DE69120849D1 - Lawinenphotodiode - Google Patents

Lawinenphotodiode

Info

Publication number
DE69120849D1
DE69120849D1 DE69120849T DE69120849T DE69120849D1 DE 69120849 D1 DE69120849 D1 DE 69120849D1 DE 69120849 T DE69120849 T DE 69120849T DE 69120849 T DE69120849 T DE 69120849T DE 69120849 D1 DE69120849 D1 DE 69120849D1
Authority
DE
Germany
Prior art keywords
avalanche photodiode
avalanche
photodiode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69120849T
Other languages
English (en)
Other versions
DE69120849T2 (de
Inventor
Kagawa Toschiaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of DE69120849D1 publication Critical patent/DE69120849D1/de
Application granted granted Critical
Publication of DE69120849T2 publication Critical patent/DE69120849T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
    • H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
    • H01L31/035236—Superlattices; Multiple quantum well structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Light Receiving Elements (AREA)
DE69120849T 1990-04-09 1991-04-08 Lawinenphotodiode Expired - Fee Related DE69120849T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP9212490 1990-04-09
JP2243755A JP2934294B2 (ja) 1990-04-09 1990-09-17 アバランシェフォトダイオード

Publications (2)

Publication Number Publication Date
DE69120849D1 true DE69120849D1 (de) 1996-08-22
DE69120849T2 DE69120849T2 (de) 1997-02-27

Family

ID=26433604

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69120849T Expired - Fee Related DE69120849T2 (de) 1990-04-09 1991-04-08 Lawinenphotodiode

Country Status (4)

Country Link
US (1) US5075750A (de)
EP (1) EP0451931B1 (de)
JP (1) JP2934294B2 (de)
DE (1) DE69120849T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2682253B2 (ja) * 1991-04-18 1997-11-26 三菱電機株式会社 アバランシェ・フォトダイオード及びその製造方法
JP2762939B2 (ja) * 1994-03-22 1998-06-11 日本電気株式会社 超格子アバランシェフォトダイオード
JP2601231B2 (ja) * 1994-12-22 1997-04-16 日本電気株式会社 超格子アバランシェフォトダイオード
US5610416A (en) * 1995-02-16 1997-03-11 Hewlett-Packard Company Avalanche photodiode with epitaxially regrown guard rings
US5988223A (en) * 1996-11-28 1999-11-23 Kabushiki Kaisha Toyoda Jidoshokki Seisakusho Sealing plug device for a refrigerant compressor
US5866936A (en) * 1997-04-01 1999-02-02 Hewlett-Packard Company Mesa-structure avalanche photodiode having a buried epitaxial junction
US6353250B1 (en) * 1997-11-07 2002-03-05 Nippon Telegraph And Telephone Corporation Semiconductor photo-detector, semiconductor photo-detection device, and production methods thereof
JPH11210629A (ja) * 1998-01-21 1999-08-03 Toyota Autom Loom Works Ltd 圧縮機の封栓装置
JP3141847B2 (ja) * 1998-07-03 2001-03-07 日本電気株式会社 アバランシェフォトダイオード
JP2001332759A (ja) 2000-03-16 2001-11-30 Matsushita Electric Ind Co Ltd アバランシェフォトダイオード
JP4220688B2 (ja) * 2001-02-26 2009-02-04 日本オプネクスト株式会社 アバランシェホトダイオード
JP2003168818A (ja) * 2001-09-18 2003-06-13 Anritsu Corp 順メサ型アバランシェフォトダイオード及びその製造方法
US6720588B2 (en) 2001-11-28 2004-04-13 Optonics, Inc. Avalanche photodiode for photon counting applications and method thereof
US7072557B2 (en) * 2001-12-21 2006-07-04 Infinera Corporation InP-based photonic integrated circuits with Al-containing waveguide cores and InP-based array waveguide gratings (AWGs) and avalanche photodiodes (APDs) and other optical components containing an InAlGaAs waveguide core
KR100811365B1 (ko) * 2002-02-01 2008-03-07 피코메트릭스 인코포레이티드 플레이너 애벌란시 포토다이오드
JP4755854B2 (ja) * 2005-06-02 2011-08-24 富士通株式会社 半導体受光装置及びその製造方法
JP4234116B2 (ja) * 2005-06-27 2009-03-04 Ｎｔｔエレクトロニクス株式会社 アバランシ・フォトダイオード
US7652252B1 (en) * 2007-10-08 2010-01-26 Hrl Laboratories, Llc Electronically tunable and reconfigurable hyperspectral photon detector
US7755023B1 (en) 2007-10-09 2010-07-13 Hrl Laboratories, Llc Electronically tunable and reconfigurable hyperspectral photon detector
WO2009139936A2 (en) * 2008-02-14 2009-11-19 California Institute Of Technology Single photon detection with self-quenching multiplication
US9671489B1 (en) * 2013-03-15 2017-06-06 Epitaxial Technologies, Llc Electromagnetic sensor and optical detection system for detecting angle of arrival of optical signals and a range of a source of the optical signals
US10381502B2 (en) * 2015-09-09 2019-08-13 Teledyne Scientific & Imaging, Llc Multicolor imaging device using avalanche photodiode
KR102562806B1 (ko) * 2018-07-11 2023-08-01 에스알아이 인터내셔널 과잉 잡음이 없는 선형 모드 아발란체 포토다이오드들

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5861679A (ja) * 1981-10-07 1983-04-12 Kokusai Denshin Denwa Co Ltd <Kdd> 量子井戸層付アバランシ・ホトダイオ−ド
JPS6016474A (ja) * 1983-07-08 1985-01-28 Nec Corp ヘテロ多重接合型光検出器
JPH01144687A (ja) * 1987-11-30 1989-06-06 Nec Corp 半導体受光素子
JPH01194476A (ja) * 1988-01-29 1989-08-04 Nec Corp 半導体受光素子
JPH01296676A (ja) * 1988-05-24 1989-11-30 Nec Corp 半導体受光装置
JPH02119274A (ja) * 1988-10-28 1990-05-07 Fujitsu Ltd アバランシェフォトダイオード
JPH0821727B2 (ja) * 1988-11-18 1996-03-04 日本電気株式会社 アバランシェフォトダイオード

Also Published As

Publication number Publication date
US5075750A (en) 1991-12-24
EP0451931A1 (de) 1991-10-16
JPH0410478A (ja) 1992-01-14
DE69120849T2 (de) 1997-02-27
EP0451931B1 (de) 1996-07-17
JP2934294B2 (ja) 1999-08-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee