realisation d'une cellule acousto-optique pour laser declenche, cellule obtenue, procede de realisation collective de microlasers declenches et microlasers obtenus.
US5534950A (en) * 1993-10-04 1996-07-09 Laser Power Corporation High resolution image projection system and method employing lasers
FR2729796A1 (fr) * 1995-01-24 1996-07-26 Commissariat Energie Atomique Microlaser solide monolithique a declenchement actif par tension de commande faible
US5732100A (en) * 1995-01-24 1998-03-24 Commissariat A L'energie Atomique Cavity for a solid microlaser having an optimized efficiency, microlaser using it and its production process
US5768022A (en) * 1995-03-08 1998-06-16 Brown University Research Foundation Laser diode having in-situ fabricated lens element
FR2734094B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Emetteur infrarouge monolithique a semi-conducteur pompe par un microlaser solide declenche
FR2734092B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Microlaser monolithique declenche et materiau non lineaire intracavite
FR2734093B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Oscillateur parametrique optique monolithique pompe par un microlaser
GB2300964B (en) * 1995-05-13 1999-11-10 I E Optomech Limited Monolithic laser
US5802083A (en) * 1995-12-11 1998-09-01 Milton Birnbaum Saturable absorber Q-switches for 2-μm lasers
FR2751796B1 (fr) * 1996-07-26 1998-08-28 Commissariat Energie Atomique Microlaser soilde, a pompage optique par laser semi-conducteur a cavite verticale
FR2784194A1 (fr) * 1998-10-01 2000-04-07 Commissariat Energie Atomique Dispositif d'imagerie utilisant un ensemble de microlasers et procede de fabrication de ceux-ci
JP3430071B2 (ja) * 1999-06-02 2003-07-28 シャープ株式会社 マスク作製方法
US6558878B1 (en) * 1999-07-08 2003-05-06 Korea Electronics Technology Institute Microlens manufacturing method
JP4748836B2 (ja) * 1999-08-13 2011-08-17 株式会社半導体エネルギー研究所 レーザ照射装置
FR2803396B1 (fr) * 1999-12-30 2002-02-08 Commissariat Energie Atomique Procede de formation d'un microrelief concave dans un substrat, et mise en oeuvre du procede pour la realisation de composants optiques
US6888871B1 (en) 2000-07-12 2005-05-03 Princeton Optronics, Inc. VCSEL and VCSEL array having integrated microlenses for use in a semiconductor laser pumped solid state laser system
US6835535B2 (en) * 2000-07-31 2004-12-28 Corning Incorporated Microlens arrays having high focusing efficiency
CN1239925C (zh) 2000-07-31 2006-02-01 罗切斯特光电器件公司 用于光受控扩展的结构化屏
US7092165B2 (en) * 2000-07-31 2006-08-15 Corning Incorporated Microlens arrays having high focusing efficiency
JP2004505307A (ja) * 2000-07-31 2004-02-19 ロチェスター フォトニクス コーポレイション 高い集光効率を有するマイクロレンズアレイ
US6662851B2 (en) * 2000-12-22 2003-12-16 Hunter Douglas Inc. Ladder operated covering with fixed vanes for architectural openings
WO2002052423A1 (en) * 2000-12-22 2002-07-04 Karszes William M System and method for multidimensional imagery
JP2002221606A (ja) * 2001-01-24 2002-08-09 Sony Corp 光学レンズとその製造方法、光学レンズアレイの製造方法、フォーカスエラー信号生成方法および光学ピックアップ装置
AU781087B2 (en) * 2001-02-12 2005-05-05 Eci Telecom Ltd. Method and device for handling optical pulse signals
US6591047B2 (en) 2001-02-12 2003-07-08 Eci Telecom Ltd. Method and apparatus for compensation of nonlinearity in fiber optic links
US6768756B2 (en) 2001-03-12 2004-07-27 Axsun Technologies, Inc. MEMS membrane with integral mirror/lens
US6810062B2 (en) * 2001-04-11 2004-10-26 Axsun Technologies, Inc. Passive optical resonator with mirror structure suppressing higher order transverse spatial modes
EP1265327B1 (de) * 2001-06-02 2007-11-07 Seoul National University Industry Foundation Oberflächenemittierender Laser mit vertikalem Resonator
JP2003050341A (ja) * 2001-08-06 2003-02-21 Yamaha Corp 光学部品複合体およびその製造方法
US6606199B2 (en) * 2001-10-10 2003-08-12 Honeywell International Inc. Graded thickness optical element and method of manufacture therefor
US6649073B2 (en) * 2001-11-13 2003-11-18 Lucent Technologies Inc. Method for compensating for nonuniform etch profiles
US20030091084A1 (en) * 2001-11-13 2003-05-15 Decai Sun Integration of VCSEL array and microlens for optical scanning
US6700906B2 (en) * 2002-01-31 2004-03-02 The Regents Of The University Of California High energy, high average power solid state green or UV laser
KR100498716B1 (ko) * 2002-12-13 2005-07-01 주식회사 하이닉스반도체 미세 패턴 형성방법
JP4296943B2 (ja) * 2003-01-28 2009-07-15 ソニー株式会社 露光用マスクの製造方法および露光方法ならびに3次元形状の製造方法
EP1500975A3 (de) * 2003-07-21 2006-01-18 Ingeneric GmbH Verfahren zur Herstellung von optischen Mikrostrukturen
EP1664858A1 (de) * 2003-07-24 2006-06-07 Explay Ltd. Verfahren zur herstellung mikro-optischer strukturen
JP2005258387A (ja) 2003-07-29 2005-09-22 Sony Corp 露光用マスクおよびマスクパターンの製造方法
US8989523B2 (en) 2004-01-22 2015-03-24 Vescent Photonics, Inc. Liquid crystal waveguide for dynamically controlling polarized light
US8860897B1 (en) 2004-01-22 2014-10-14 Vescent Photonics, Inc. Liquid crystal waveguide having electric field orientated for controlling light
KR100634315B1 (ko) * 2004-02-12 2006-10-16 한국과학기술원 폴리머 패턴
KR100487105B1 (ko) * 2004-06-04 2005-05-04 주식회사 엘지에스 광학필름
TW200622326A (en) * 2004-09-15 2006-07-01 Nippon Sheet Glass Co Ltd Bar-shaped light guide, illumination unit and image-scannig device
US20070010486A1 (en) * 2005-07-06 2007-01-11 Jeff Schwegman Chemotherapeutic formulations of zosuquidar trihydrochloride and modified cyclodextrins
KR100643684B1 (ko) 2005-11-04 2006-11-10 한국과학기술원 폴리머 또는 레지스트 패턴 및 이를 이용한 금속 박막패턴, 금속 패턴, 플라스틱 몰드 및 이들의 형성방법
US7520062B2 (en) * 2005-12-06 2009-04-21 Robert Bosch Tool Corporation Light-plane projecting apparatus and lens
GB0624361D0 (en) * 2006-12-06 2007-01-17 Michelson Diagnostics Ltd Multiple beam source for a multi-beam interferometer and multi-beam interferometer
US9366938B1 (en) * 2009-02-17 2016-06-14 Vescent Photonics, Inc. Electro-optic beam deflector device
TW201128227A (en) * 2010-02-12 2011-08-16 Young Optics Inc Optical projection system and method for reducing ghost image generated therein
DE102010009048A1 (de) * 2010-02-23 2011-08-25 LPKF Laser & Electronics AG, 30827 Laseranordnung
US8995038B1 (en) * 2010-07-06 2015-03-31 Vescent Photonics, Inc. Optical time delay control device
US9652082B1 (en) 2014-08-20 2017-05-16 Amazon Technologies, Inc. Space efficient electronic device component configurations
KR101703055B1 (ko) 2015-04-20 2017-02-06 한국과학기술연구원 5-(2,6-디옥시-페닐)테트라졸 함유 폴리머, 이를 포함하는 막, 상기 막을 포함하는 전기 화학 장치 및 그 제조 방법
JP6771442B2 (ja) * 2017-09-20 2020-10-21 株式会社東芝 光学素子
DE102017128824A1 (de) * 2017-12-05 2019-06-06 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1581659A (en) * 1924-06-27 1926-04-20 Harry F Roach Anamorphous total-reflecting prism
US2337703A (en) * 1940-02-26 1943-12-28 Lumelite Corp Light-reflecting element
US2951419A (en) * 1953-06-11 1960-09-06 Jerome H Lemelson Reflective display device
US3384433A (en) * 1962-07-09 1968-05-21 Cruft Lab Apparatus for converting light energy from one frequency to another
US3154751A (en) * 1962-09-07 1964-10-27 Aircraft Armaments Inc Non-resonant laser crystal structure for amplifier
US3357772A (en) * 1963-02-27 1967-12-12 Rowland Products Inc Phased lenticular sheets for optical effects
US3360323A (en) * 1963-10-07 1967-12-26 Electro Optical Systems Inc Transverse magneto-optical rotator with compensation of phase retardation
US3357773A (en) * 1964-12-31 1967-12-12 Rowland Products Inc Patterned sheet material
US3397362A (en) * 1966-10-18 1968-08-13 Army Usa Optical laser configuration
DE1622341A1 (de) * 1968-01-18 1970-10-29 Siemens Ag Verfahren zum Herstellen von Kontaktbelichtungsmasken fuer Halbleiterzwecke
US3647283A (en) * 1970-11-16 1972-03-07 George Castanis Multiimage mirror
US3743378A (en) * 1971-07-30 1973-07-03 Ampex Optical intensity matching means for two light beams
DE2620914C3 (de) * 1976-05-12 1979-05-10 Messerschmitt-Boelkow-Blohm Gmbh, 8000 Muenchen Analoger Beschleunigungsmesser
US4105956A (en) * 1976-10-06 1978-08-08 Owens-Illinois, Inc. Q-switched laser and laser rod
US4486073A (en) * 1978-06-20 1984-12-04 Boyd Michael D Radiant energy reflecting structures
US4214813A (en) * 1978-07-11 1980-07-29 Mcnaney Joseph T Prismatic light beam expander or compressor means
US4280752A (en) * 1979-03-09 1981-07-28 The United States Of America As Represented By The Secretary Of The Army Solid-medium coherent optical processor
JPS5613782A (en) * 1979-07-13 1981-02-10 Fujitsu Ltd Preparation of semiconductor device
EP0033882B1 (de) * 1980-01-25 1985-09-04 Demolux GmbH & Co.KG. Verfahren zur Herstellung eines optisch aktiven Flächengebildes
DE3106539C2 (de) * 1980-02-22 1994-09-01 Ricoh Kk Rasterobjektiv
US4390994A (en) * 1980-07-14 1983-06-28 Roberts James R Laser utilizing coated, multicapillary array as output window
JPS5810033A (ja) * 1981-05-26 1983-01-20 オリンパス光学工業株式会社 内視鏡用照明光学系
US4673918A (en) * 1984-11-29 1987-06-16 Zenith Electronics Corporation Light guide having focusing element and internal reflector on same face
NO159899C (no) * 1986-03-25 1989-02-15 Kjell Hansen Skjerm for bildefremvisning og/eller -opptak.
JPS6335114A (ja) * 1986-07-28 1988-02-15 三洋電機株式会社 異常状態検出装置
SE455237B (sv) * 1986-10-28 1988-06-27 Philips Norden Ab Monolitiskt spegelobjektiv och optiskt arrangemang innefattande tva sadana spegelobjektiv
JPS63164386A (ja) * 1986-12-26 1988-07-07 Matsushita Electric Ind Co Ltd 半導体レ−ザ
US5004673A (en) * 1987-04-20 1991-04-02 Environmental Research Institute Of Michigan Method of manufacturing surface relief patterns of variable cross-sectional geometry
KR910008990B1 (ko) * 1987-06-03 1991-10-26 미츠비시 덴키 가부시키가이샤 레이저장치
US4797893A (en) * 1987-06-09 1989-01-10 Virgo Optics, Inc. Microlaser system
DE3729053A1 (de) * 1987-08-31 1989-03-16 Deutsche Forsch Luft Raumfahrt Hochleistungs-bandleiterlaser
US4890289A (en) * 1987-12-04 1989-12-26 Board Of Trustees Of Leland Stanford, Jr. University Fiber coupled diode pumped moving solid state laser
US4871232A (en) * 1987-12-07 1989-10-03 Hughes Aircraft Company Method and apparatus for ultra high frequency spectrum analysis
US4953166A (en) * 1988-02-02 1990-08-28 Massachusetts Institute Of Technology Microchip laser
FR2630832B1 (fr) * 1988-04-29 1995-06-02 Thomson Csf Systeme de miroirs pour le guidage d'une onde electromagnetique
US5021742A (en) * 1988-09-19 1991-06-04 Science Research Laboratory, Inc. Laser amplifier
US5355246A (en) * 1988-10-12 1994-10-11 Fuji Electric Co., Ltd. Wavelength conversion device
US5173799A (en) * 1988-10-12 1992-12-22 Fuji Electric Co., Ltd. Wavelength conversion device
US4952026A (en) * 1988-10-14 1990-08-28 Corning Incorporated Integral optical element and method
JP2713745B2 (ja) * 1988-11-16 1998-02-16 浜松ホトニクス株式会社 光励起固体レーザー
GB8829875D0 (en) * 1988-12-22 1989-02-15 Lumonics Ltd Optically pumped lasers
US4912022A (en) * 1988-12-27 1990-03-27 Motorola, Inc. Method for sloping the profile of an opening in resist
JPH0324781A (ja) * 1989-06-22 1991-02-01 Hamamatsu Photonics Kk レーザ発生装置における位相整合方法
US4916712A (en) * 1989-07-27 1990-04-10 Mcdonnell Douglas Corporation Optically pumped slab laser
JPH03203386A (ja) * 1989-12-29 1991-09-05 Hoya Corp コンポジット・スラブ型レーザ媒体
JP2528371B2 (ja) * 1989-12-29 1996-08-28 ホーヤ株式会社 多波長ビ―ムスプリッタ装置
US5095664A (en) * 1990-01-30 1992-03-17 Massachusetts Institute Of Technology Optical surface polishing method
US5117437A (en) * 1990-03-02 1992-05-26 The University Of Michigan Continuous-wave pair-pumped laser system
US5316640A (en) * 1991-06-19 1994-05-31 Matsushita Electric Industrial Co., Ltd. Fabricating method of micro lens
CA2071598C (en) * 1991-06-21 1999-01-19 Akira Eda Optical device and method of manufacturing the same
DE69225130T2 (de) * 1991-08-30 1998-09-17 Mitsui Chemicals Inc Optischer spiegel und diesen verwendende vorrichtung
US5224198A (en) * 1991-09-30 1993-06-29 Motorola, Inc. Waveguide virtual image display
US5245454A (en) * 1991-12-31 1993-09-14 At&T Bell Laboratories Lcd display with microtextured back reflector and method for making same
US5518863A (en) * 1992-01-31 1996-05-21 Institut National D'optique Method of changing the optical invariant of multifiber fiber-optic elements
JPH06209135A (ja) * 1992-11-06 1994-07-26 Mitsui Petrochem Ind Ltd 固体レーザ装置

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EP0523861A2 (de) 1993-01-20
CA2071598A1 (en) 1992-12-22
EP0523861A3 (en) 1993-07-28
CA2071598C (en) 1999-01-19
US6178035B1 (en) 2001-01-23
EP0523861B1 (de) 2001-03-28
KR960014113B1 (ko) 1996-10-14
US5999325A (en) 1999-12-07
US5728509A (en) 1998-03-17
DE69231756D1 (de) 2001-05-03

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