DE69030074D1 - Supraleitender Gatter-Feld-Effekt-Transistor - Google Patents
Supraleitender Gatter-Feld-Effekt-TransistorInfo
- Publication number
- DE69030074D1 DE69030074D1 DE69030074T DE69030074T DE69030074D1 DE 69030074 D1 DE69030074 D1 DE 69030074D1 DE 69030074 T DE69030074 T DE 69030074T DE 69030074 T DE69030074 T DE 69030074T DE 69030074 D1 DE69030074 D1 DE 69030074D1
- Authority
- DE
- Germany
- Prior art keywords
- field effect
- effect transistor
- gate field
- superconducting gate
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005669 field effect Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/437—Superconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4966—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a composite material, e.g. organic material, TiN, MoSi2
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Computer Hardware Design (AREA)
- Composite Materials (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47329290A | 1990-02-01 | 1990-02-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69030074D1 true DE69030074D1 (de) | 1997-04-10 |
DE69030074T2 DE69030074T2 (de) | 1997-09-18 |
Family
ID=23878966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990630074 Expired - Fee Related DE69030074T2 (de) | 1990-02-01 | 1990-12-13 | Supraleitender Gatter-Feld-Effekt-Transistor |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0439751B1 (de) |
JP (1) | JPH077838B2 (de) |
DE (1) | DE69030074T2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5908813A (en) * | 1997-02-14 | 1999-06-01 | Micron Technology, Inc. | Method making integrated circuit metallization with superconductor BEOL wiring |
US7241691B2 (en) * | 2005-03-28 | 2007-07-10 | Freescale Semiconductor, Inc. | Conducting metal oxide with additive as p-MOS device electrode |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6474758A (en) * | 1987-09-17 | 1989-03-20 | Fujitsu Ltd | Insulated gate field-effect transistor |
JPH07109906B2 (ja) * | 1988-03-03 | 1995-11-22 | 松下電器産業株式会社 | 超伝導トランジスタ回路 |
-
1990
- 1990-12-13 DE DE1990630074 patent/DE69030074T2/de not_active Expired - Fee Related
- 1990-12-13 EP EP19900124052 patent/EP0439751B1/de not_active Expired - Lifetime
- 1990-12-27 JP JP2415181A patent/JPH077838B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH077838B2 (ja) | 1995-01-30 |
EP0439751A3 (en) | 1991-11-21 |
DE69030074T2 (de) | 1997-09-18 |
JPH04251977A (ja) | 1992-09-08 |
EP0439751A2 (de) | 1991-08-07 |
EP0439751B1 (de) | 1997-03-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |