JP2892857B2 - イオン化剥離による除染方法および装置 - Google Patents

イオン化剥離による除染方法および装置

Info

Publication number
JP2892857B2
JP2892857B2 JP3095983A JP9598391A JP2892857B2 JP 2892857 B2 JP2892857 B2 JP 2892857B2 JP 3095983 A JP3095983 A JP 3095983A JP 9598391 A JP9598391 A JP 9598391A JP 2892857 B2 JP2892857 B2 JP 2892857B2
Authority
JP
Japan
Prior art keywords
enclosure
substrate
decontaminated
contaminated
milling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3095983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH04230898A (ja
Inventor
ボッシュ フィリップ
− ジョセフ マウレル ジャン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of JPH04230898A publication Critical patent/JPH04230898A/ja
Application granted granted Critical
Publication of JP2892857B2 publication Critical patent/JP2892857B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • G21F9/005—Decontamination of the surface of objects by ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Food Science & Technology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP3095983A 1990-04-27 1991-04-26 イオン化剥離による除染方法および装置 Expired - Lifetime JP2892857B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9005417A FR2661544B1 (fr) 1990-04-27 1990-04-27 Procede et dispositif de decontamination par decapage ionique.
FR9005417 1990-04-27

Publications (2)

Publication Number Publication Date
JPH04230898A JPH04230898A (ja) 1992-08-19
JP2892857B2 true JP2892857B2 (ja) 1999-05-17

Family

ID=9396183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3095983A Expired - Lifetime JP2892857B2 (ja) 1990-04-27 1991-04-26 イオン化剥離による除染方法および装置

Country Status (4)

Country Link
EP (1) EP0454584B1 (fr)
JP (1) JP2892857B2 (fr)
DE (1) DE69111671T2 (fr)
FR (1) FR2661544B1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3886117A4 (fr) * 2018-11-21 2022-07-20 Joint Stock Company "Rosenergoatom" Procédé de désactivation d'un élément de la structure d'un réacteur nucléaire

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL119634A (en) * 1996-11-18 2000-12-06 Omerco Ltd Method and apparatus for the treatment of surfaces of large metal objects
JP6052538B2 (ja) * 2012-12-04 2016-12-27 清水建設株式会社 汚染コンクリート塊の除染処理方法および装置
CN112139151A (zh) * 2020-09-11 2020-12-29 韩山师范学院 一种大型设备表面清理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1382915A (en) * 1972-04-25 1975-02-05 British Nuclear Fuels Ltd Decontamination of fuel element sheaths
DE3114543A1 (de) * 1981-04-10 1982-12-16 Alkem Gmbh, 6450 Hanau Verfahren zum dekontaminieren der oberflaeche eines koerpers von radioaktiven verunreinigungspartikeln und einrichtung zur durchfuehrung dieses verfahrens
GB2159753B (en) * 1984-03-06 1988-09-07 Asm Fico Tooling Method and apparatus for cleaning lead pins before soldering operations
BE1001027A3 (nl) * 1987-10-21 1989-06-13 Bekaert Sa Nv Werkwijze en inrichting voor het reinigen van een langwerpig metalen substraat, zoals een draad, een band, een koord, enz., alsmede volgens die werkwijze gereinigde substraten en met dergelijke substraten versterkte voorwerpen uit polymeermateriaal.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3886117A4 (fr) * 2018-11-21 2022-07-20 Joint Stock Company "Rosenergoatom" Procédé de désactivation d'un élément de la structure d'un réacteur nucléaire

Also Published As

Publication number Publication date
FR2661544B1 (fr) 1994-05-27
FR2661544A1 (fr) 1991-10-31
EP0454584A1 (fr) 1991-10-30
DE69111671D1 (de) 1995-09-07
JPH04230898A (ja) 1992-08-19
EP0454584B1 (fr) 1995-08-02
DE69111671T2 (de) 1996-04-04

Similar Documents

Publication Publication Date Title
JP4150504B2 (ja) イオン化物理蒸着のための方法および装置
US5938854A (en) Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
JPH10506154A (ja) プラズマ反応チャンバーをその場でマグネトロンクリーニングするための装置と方法
JP3123735B2 (ja) イオンビーム処理装置
JP2892857B2 (ja) イオン化剥離による除染方法および装置
JP4042817B2 (ja) 中性粒子ビーム処理装置
EP0790642A3 (fr) Appareillage et méthode pour enlever les particules de contaminants de la surface d'équipements pour le traitement de semi-conducteurs
JP2008071528A (ja) プラズマ処理装置
JP3243807B2 (ja) イオン照射装置
WO2001012350A1 (fr) Nettoyage de surfaces au moyen d'un plasma haute pression par decharge luminescente sans equilibre thermique
JPH07106307A (ja) プラズマ処理装置およびプラズマ処理方法
JPH0770512B2 (ja) 低エネルギイオン化粒子照射装置
JPH0329863B2 (fr)
JPH02130915A (ja) プラズマ処理装置
JP2004211123A (ja) 荷電粒子照射装置
JPS6396840A (ja) イオン源
JPH06267899A (ja) エッチング装置
JPH02148647A (ja) イオン注入装置のイオンソース洗浄治具及び洗浄方法
JPH01140724A (ja) プラズマ処理装置
JP2000017429A (ja) 真空成膜装置
JPH0252855B2 (fr)
JPS60189950A (ja) 静電チヤツクの帯電除去方法
JPH0737231Y2 (ja) イオン注入装置
JPH03219541A (ja) プラズマ処理装置
JP3134942B2 (ja) ウエーハステージ前処理方法