DE69111671T2 - Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen. - Google Patents

Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen.

Info

Publication number
DE69111671T2
DE69111671T2 DE1991611671 DE69111671T DE69111671T2 DE 69111671 T2 DE69111671 T2 DE 69111671T2 DE 1991611671 DE1991611671 DE 1991611671 DE 69111671 T DE69111671 T DE 69111671T DE 69111671 T2 DE69111671 T2 DE 69111671T2
Authority
DE
Germany
Prior art keywords
housing
substrate
sputtering
decontaminated
electrically conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1991611671
Other languages
German (de)
English (en)
Other versions
DE69111671D1 (de
Inventor
Philippe Bosch
Jean-Joseph Maurel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of DE69111671D1 publication Critical patent/DE69111671D1/de
Application granted granted Critical
Publication of DE69111671T2 publication Critical patent/DE69111671T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/005Decontamination of the surface of objects by ablation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Food Science & Technology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE1991611671 1990-04-27 1991-04-25 Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen. Expired - Fee Related DE69111671T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9005417A FR2661544B1 (fr) 1990-04-27 1990-04-27 Procede et dispositif de decontamination par decapage ionique.

Publications (2)

Publication Number Publication Date
DE69111671D1 DE69111671D1 (de) 1995-09-07
DE69111671T2 true DE69111671T2 (de) 1996-04-04

Family

ID=9396183

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991611671 Expired - Fee Related DE69111671T2 (de) 1990-04-27 1991-04-25 Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen.

Country Status (4)

Country Link
EP (1) EP0454584B1 (fr)
JP (1) JP2892857B2 (fr)
DE (1) DE69111671T2 (fr)
FR (1) FR2661544B1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL119634A (en) * 1996-11-18 2000-12-06 Omerco Ltd Method and apparatus for the treatment of surfaces of large metal objects
JP6052538B2 (ja) * 2012-12-04 2016-12-27 清水建設株式会社 汚染コンクリート塊の除染処理方法および装置
RU2711292C1 (ru) * 2018-11-21 2020-01-16 Акционерное Общество "Российский Концерн По Производству Электрической И Тепловой Энергии На Атомных Станциях" (Ао "Концерн Росэнергоатом") Способ дезактивации элемента конструкции ядерного реактора
CN112139151A (zh) * 2020-09-11 2020-12-29 韩山师范学院 一种大型设备表面清理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1382915A (en) * 1972-04-25 1975-02-05 British Nuclear Fuels Ltd Decontamination of fuel element sheaths
DE3114543A1 (de) * 1981-04-10 1982-12-16 Alkem Gmbh, 6450 Hanau Verfahren zum dekontaminieren der oberflaeche eines koerpers von radioaktiven verunreinigungspartikeln und einrichtung zur durchfuehrung dieses verfahrens
GB2159753B (en) * 1984-03-06 1988-09-07 Asm Fico Tooling Method and apparatus for cleaning lead pins before soldering operations
BE1001027A3 (nl) * 1987-10-21 1989-06-13 Bekaert Sa Nv Werkwijze en inrichting voor het reinigen van een langwerpig metalen substraat, zoals een draad, een band, een koord, enz., alsmede volgens die werkwijze gereinigde substraten en met dergelijke substraten versterkte voorwerpen uit polymeermateriaal.

Also Published As

Publication number Publication date
FR2661544B1 (fr) 1994-05-27
FR2661544A1 (fr) 1991-10-31
EP0454584A1 (fr) 1991-10-30
DE69111671D1 (de) 1995-09-07
JPH04230898A (ja) 1992-08-19
EP0454584B1 (fr) 1995-08-02
JP2892857B2 (ja) 1999-05-17

Similar Documents

Publication Publication Date Title
DE2556607C2 (de) Verfahren und Vorrichtung zur Kathodenzerstäubung
EP0459137B1 (fr) Dispositif pour revêtement de substrats
DE3331245A1 (de) Ebene magnetron-zerstaeubungsvorrichtung
DE3123332A1 (de) "verfahren und vorrichtung zur gasfreien ionenplattierung"
DE3031220A1 (de) Verfahren und einrichtung zum gravieren integrierter schaltungen
DE4037580C2 (fr)
DE69828699T2 (de) Vacuumzerstäubungsgerät
DE19939040B4 (de) Magnetronsputtergerät
DE4126236A1 (de) Rotierende magnetron-katode und verfahren zur anwendung
DE2208032A1 (de) Zerstäubungsvorrichtung
DE3706698C2 (de) Verfahren und Anordnung zum Zerstäuben eines Materials mittels Hochfrequenz
DE3919145A1 (de) Verfahren und vorrichtung zum beschichten eines substrats mit elektrisch leitenden werkstoffen
DE69111671T2 (de) Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen.
DE2221600A1 (de) Vorrichtung zum beschichten von substraten durch kathodenzerstaeubung und zum reinigen durch ionenaetzen im gleichen vakuumgefaess
EP0786793A2 (fr) Dispositif de traitement de surface de pièces de travail
DE3120793A1 (de) "verfahren und vorrichtung zur dekontamination von festkoerpern"
DE3837487A1 (de) Verfahren und vorrichtung zum aetzen von substraten mit einer magnetfeldunterstuetzten niederdruck-entladung
DE2134377A1 (de) Verfahren und Vorrichtung zum Ab scheiden dunner Schichten mittels Kathodenzerstäubung auf Metallwerkstucken
EP0607787A2 (fr) Dispositif pour revêtir ou graver des substrats
DE2655942C2 (fr)
DE4025231C2 (de) Verfahren und Vorrichtung zum reaktiven Beschichten eines Substrats
DE1542589A1 (de) Verfahren und Vorrichtung zur Entfernung von Verunreinigungen von der Oberflaeche eines Schichttraegers od.dgl.
DE2305359A1 (de) Anordnung zur aufdampfung duenner schichten unter gleichzeitiger einwirkung eines ionisierten gases
DE102020114162B3 (de) Ionenquelle und Verfahren
AT234402B (de) Verfahren zum Aufdampfen eines Musters

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee