DE69115070D1 - Verfahren zur Herstellung einer magnetischen Struktur. - Google Patents

Verfahren zur Herstellung einer magnetischen Struktur.

Info

Publication number
DE69115070D1
DE69115070D1 DE69115070T DE69115070T DE69115070D1 DE 69115070 D1 DE69115070 D1 DE 69115070D1 DE 69115070 T DE69115070 T DE 69115070T DE 69115070 T DE69115070 T DE 69115070T DE 69115070 D1 DE69115070 D1 DE 69115070D1
Authority
DE
Germany
Prior art keywords
making
magnetic structure
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69115070T
Other languages
English (en)
Inventor
Robert Edward Fontana
Frances Anne Houle
Ching Hwa Tsang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69115070D1 publication Critical patent/DE69115070D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3929—Disposition of magnetic thin films not used for directly coupling magnetic flux from the track to the MR film or for shielding
    • G11B5/3932—Magnetic biasing films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/22—Heat treatment; Thermal decomposition; Chemical vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thermal Sciences (AREA)
  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
DE69115070T 1990-02-06 1991-02-04 Verfahren zur Herstellung einer magnetischen Struktur. Expired - Lifetime DE69115070D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US47561190A 1990-02-06 1990-02-06

Publications (1)

Publication Number Publication Date
DE69115070D1 true DE69115070D1 (de) 1996-01-18

Family

ID=23888358

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69115070T Expired - Lifetime DE69115070D1 (de) 1990-02-06 1991-02-04 Verfahren zur Herstellung einer magnetischen Struktur.

Country Status (4)

Country Link
US (3) US5503870A (de)
EP (1) EP0441581B1 (de)
JP (1) JPH03242983A (de)
DE (1) DE69115070D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0612061B1 (de) * 1993-02-17 1998-08-26 International Business Machines Corporation Magnetoresistiver Lesewandler
EP0634740B1 (de) * 1993-07-13 1999-09-22 International Business Machines Corporation Magnetoresistiver Lesewandler
JPH0817020A (ja) * 1994-06-30 1996-01-19 Sony Corp 磁気抵抗効果型薄膜磁気ヘッド
US5664316A (en) * 1995-01-17 1997-09-09 International Business Machines Corporation Method of manufacturing magnetoresistive read transducer having a contiguous longitudinal bias layer
US5820924A (en) * 1996-05-16 1998-10-13 Honeywell Inc. Method of fabricating a magnetoresistive sensor
US7473656B2 (en) * 2003-10-23 2009-01-06 International Business Machines Corporation Method for fast and local anneal of anti-ferromagnetic (AF) exchange-biased magnetic stacks
WO2005067227A1 (ja) * 2004-01-09 2005-07-21 Nec Corporation 負荷分散方法、ノード及び制御プログラム
US7405907B2 (en) * 2004-08-03 2008-07-29 O-Mass As Adjacent magnetoresistive read head and method for obtaining position error signal

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US3197334A (en) * 1962-11-06 1965-07-27 Jr William L Wade Method of coating a substrate with magnetic ferrite film
US3667100A (en) * 1969-03-25 1972-06-06 Thomson Houston Comp Francaise Method of manufacturing composite wire products having a tungsten core and a magnetic covering
US3676867A (en) * 1970-12-07 1972-07-11 Bell Telephone Labor Inc USE OF MnAlGe IN MAGNETIC STORAGE DEVICES
US3900593A (en) * 1972-06-16 1975-08-19 Corning Glass Works Method of producing magnetic metal oxide films bonded to a substrate
US3840898A (en) * 1972-12-29 1974-10-08 Ibm Self-biased magnetoresistive sensor
US3887944A (en) * 1973-06-29 1975-06-03 Ibm Method for eliminating part of magnetic crosstalk in magnetoresistive sensors
DE2512115C3 (de) * 1975-03-19 1979-06-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung mikroskopisch kleiner Metall- und Metallegierungs-Strukturen für einen Zylinderdomänenspeicher
JPS548291A (en) * 1977-06-22 1979-01-22 Hitachi Ltd Pedestal supporting structure for reactor pressure vessel
US4236946A (en) * 1978-03-13 1980-12-02 International Business Machines Corporation Amorphous magnetic thin films with highly stable easy axis
DE2832731A1 (de) * 1978-07-26 1980-02-07 Vacuumschmelze Gmbh Magnetkern aus einer weichmagnetischen amorphen legierung
US4308592A (en) * 1979-06-29 1981-12-29 International Business Machines Corporation Patterned kill of magnetoresistive layer in bubble domain chip
JPS5656605A (en) * 1979-10-13 1981-05-18 Inoue Japax Res Inc Treatment of magnetic material
US4268584A (en) * 1979-12-17 1981-05-19 International Business Machines Corporation Nickel-X/gold/nickel-X conductors for solid state devices where X is phosphorus, boron, or carbon
FR2513430A1 (fr) * 1981-09-21 1983-03-25 Commissariat Energie Atomique Procede d'obtention d'une couche a aimantation plane homogene dans un grenat ferrimagnetique
US4533582A (en) * 1982-05-21 1985-08-06 International Business Machines Corporation Stabilized magnetic recording materials and process for tailoring and stabilizing of magnetic recording materials
JPS5933962A (ja) * 1982-08-20 1984-02-24 Oki Electric Ind Co Ltd デイジタルｍｓｋ変調器
US4664941A (en) * 1984-01-24 1987-05-12 Intel Corporation Confinement channels for magnetic bubble memory devices
KR940004986B1 (ko) * 1984-08-27 1994-06-09 가부시기가이샤 히다찌세이사꾸쇼 자성막의 제조방법 및 그것을 사용한 자기헤드
JPS6233413A (ja) * 1985-08-06 1987-02-13 Nec Corp 軟磁性薄膜コアの製造方法
US4684547A (en) * 1985-12-27 1987-08-04 International Business Machines Corporation Format patterning method for magnetic recording media
US4897288A (en) * 1987-01-28 1990-01-30 Honeywell Inc. Vialess shorting bars for magnetoresistive devices
DE3803013A1 (de) * 1988-02-02 1989-08-10 Basf Ag Verfahren zur herstellung eines flaechenfoermigen, mehrschichtigen, magneto-optischen aufzeichnungsmaterials
US5100692A (en) * 1988-03-09 1992-03-31 Kabushiki Kaisha Toshiba Method of forming a magnetically modified portion
US4809109A (en) * 1988-03-25 1989-02-28 International Business Machines Corporation Magnetoresistive read transducer and method for making the improved transducer
US4940511A (en) * 1988-03-28 1990-07-10 International Business Machines Corporation Method for making a magnetoresistive read transducer
US4994320A (en) * 1988-06-08 1991-02-19 Eastman Kodak Company Thin magnetic film having long term stabilized uniaxial anisotropy
US4925700A (en) * 1988-10-28 1990-05-15 International Business Machines Corporation Process for fabricating high density disc storage device
US5005096A (en) 1988-12-21 1991-04-02 International Business Machines Corporation Magnetoresistive read transducer having hard magnetic shunt bias
FR2651912B1 (fr) * 1989-09-12 1991-10-31 Europ Composants Electron Procede de realisation des pieces polaires et de l'entrefer de tetes magnetiques en couches minces pour application informatique audio ou video.
US5018037A (en) 1989-10-10 1991-05-21 Krounbi Mohamad T Magnetoresistive read transducer having hard magnetic bias
US5252367A (en) * 1989-10-27 1993-10-12 Kabushiki Kaisha Kobe Seiko Sho Method of manufacturing a magnetic recording medium
US5014147A (en) 1989-10-31 1991-05-07 International Business Machines Corporation Magnetoresistive sensor with improved antiferromagnetic film
FR2655463B1 (fr) * 1989-12-06 1995-06-30 Commissariat Energie Atomique Procede de preparation d'une memoire magnetooptique.
JP3086731B2 (ja) * 1991-09-30 2000-09-11 株式会社東芝 磁気抵抗効果型磁気ヘッド
JPH05266434A (ja) * 1992-03-24 1993-10-15 Hitachi Ltd 磁気抵抗効果再生ヘッド
JPH0766033A (ja) * 1993-08-30 1995-03-10 Mitsubishi Electric Corp 磁気抵抗素子ならびにその磁気抵抗素子を用いた磁性薄膜メモリおよび磁気抵抗センサ
JPH07254116A (ja) * 1994-03-16 1995-10-03 Fuji Electric Co Ltd 薄膜磁気ヘッドの熱処理方法
JP3184400B2 (ja) * 1994-06-07 2001-07-09 アルプス電気株式会社 薄膜磁気ヘッドおよびその製造方法

Also Published As

Publication number Publication date
US5503870A (en) 1996-04-02
US5582860A (en) 1996-12-10
EP0441581B1 (de) 1995-12-06
EP0441581A2 (de) 1991-08-14
JPH03242983A (ja) 1991-10-29
EP0441581A3 (en) 1992-09-09
US6188550B1 (en) 2001-02-13

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Legal Events

Date Code Title Description
8332 No legal effect for de