DE69130896D1 - Strahlungsempfindliche positiv arbeitende Lackzusammensetzung - Google Patents

Strahlungsempfindliche positiv arbeitende Lackzusammensetzung

Info

Publication number
DE69130896D1
DE69130896D1 DE69130896T DE69130896T DE69130896D1 DE 69130896 D1 DE69130896 D1 DE 69130896D1 DE 69130896 T DE69130896 T DE 69130896T DE 69130896 T DE69130896 T DE 69130896T DE 69130896 D1 DE69130896 D1 DE 69130896D1
Authority
DE
Germany
Prior art keywords
radiation sensitive
paint composition
positive working
working paint
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69130896T
Other languages
English (en)
Other versions
DE69130896T2 (de
Inventor
Hiroshi Moriuma
Haruyoshi Osaki
Takeshi Hioki
Yasunori Uetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69130896D1 publication Critical patent/DE69130896D1/de
Application granted granted Critical
Publication of DE69130896T2 publication Critical patent/DE69130896T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE69130896T 1990-06-14 1991-06-13 Strahlungsempfindliche positiv arbeitende Lackzusammensetzung Expired - Fee Related DE69130896T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2156877A JPH0450851A (ja) 1990-06-14 1990-06-14 ポジ型感放射線性レジスト組成物

Publications (2)

Publication Number Publication Date
DE69130896D1 true DE69130896D1 (de) 1999-03-25
DE69130896T2 DE69130896T2 (de) 1999-06-17

Family

ID=15637344

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130896T Expired - Fee Related DE69130896T2 (de) 1990-06-14 1991-06-13 Strahlungsempfindliche positiv arbeitende Lackzusammensetzung

Country Status (6)

Country Link
US (1) US5188920A (de)
EP (1) EP0461654B1 (de)
JP (1) JPH0450851A (de)
KR (1) KR920001243A (de)
CA (1) CA2044560A1 (de)
DE (1) DE69130896T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2711590B2 (ja) † 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2743697B2 (ja) * 1991-04-26 1998-04-22 日本ゼオン株式会社 ポジ型レジスト組成物
JPH05158233A (ja) * 1991-12-04 1993-06-25 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
EP0550893A1 (de) * 1992-01-10 1993-07-14 Minnesota Mining And Manufacturing Company Lichtempfindliche Schicht für positiv/negativ Kopiermaterial
US5318875A (en) * 1992-02-12 1994-06-07 Fuji Photo Film Co., Ltd. Positive quinonediazide photoresist composition containing select hydroxyphenol additive
JPH05249666A (ja) * 1992-03-05 1993-09-28 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JPH05323604A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5275911A (en) * 1993-02-01 1994-01-04 Ocg Microelectronic Materials, Inc. Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
JPH07281428A (ja) * 1994-04-07 1995-10-27 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
EP0695740B1 (de) 1994-08-05 2000-11-22 Sumitomo Chemical Company Limited Sulfonsäurechinondiazidester und diese enthaltende positiv-arbeitende Fotolackzusammensetzungen
US5580602A (en) * 1994-09-01 1996-12-03 International Business Machines Corporation Process for making a thin film magnetic head
JP3549592B2 (ja) * 1994-11-02 2004-08-04 クラリアント インターナショナル リミテッド 放射線感応性組成物
US5939134A (en) * 1996-07-10 1999-08-17 International Business Machines Corporation Process for making a thin film magnetic head
JP3666839B2 (ja) * 1998-01-23 2005-06-29 東京応化工業株式会社 ポジ型ホトレジスト組成物およびその製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
US4059449A (en) * 1976-09-30 1977-11-22 Rca Corporation Photoresist containing a thiodipropionate compound
JPS59150047A (ja) * 1983-02-15 1984-08-28 Hitachi Metals Ltd 形状記憶合金およびその製造方法
US4891311A (en) * 1984-02-03 1990-01-02 Abbott Laboratories Stabilized enzyme conjugate composition
JP2625882B2 (ja) * 1988-05-17 1997-07-02 住友化学工業株式会社 ポジ型レジスト用組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
EP0461654A2 (de) 1991-12-18
EP0461654A3 (en) 1992-04-22
EP0461654B1 (de) 1999-02-17
CA2044560A1 (en) 1991-12-15
KR920001243A (ko) 1992-01-30
JPH0450851A (ja) 1992-02-19
DE69130896T2 (de) 1999-06-17
US5188920A (en) 1993-02-23

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee