DE69007500T2 - Lösung für stromlose Kupferplattierung. - Google Patents

Lösung für stromlose Kupferplattierung.

Info

Publication number
DE69007500T2
DE69007500T2 DE69007500T DE69007500T DE69007500T2 DE 69007500 T2 DE69007500 T2 DE 69007500T2 DE 69007500 T DE69007500 T DE 69007500T DE 69007500 T DE69007500 T DE 69007500T DE 69007500 T2 DE69007500 T2 DE 69007500T2
Authority
DE
Germany
Prior art keywords
plating solution
copper plating
electroless copper
electroless
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69007500T
Other languages
English (en)
Other versions
DE69007500D1 (de
Inventor
Takao Takita
Takeshi Shimazaki
Satoshi Akazawa
Kazuichi Kuramoti
Hiroyuki Toyoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Borden Chemical Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Borden Chemical Products Inc filed Critical Hitachi Chemical Co Ltd
Publication of DE69007500D1 publication Critical patent/DE69007500D1/de
Application granted granted Critical
Publication of DE69007500T2 publication Critical patent/DE69007500T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents
DE69007500T 1989-01-13 1990-01-11 Lösung für stromlose Kupferplattierung. Expired - Fee Related DE69007500T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1007092A JP2794741B2 (ja) 1989-01-13 1989-01-13 無電解銅めっき液

Publications (2)

Publication Number Publication Date
DE69007500D1 DE69007500D1 (de) 1994-04-28
DE69007500T2 true DE69007500T2 (de) 1994-06-30

Family

ID=11656438

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69007500T Expired - Fee Related DE69007500T2 (de) 1989-01-13 1990-01-11 Lösung für stromlose Kupferplattierung.

Country Status (5)

Country Link
US (1) US5076840A (de)
EP (1) EP0378407B1 (de)
JP (1) JP2794741B2 (de)
KR (1) KR920004506B1 (de)
DE (1) DE69007500T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5306336A (en) * 1992-11-20 1994-04-26 Monsanto Company Sulfate-free electroless copper plating baths
US6645557B2 (en) 2001-10-17 2003-11-11 Atotech Deutschland Gmbh Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions
US7829793B2 (en) * 2005-09-09 2010-11-09 Magnecomp Corporation Additive disk drive suspension manufacturing using tie layers for vias and product thereof
US8553364B1 (en) 2005-09-09 2013-10-08 Magnecomp Corporation Low impedance, high bandwidth disk drive suspension circuit
TWI347373B (en) * 2006-07-07 2011-08-21 Rohm & Haas Elect Mat Formaldehyde free electroless copper compositions
TWI348499B (en) * 2006-07-07 2011-09-11 Rohm & Haas Elect Mat Electroless copper and redox couples
TW200813255A (en) * 2006-07-07 2008-03-16 Rohm & Haas Elect Mat Environmentally friendly electroless copper compositions
TWI347982B (en) * 2006-07-07 2011-09-01 Rohm & Haas Elect Mat Improved electroless copper compositions
WO2014154702A1 (en) * 2013-03-27 2014-10-02 Atotech Deutschland Gmbh Electroless copper plating solution
CN110512198A (zh) * 2019-09-24 2019-11-29 苏州天承化工有限公司 一种化学镀铜液、化学镀铜膜及其制备方法
CN114277278B (zh) * 2021-12-29 2022-07-01 九江天时粉末制品有限公司 一种耐磨铝青铜板及其制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171225A (en) * 1976-01-23 1979-10-16 U.S. Philips Corporation Electroless copper plating solutions
JPS5370931A (en) * 1976-12-07 1978-06-23 Tokyo Shibaura Electric Co Nonnelectrolytic copper plating method
US4374876A (en) * 1981-06-02 1983-02-22 Occidental Chemical Corporation Process for the immersion deposition of gold
JPS59870A (ja) * 1982-06-28 1984-01-06 Shin Kobe Electric Mach Co Ltd 密閉式鉛蓄電池
US4548644A (en) * 1982-09-28 1985-10-22 Hitachi Chemical Company, Ltd. Electroless copper deposition solution
JPS609880A (ja) * 1983-06-29 1985-01-18 Seiko Epson Corp 無電解銅めつき液
JPS6033358A (ja) * 1983-08-04 1985-02-20 Hitachi Chem Co Ltd 無電解銅めっき液
JPS6070183A (ja) * 1983-09-28 1985-04-20 C Uyemura & Co Ltd 化学銅めっき方法
JPS60155684A (ja) * 1984-01-25 1985-08-15 Hitachi Chem Co Ltd 無電解銅めつき液
JPS60218480A (ja) * 1984-04-16 1985-11-01 Hitachi Ltd 化学銅めつき液
JPS6112871A (ja) * 1984-06-27 1986-01-21 Toshiba Corp 無電解銅めつき液の連続的再生方法
JPS61253375A (ja) * 1985-05-01 1986-11-11 Canon Inc 無電解銅めつき液
JPS6274087A (ja) * 1985-09-28 1987-04-04 Shimadzu Corp 無電解銅めつき液
JPS6289877A (ja) * 1985-10-16 1987-04-24 Seiko Epson Corp 化学銅めつき液

Also Published As

Publication number Publication date
EP0378407A1 (de) 1990-07-18
KR920004506B1 (ko) 1992-06-08
US5076840A (en) 1991-12-31
DE69007500D1 (de) 1994-04-28
JPH02190477A (ja) 1990-07-26
EP0378407B1 (de) 1994-03-23
JP2794741B2 (ja) 1998-09-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HITACHI CHEMICAL CO., LTD., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee