DE69027349T2 - Ladungsverschiebeanordnung und Verfahren zu deren Herstellung - Google Patents
Ladungsverschiebeanordnung und Verfahren zu deren HerstellungInfo
- Publication number
- DE69027349T2 DE69027349T2 DE1990627349 DE69027349T DE69027349T2 DE 69027349 T2 DE69027349 T2 DE 69027349T2 DE 1990627349 DE1990627349 DE 1990627349 DE 69027349 T DE69027349 T DE 69027349T DE 69027349 T2 DE69027349 T2 DE 69027349T2
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- transfer device
- charge transfer
- charge
- transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76866—Surface Channel CCD
- H01L29/76875—Two-Phase CCD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/105—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components
- H01L27/1057—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including field-effect components comprising charge coupled devices [CCD] or charge injection devices [CID]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1040995A JP3057683B2 (ja) | 1989-02-21 | 1989-02-21 | 非破壊読み出し型電荷転送装置とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69027349D1 DE69027349D1 (de) | 1996-07-18 |
DE69027349T2 true DE69027349T2 (de) | 1996-11-28 |
Family
ID=12596010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1990627349 Expired - Fee Related DE69027349T2 (de) | 1989-02-21 | 1990-02-20 | Ladungsverschiebeanordnung und Verfahren zu deren Herstellung |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0384692B1 (de) |
JP (1) | JP3057683B2 (de) |
DE (1) | DE69027349T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0492144A3 (en) * | 1990-11-26 | 1992-08-12 | Matsushita Electronics Corporation | Charge-coupled device and solid-state imaging device |
JP2642523B2 (ja) * | 1991-03-19 | 1997-08-20 | 株式会社東芝 | 電荷結合素子を持つ半導体集積回路装置の製造方法 |
JP3214432B2 (ja) | 1998-02-04 | 2001-10-02 | 日本電気株式会社 | 固体撮像装置の製造方法 |
JP6045391B2 (ja) * | 2013-02-22 | 2016-12-14 | 京セラドキュメントソリューションズ株式会社 | 段ボール箱の開封構造及び段ボール箱 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2004694A (en) * | 1977-08-19 | 1979-04-04 | Gen Electric Co Ltd | Methods of manufacturing semiconductor devices |
JPS5815271A (ja) * | 1981-07-21 | 1983-01-28 | Nec Corp | 電荷結合素子 |
US4614960A (en) * | 1983-07-15 | 1986-09-30 | Westinghouse Electric Corp. | Focal plane array |
-
1989
- 1989-02-21 JP JP1040995A patent/JP3057683B2/ja not_active Expired - Fee Related
-
1990
- 1990-02-20 DE DE1990627349 patent/DE69027349T2/de not_active Expired - Fee Related
- 1990-02-20 EP EP19900301787 patent/EP0384692B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69027349D1 (de) | 1996-07-18 |
JPH02220450A (ja) | 1990-09-03 |
EP0384692A3 (en) | 1990-10-17 |
EP0384692B1 (de) | 1996-06-12 |
JP3057683B2 (ja) | 2000-07-04 |
EP0384692A2 (de) | 1990-08-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |