DE69017271D1 - Gerät zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld. - Google Patents

Gerät zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld.

Info

Publication number
DE69017271D1
DE69017271D1 DE69017271T DE69017271T DE69017271D1 DE 69017271 D1 DE69017271 D1 DE 69017271D1 DE 69017271 T DE69017271 T DE 69017271T DE 69017271 T DE69017271 T DE 69017271T DE 69017271 D1 DE69017271 D1 DE 69017271D1
Authority
DE
Germany
Prior art keywords
microwaves
processing
magnetic field
magnetic
field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69017271T
Other languages
English (en)
Other versions
DE69017271T2 (de
Inventor
Shunpei Yamazaki
Naoki Hirose
Masaya Kadono
Noriya Ishida
Kenji Ito
Toru Takayama
Yasuyuki Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP15291089A external-priority patent/JP2840760B2/ja
Priority claimed from JP1152909A external-priority patent/JP2769560B2/ja
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Application granted granted Critical
Publication of DE69017271D1 publication Critical patent/DE69017271D1/de
Publication of DE69017271T2 publication Critical patent/DE69017271T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Vapour Deposition (AREA)
DE69017271T 1989-06-15 1990-06-12 Gerät zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld. Expired - Fee Related DE69017271T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP15291089A JP2840760B2 (ja) 1989-06-15 1989-06-15 有磁場マイクロ波処理装置
JP1152909A JP2769560B2 (ja) 1989-06-15 1989-06-15 有磁場マイクロ波処理装置

Publications (2)

Publication Number Publication Date
DE69017271D1 true DE69017271D1 (de) 1995-04-06
DE69017271T2 DE69017271T2 (de) 1995-06-22

Family

ID=26481694

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69017271T Expired - Fee Related DE69017271T2 (de) 1989-06-15 1990-06-12 Gerät zur Bearbeitung mittels Mikrowellen in einem magnetischen Feld.

Country Status (3)

Country Link
US (2) US5302226A (de)
EP (1) EP0402867B1 (de)
DE (1) DE69017271T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05206069A (ja) * 1992-01-29 1993-08-13 Fujitsu Ltd プラズマエッチング法及びプラズマエッチング装置
JP3194820B2 (ja) * 1992-09-03 2001-08-06 株式会社神戸製鋼所 配向性ダイヤモンド膜の形成方法
KR100311234B1 (ko) * 1999-01-18 2001-11-02 학교법인 인하학원 고품위 유도결합 플라즈마 리액터
US6461980B1 (en) * 2000-01-28 2002-10-08 Applied Materials, Inc. Apparatus and process for controlling the temperature of a substrate in a plasma reactor chamber
US6387207B1 (en) * 2000-04-28 2002-05-14 Applied Materials, Inc. Integration of remote plasma generator with semiconductor processing chamber
DE10037883A1 (de) * 2000-08-03 2002-02-14 Henkel Kgaa Ferromagnetische Resonanzanregung und ihre Verwendung zur Erwärmung teilchengefüllter Substrate
CN100585814C (zh) * 2001-01-25 2010-01-27 东京毅力科创株式会社 等离子体处理方法
JP2002261081A (ja) * 2001-03-01 2002-09-13 Asm Japan Kk 半導体ウエハのエッチング装置及び方法
JP2006041250A (ja) * 2004-07-28 2006-02-09 Canon Inc プラズマ処理装置および方法
GB201021853D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021860D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
CN103370765B (zh) 2010-12-23 2016-09-07 六号元素有限公司 控制合成金刚石材料的掺杂
GB201021865D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021870D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021913D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd Microwave plasma reactors and substrates for synthetic diamond manufacture
GB201021855D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave power delivery system for plasma reactors
JP6341565B2 (ja) * 2014-07-03 2018-06-13 国立研究開発法人物質・材料研究機構 プラズマキャビティ用フランジ、プラズマキャビティ及びプラズマｃｖｄ装置
JP2016225573A (ja) * 2015-06-03 2016-12-28 株式会社東芝 基板処理装置および基板処理方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5779621A (en) * 1980-11-05 1982-05-18 Mitsubishi Electric Corp Plasma processing device
JPS6074626A (ja) * 1983-09-30 1985-04-26 Fujitsu Ltd ウエハー処理方法及び装置
KR890004881B1 (ko) * 1983-10-19 1989-11-30 가부시기가이샤 히다찌세이사꾸쇼 플라즈마 처리 방법 및 그 장치
JPH0693447B2 (ja) * 1983-12-23 1994-11-16 株式会社日立製作所 マイクロ波プラズマ処理装置
JPH0824114B2 (ja) * 1984-11-09 1996-03-06 株式会社日立製作所 プラズマエッチング方法
JPS61131454A (ja) * 1984-11-30 1986-06-19 Fujitsu Ltd マイクロ波プラズマ処理方法と装置
KR900007687B1 (ko) * 1986-10-17 1990-10-18 가부시기가이샤 히다찌세이사꾸쇼 플라즈마처리방법 및 장치
DE3774098D1 (de) * 1986-12-29 1991-11-28 Sumitomo Metal Ind Plasmageraet.
JPH0715901B2 (ja) * 1987-09-03 1995-02-22 株式会社日立製作所 プラズマ処理装置
DE3853890T2 (de) * 1987-01-19 1995-10-19 Hitachi Ltd Mit einem Plasma arbeitendes Gerät.
JPS63213674A (ja) * 1987-03-02 1988-09-06 Hitachi Ltd マイクロ波プラズマ処理装置
JPH0672306B2 (ja) * 1987-04-27 1994-09-14 株式会社半導体エネルギー研究所 プラズマ処理装置およびプラズマ処理方法
DE3853551T2 (de) * 1987-05-08 1995-10-05 Hitachi Ltd Plasmabehandlungsvorrichtung.
JPH01100263A (ja) * 1987-10-09 1989-04-18 Anelva Corp Ｅｃｒ表面反応装置
JPH0668152B2 (ja) * 1988-01-27 1994-08-31 株式会社半導体エネルギー研究所 薄膜形成装置
US4950376A (en) * 1988-06-21 1990-08-21 Agency Of Industrial Science & Technology Method of gas reaction process control
JPH0216732A (ja) * 1988-07-05 1990-01-19 Mitsubishi Electric Corp プラズマ反応装置
JPH0268900A (ja) * 1988-09-01 1990-03-08 Nissin Electric Co Ltd マイクロ波プラズマ源
JP2670623B2 (ja) * 1988-09-19 1997-10-29 アネルバ株式会社 マイクロ波プラズマ処理装置
JPH02112232A (ja) * 1988-10-20 1990-04-24 Sumitomo Metal Ind Ltd プラズマ装置の操業方法及びプラズマ装置

Also Published As

Publication number Publication date
DE69017271T2 (de) 1995-06-22
US5302226A (en) 1994-04-12
US5609774A (en) 1997-03-11
EP0402867A3 (de) 1991-07-24
EP0402867B1 (de) 1995-03-01
EP0402867A2 (de) 1990-12-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee