DE69128384D1 - Heteroübergang-Bipolartransistor - Google Patents

Heteroübergang-Bipolartransistor

Info

Publication number
DE69128384D1
DE69128384D1 DE69128384T DE69128384T DE69128384D1 DE 69128384 D1 DE69128384 D1 DE 69128384D1 DE 69128384 T DE69128384 T DE 69128384T DE 69128384 T DE69128384 T DE 69128384T DE 69128384 D1 DE69128384 D1 DE 69128384D1
Authority
DE
Germany
Prior art keywords
bipolar transistor
heterojunction bipolar
heterojunction
transistor
bipolar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69128384T
Other languages
English (en)
Other versions
DE69128384T2 (de
Inventor
Kouhei Morizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69128384D1 publication Critical patent/DE69128384D1/de
Publication of DE69128384T2 publication Critical patent/DE69128384T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/737Hetero-junction transistors
    • H01L29/7371Vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
DE69128384T 1990-03-30 1991-03-28 Heteroübergang-Bipolartransistor Expired - Fee Related DE69128384T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2084373A JP2918275B2 (ja) 1990-03-30 1990-03-30 半導体装置

Publications (2)

Publication Number Publication Date
DE69128384D1 true DE69128384D1 (de) 1998-01-22
DE69128384T2 DE69128384T2 (de) 1998-04-30

Family

ID=13828732

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128384T Expired - Fee Related DE69128384T2 (de) 1990-03-30 1991-03-28 Heteroübergang-Bipolartransistor

Country Status (4)

Country Link
US (1) US5153692A (de)
EP (1) EP0472262B1 (de)
JP (1) JP2918275B2 (de)
DE (1) DE69128384T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2716036B1 (fr) * 1994-02-07 1997-07-11 Mitsubishi Electric Corp Couche semi-conductrice composée de haute résistance et procédé pour sa croissance cristalline.
US5804487A (en) * 1996-07-10 1998-09-08 Trw Inc. Method of fabricating high βHBT devices
DE10329663B9 (de) * 2003-07-01 2015-08-13 Infineon Technologies Ag Verfahren zur Herstellung einer vertikalen Isolation für ein elektronisches Bauelement
CN103107185B (zh) * 2011-11-11 2015-04-08 上海华虹宏力半导体制造有限公司 锗硅功率hbt、其制造方法及锗硅功率hbt多指器件

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4586071A (en) * 1984-05-11 1986-04-29 International Business Machines Corporation Heterostructure bipolar transistor
JPH0744182B2 (ja) * 1984-11-09 1995-05-15 株式会社日立製作所 ヘテロ接合バイポ−ラ・トランジスタ

Also Published As

Publication number Publication date
JP2918275B2 (ja) 1999-07-12
EP0472262A1 (de) 1992-02-26
US5153692A (en) 1992-10-06
DE69128384T2 (de) 1998-04-30
EP0472262B1 (de) 1997-12-10
JPH03283624A (ja) 1991-12-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee