DE69010800D1 - Herstellung von Polymere Metalloxyd-Werkstoffe. - Google Patents

Herstellung von Polymere Metalloxyd-Werkstoffe.

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Publication number
DE69010800D1
DE69010800D1 DE69010800T DE69010800T DE69010800D1 DE 69010800 D1 DE69010800 D1 DE 69010800D1 DE 69010800 T DE69010800 T DE 69010800T DE 69010800 T DE69010800 T DE 69010800T DE 69010800 D1 DE69010800 D1 DE 69010800D1
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DE
Germany
Prior art keywords
manufacture
metal oxide
oxide materials
polymeric metal
polymeric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69010800T
Other languages
English (en)
Other versions
DE69010800T2 (de
Inventor
Tomoji Oishi
Ken Takahashi
Tetsuo Nakazawa
Shigeru Tanaka
Tadahiko Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69010800D1 publication Critical patent/DE69010800D1/de
Publication of DE69010800T2 publication Critical patent/DE69010800T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/0052—Preparation of gels
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    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
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    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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    • C—CHEMISTRY; METALLURGY
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    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
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    • C07F19/00—Metal compounds according to more than one of main groups C07F1/00 - C07F17/00
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    • H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
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DE69010800T 1989-08-18 1990-08-14 Herstellung von Polymere Metalloxyd-Werkstoffe. Expired - Fee Related DE69010800T2 (de)

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JP18145490A JPH0832304B2 (ja) 1989-08-18 1990-07-11 無機ポリマ薄膜の形成方法

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JP3759806B2 (ja) * 1997-02-28 2006-03-29 積水化学工業株式会社 光触媒活性を有する薄膜の形成方法
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JPH0832304B2 (ja) 1996-03-29
JPH03188938A (ja) 1991-08-16
EP0413564B1 (de) 1994-07-20
US5643642A (en) 1997-07-01
US5460877A (en) 1995-10-24
US5843591A (en) 1998-12-01
EP0413564A2 (de) 1991-02-20
US5234556A (en) 1993-08-10
DE69010800T2 (de) 1995-01-05

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