DE69122598D1 - Integrierte Struktur eines bipolaren Leistungstransistors und eines Wiederspannungsbipolartransistors in Emittorschaltungs- oder Halbbrückenanordnung und dies bezügliche Herstellungsverfahren - Google Patents
Integrierte Struktur eines bipolaren Leistungstransistors und eines Wiederspannungsbipolartransistors in Emittorschaltungs- oder Halbbrückenanordnung und dies bezügliche HerstellungsverfahrenInfo
- Publication number
- DE69122598D1 DE69122598D1 DE69122598T DE69122598T DE69122598D1 DE 69122598 D1 DE69122598 D1 DE 69122598D1 DE 69122598 T DE69122598 T DE 69122598T DE 69122598 T DE69122598 T DE 69122598T DE 69122598 D1 DE69122598 D1 DE 69122598D1
- Authority
- DE
- Germany
- Prior art keywords
- transistor
- bipolar
- integrated structure
- emitter circuit
- bridge arrangement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8222—Bipolar technology
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0825—Combination of vertical direct transistors of the same conductivity type having different characteristics,(e.g. Darlington transistors)
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT02257790A IT1246759B (it) | 1990-12-31 | 1990-12-31 | Struttura integrata di transistore bipolare di potenza e di transistore bipolare di bassa tensione nelle configurazioni ''emitter switching'' o ''semi-ponte'' e relativi processi di fabbricazione. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69122598D1 true DE69122598D1 (de) | 1996-11-14 |
DE69122598T2 DE69122598T2 (de) | 1997-03-06 |
Family
ID=11198032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69122598T Expired - Fee Related DE69122598T2 (de) | 1990-12-31 | 1991-12-18 | Integrierte Struktur eines bipolaren Leistungstransistors und eines Wiederspannungsbipolartransistors in Emittorschaltungs- oder Halbbrückenanordnung und dies bezügliche Herstellungsverfahren |
Country Status (5)
Country | Link |
---|---|
US (2) | US5376821A (de) |
EP (1) | EP0493854B1 (de) |
JP (1) | JP3166980B2 (de) |
DE (1) | DE69122598T2 (de) |
IT (1) | IT1246759B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5866461A (en) * | 1990-12-30 | 1999-02-02 | Stmicroelectronics S.R.L. | Method for forming an integrated emitter switching configuration using bipolar transistors |
DE69315813T2 (de) * | 1992-12-28 | 1998-06-10 | Koninkl Philips Electronics Nv | Kaskodenschaltungsstruktur mit bipolaren Epitoxial-Transistoren und niedrig gelegenem Basisanschluss |
EP0810662A1 (de) * | 1996-05-29 | 1997-12-03 | Co.Ri.M.Me. Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | Integriertes Bauteil in Emitterschalteranordnung und mit einer zellularen Struktur |
EP0977264B1 (de) * | 1998-07-31 | 2006-04-26 | Freescale Semiconductor, Inc. | Halbleiterstruktur für Treiberschaltkreise mit Pegelverschiebung |
KR100922423B1 (ko) * | 2002-09-06 | 2009-10-16 | 페어차일드코리아반도체 주식회사 | 바이폴라 트랜지스터 및 그 제조방법 |
WO2005020330A1 (de) * | 2003-08-13 | 2005-03-03 | Atmel Germany Gmbh | Verfahren zur verbesserung elektrischer eigenschaften aktiver bipolarbauelemente |
DE102004037186B4 (de) * | 2003-08-13 | 2010-04-15 | Atmel Automotive Gmbh | Bipolares Halbleiterbauelement mit Kaskodenstruktur und Verfahren zur Herstellung desselben |
JP4775683B2 (ja) * | 2003-09-29 | 2011-09-21 | オンセミコンダクター・トレーディング・リミテッド | 半導体集積回路装置 |
DE102004037252A1 (de) | 2004-07-31 | 2006-03-23 | Atmel Germany Gmbh | Verfahren zur Integration von drei Bipolartransistoren in einem Halbleiterkörper, Mehrschichtbauelement und Halbleiteranordnung |
DE102004044835B4 (de) | 2004-09-14 | 2008-12-11 | Atmel Germany Gmbh | Integrierte Halbleiter-Kaskodenschaltung für Hochfrequenzanwendungen |
DE102005009725A1 (de) * | 2005-03-03 | 2006-09-07 | Atmel Germany Gmbh | Verfahren zur Integration von zwei Bipolartransistoren in einen Halbleiterkörper, Halbleiteranordnung in einem Halbleiterkörper und Kaskodenschaltung |
FR2919896B1 (fr) * | 2007-08-07 | 2009-10-30 | Snecma Sa | Turboreacteur comprenant un generateur de courant monte dans la soufflante et un procede de montage dudit generateur dans la soufflante |
US8598008B2 (en) * | 2010-10-20 | 2013-12-03 | Texas Instruments Incorporated | Stacked ESD clamp with reduced variation in clamp voltage |
CN109459915B (zh) * | 2018-11-06 | 2022-02-01 | 恒科科技产业有限公司 | 一种打印机墨粉耗材制作加工设备及墨粉耗材制作工艺 |
CN116153992B (zh) * | 2023-04-21 | 2023-06-23 | 上海陆芯电子科技有限公司 | 一种逆导型绝缘栅双极型晶体管 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4458158A (en) * | 1979-03-12 | 1984-07-03 | Sprague Electric Company | IC Including small signal and power devices |
IT1217323B (it) * | 1987-12-22 | 1990-03-22 | Sgs Microelettronica Spa | Struttura integrata di transistor bipolare di potenza di alta tensione e di transistor mos di potenza di bassa tensione nella configurazione"emitter switching"e relativo processo di fabbricazione |
IT1217322B (it) * | 1987-12-22 | 1990-03-22 | Sgs Microelettronica Spa | Procedimento di fabbricazione di un dispositivo nonolitico a semiconduttope comprendente almeno un transistor di un circuito integrato di comando e un transistor di rotenza in tegrato nella stessa piastrina |
EP0347550A3 (de) * | 1988-06-21 | 1991-08-28 | Texas Instruments Incorporated | Verfahren zur Herstellung von isolierten vertikalen und superverstärkenden Bipolar-Transistoren |
IT1234252B (it) * | 1989-06-16 | 1992-05-14 | Sgs Thomson Microelectronics | Dispositivo a semiconduttore comprendente un circuito di comando e uno stadio di potenza a flusso di corrente verticale integrati in modo monolitico nella stessa piastrina e relativo processo di fabbricazione |
-
1990
- 1990-12-31 IT IT02257790A patent/IT1246759B/it active IP Right Grant
-
1991
- 1991-11-20 JP JP30482391A patent/JP3166980B2/ja not_active Expired - Fee Related
- 1991-12-18 EP EP91203337A patent/EP0493854B1/de not_active Expired - Lifetime
- 1991-12-18 DE DE69122598T patent/DE69122598T2/de not_active Expired - Fee Related
- 1991-12-23 US US07/812,704 patent/US5376821A/en not_active Expired - Lifetime
-
1994
- 1994-07-11 US US08/273,589 patent/US5500551A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0613556A (ja) | 1994-01-21 |
JP3166980B2 (ja) | 2001-05-14 |
EP0493854A1 (de) | 1992-07-08 |
EP0493854B1 (de) | 1996-10-09 |
IT9022577A1 (it) | 1992-07-01 |
US5376821A (en) | 1994-12-27 |
IT1246759B (it) | 1994-11-26 |
US5500551A (en) | 1996-03-19 |
IT9022577A0 (it) | 1990-12-31 |
DE69122598T2 (de) | 1997-03-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR900015317A (ko) | 단일집적회로의 칩내에 수직형 바이폴라 트랜지스터와 고압 cmos트랜지스터를 형성하는 공정 | |
DE69122598T2 (de) | Integrierte Struktur eines bipolaren Leistungstransistors und eines Wiederspannungsbipolartransistors in Emittorschaltungs- oder Halbbrückenanordnung und dies bezügliche Herstellungsverfahren | |
DE68925308D1 (de) | Integrierte Grabentransistorstruktur und Herstellungsverfahren | |
DE69118952D1 (de) | Halbleitervorrichtung mit integrierter Halbleiterschaltung und Betriebsverfahren dafür | |
DE68925116D1 (de) | In gemischter Technologie hergestellte integrierte Schaltung mit CMOS-Strukturen und leistungsfähigen lateralen Bipolartransistoren mit erhöhter Early-Spannung und Herstellungsverfahren dafür | |
DE69125390D1 (de) | Laterale Bipolartransistorstruktur mit integriertem Kontrollschaltkreis und integriertem Leistungstransistor und deren Herstellungsprozess | |
DE69031488T2 (de) | Halbleitervorrichtung mit einem lateralen Bipolartransistor und entsprechende Herstellungsverfahren | |
DE3855603D1 (de) | Integrierter bipolarer Hochspannungsleistungstransistor und Niederspannungs-MOS-Transistorstruktur in Emitterumschaltkonfiguration und Herstellungsverfahren | |
DE69402221D1 (de) | Bipolartransistoren und deren Herstellungsverfahren | |
DE69429906D1 (de) | Halbleiterstruktur und Herstellungsverfahren | |
DE69221966D1 (de) | Halbleiteranordnung mit verschmolzenen bipolaren und MOS-Transistoren und Herstellungsverfahren | |
KR910010622A (ko) | 바이폴라트랜지스터의 제조방법 | |
KR910002005A (ko) | 바이폴라트랜지스터와 그 제조방법 | |
DE69408248T2 (de) | Bipolares Halbleiterbauelement und Herstellungsverfahren | |
EP0300803A3 (en) | High-frequency bipolar transistor and its fabrication method | |
DE59509632D1 (de) | Bipolartransistor und Herstellungsverfahren | |
DE68926387D1 (de) | Wärmebeständige Kunststoffpaste sowie damit hergestellte integrierte Schaltungsanordnung | |
DE69023469T2 (de) | Integrierte Schaltung und Herstellungsverfahren dafür. | |
BR8905540A (pt) | Dispositivo semicondutor que possui transistores verticais bipolares complementares e processo de fabricacao do mesmo | |
DE69231543T2 (de) | Mikrowellenbipolartransistor mit Heteroübergang, und entsprechende integrierete Schaltung und Herstellungsverfahren | |
DE3481746D1 (de) | Bipolartransistor mit heterouebergang zwischen basis und kollektor. | |
KR900007103A (ko) | 반도체 집적회로와 그 제조방법 | |
EP0335720A3 (en) | Bipolar transistor device and method of manufacturing the same | |
DE69534105D1 (de) | Herstellungsverfahren eines integrierten schaltkreises mit komplementären isolierten bipolartransistoren | |
KR900005616A (ko) | 고성능 바이폴라 트랜지스터 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |