DE69003321D1 - MOS-integrierte Schaltung mit regelbarer Schwellspannung. - Google Patents

MOS-integrierte Schaltung mit regelbarer Schwellspannung.

Info

Publication number
DE69003321D1
DE69003321D1 DE90402010T DE69003321T DE69003321D1 DE 69003321 D1 DE69003321 D1 DE 69003321D1 DE 90402010 T DE90402010 T DE 90402010T DE 69003321 T DE69003321 T DE 69003321T DE 69003321 D1 DE69003321 D1 DE 69003321D1
Authority
DE
Germany
Prior art keywords
integrated circuit
threshold voltage
adjustable threshold
mos integrated
mos
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE90402010T
Other languages
English (en)
Other versions
DE69003321T2 (de
Inventor
Jacek Kowalski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gemplus SA
Original Assignee
Gemplus Card International SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gemplus Card International SA filed Critical Gemplus Card International SA
Publication of DE69003321D1 publication Critical patent/DE69003321D1/de
Application granted granted Critical
Publication of DE69003321T2 publication Critical patent/DE69003321T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628—Programming or writing circuits; Data input circuits
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628—Programming or writing circuits; Data input circuits
    • G11C11/5635—Erasing circuits
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5692—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency read-only digital stores using storage elements with more than two stable states
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/06—Auxiliary circuits, e.g. for writing into memory
    • G11C16/10—Programming or data input circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Semiconductor Memories (AREA)
DE90402010T 1989-07-20 1990-07-12 MOS-integrierte Schaltung mit regelbarer Schwellspannung. Expired - Fee Related DE69003321T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8909780A FR2650109B1 (fr) 1989-07-20 1989-07-20 Circuit integre mos a tension de seuil ajustable

Publications (2)

Publication Number Publication Date
DE69003321D1 true DE69003321D1 (de) 1993-10-21
DE69003321T2 DE69003321T2 (de) 1994-01-13

Family

ID=9383970

Family Applications (1)

Application Number Title Priority Date Filing Date
DE90402010T Expired - Fee Related DE69003321T2 (de) 1989-07-20 1990-07-12 MOS-integrierte Schaltung mit regelbarer Schwellspannung.

Country Status (7)

Country Link
US (1) US5394359A (de)
EP (1) EP0409697B1 (de)
JP (1) JP2860308B2 (de)
CA (1) CA2021585C (de)
DE (1) DE69003321T2 (de)
ES (1) ES2047286T3 (de)
FR (1) FR2650109B1 (de)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5103160A (en) * 1991-04-25 1992-04-07 Hughes Aircraft Company Shunt regulator with tunnel oxide reference
US6222762B1 (en) * 1992-01-14 2001-04-24 Sandisk Corporation Multi-state memory
US5657332A (en) * 1992-05-20 1997-08-12 Sandisk Corporation Soft errors handling in EEPROM devices
US5828601A (en) * 1993-12-01 1998-10-27 Advanced Micro Devices, Inc. Programmed reference
JP2848223B2 (ja) * 1993-12-01 1999-01-20 日本電気株式会社 不揮発性半導体記憶装置の消去方法及び製造方法
US5440505A (en) * 1994-01-21 1995-08-08 Intel Corporation Method and circuitry for storing discrete amounts of charge in a single memory element
RU2190260C2 (ru) * 1994-06-02 2002-09-27 Интел Корпорейшн Считывающая схема для флэш-памяти с многоуровневыми ячейками
US5508958A (en) * 1994-09-29 1996-04-16 Intel Corporation Method and apparatus for sensing the state of floating gate memory cells by applying a variable gate voltage
US5495453A (en) * 1994-10-19 1996-02-27 Intel Corporation Low power voltage detector circuit including a flash memory cell
GB9424598D0 (en) * 1994-12-06 1995-01-25 Philips Electronics Uk Ltd Semiconductor memory with non-volatile memory transistor
US5550772A (en) * 1995-02-13 1996-08-27 National Semiconductor Corporation Memory array utilizing multi-state memory cells
EP0823115B1 (de) * 1995-04-21 1999-08-25 Advanced Micro Devices, Inc. Referenz für eine cmos-speicherzelle mit pmos- und nmos-transistoren mit einem gemeinsame schwebendem gatter
JP3562043B2 (ja) * 1995-07-19 2004-09-08 ソニー株式会社 不揮発性記憶装置
FR2739706B1 (fr) * 1995-10-09 1997-11-21 Inside Technologies Perfectionnements aux cartes a memoire
FR2739737B1 (fr) * 1995-10-09 1997-11-21 Inside Technologies Perfectionnements aux cartes a memoire
US5737265A (en) * 1995-12-14 1998-04-07 Intel Corporation Programming flash memory using data stream analysis
US5677869A (en) * 1995-12-14 1997-10-14 Intel Corporation Programming flash memory using strict ordering of states
US5729489A (en) * 1995-12-14 1998-03-17 Intel Corporation Programming flash memory using predictive learning methods
US5701266A (en) * 1995-12-14 1997-12-23 Intel Corporation Programming flash memory using distributed learning methods
DE69628165D1 (de) * 1996-09-30 2003-06-18 St Microelectronics Srl Digital-Analog-Wandler des Stromtyps mit IG-MOS-Transistoren
EP0840452B1 (de) * 1996-10-30 2001-07-18 STMicroelectronics S.r.l. Spannungsvergleicher mit mindestens einem Isolierschicht-MOS-Transistor und damit ausgerüstete Analog-Digital-Wandler
JP3460170B2 (ja) * 1997-02-03 2003-10-27 シャープ株式会社 薄膜トランジスタ及びその製造方法
US5909449A (en) 1997-09-08 1999-06-01 Invox Technology Multibit-per-cell non-volatile memory with error detection and correction
JP4252183B2 (ja) * 2000-02-17 2009-04-08 株式会社ルネサステクノロジ 不揮発性半導体記憶装置、該不揮発性半導体記憶装置からのデータの読み出し方法及び、該不揮発性半導体記憶装置へのデータの書き込み方法
US6856568B1 (en) 2000-04-25 2005-02-15 Multi Level Memory Technology Refresh operations that change address mappings in a non-volatile memory
US6396744B1 (en) 2000-04-25 2002-05-28 Multi Level Memory Technology Flash memory with dynamic refresh
US7079422B1 (en) 2000-04-25 2006-07-18 Samsung Electronics Co., Ltd. Periodic refresh operations for non-volatile multiple-bit-per-cell memory
US7055007B2 (en) * 2003-04-10 2006-05-30 Arm Limited Data processor memory circuit
US7012835B2 (en) * 2003-10-03 2006-03-14 Sandisk Corporation Flash memory data correction and scrub techniques
US7173852B2 (en) * 2003-10-03 2007-02-06 Sandisk Corporation Corrected data storage and handling methods
JP4519713B2 (ja) * 2004-06-17 2010-08-04 株式会社東芝 整流回路とこれを用いた無線通信装置
US7315916B2 (en) * 2004-12-16 2008-01-01 Sandisk Corporation Scratch pad block
US7395404B2 (en) * 2004-12-16 2008-07-01 Sandisk Corporation Cluster auto-alignment for storing addressable data packets in a non-volatile memory array
US7716538B2 (en) * 2006-09-27 2010-05-11 Sandisk Corporation Memory with cell population distribution assisted read margining
US7886204B2 (en) * 2006-09-27 2011-02-08 Sandisk Corporation Methods of cell population distribution assisted read margining
US7573773B2 (en) * 2007-03-28 2009-08-11 Sandisk Corporation Flash memory with data refresh triggered by controlled scrub data reads
US7477547B2 (en) * 2007-03-28 2009-01-13 Sandisk Corporation Flash memory refresh techniques triggered by controlled scrub data reads
FR2927732B1 (fr) 2008-02-19 2011-05-27 Commissariat Energie Atomique Procede d'ajustement de la tension de seuil d'un transistor par une couche de piegeage enterree
US8878511B2 (en) * 2010-02-04 2014-11-04 Semiconductor Components Industries, Llc Current-mode programmable reference circuits and methods therefor
US8188785B2 (en) 2010-02-04 2012-05-29 Semiconductor Components Industries, Llc Mixed-mode circuits and methods of producing a reference current and a reference voltage
US8680840B2 (en) * 2010-02-11 2014-03-25 Semiconductor Components Industries, Llc Circuits and methods of producing a reference current or voltage
KR20180015760A (ko) * 2010-09-03 2018-02-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 전계 효과 트랜지스터 및 반도체 장치의 제조 방법
US8687421B2 (en) 2011-11-21 2014-04-01 Sandisk Technologies Inc. Scrub techniques for use with dynamic read
JP5779162B2 (ja) 2012-09-28 2015-09-16 株式会社東芝 整流回路とこれを用いた無線通信装置
US9230689B2 (en) 2014-03-17 2016-01-05 Sandisk Technologies Inc. Finding read disturbs on non-volatile memories
DE102014112001A1 (de) * 2014-08-21 2016-02-25 Infineon Technologies Austria Ag Integrierte Schaltung mit einem Eingangstransistor einschließlich einer Ladungsspeicherstruktur
JP2016058633A (ja) * 2014-09-11 2016-04-21 株式会社東芝 撮像装置
US9552171B2 (en) 2014-10-29 2017-01-24 Sandisk Technologies Llc Read scrub with adaptive counter management
US9978456B2 (en) 2014-11-17 2018-05-22 Sandisk Technologies Llc Techniques for reducing read disturb in partially written blocks of non-volatile memory
US9349479B1 (en) 2014-11-18 2016-05-24 Sandisk Technologies Inc. Boundary word line operation in nonvolatile memory
US9449700B2 (en) 2015-02-13 2016-09-20 Sandisk Technologies Llc Boundary word line search and open block read methods with reduced read disturb
US9653154B2 (en) 2015-09-21 2017-05-16 Sandisk Technologies Llc Write abort detection for multi-state memories
US10446567B2 (en) * 2017-03-31 2019-10-15 Asahi Kasei Microdevices Corporation Nonvolatile storage element and reference voltage generation circuit

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2514582C2 (de) * 1975-04-03 1977-05-26 Siemens Ag Schaltung zur erzeugung von leseimpulsen
US4357571A (en) * 1978-09-29 1982-11-02 Siemens Aktiengesellschaft FET Module with reference source chargeable memory gate
IT1224062B (it) * 1979-09-28 1990-09-26 Ates Componenti Elettron Metodo di programmazione per una memoria a semiconduttore non volatile elettricamente alterabile
US4336603A (en) * 1980-06-18 1982-06-22 International Business Machines Corp. Three terminal electrically erasable programmable read only memory
US4542485A (en) * 1981-01-14 1985-09-17 Tokyo Shibaura Denki Kabushiki Kaisha Semiconductor integrated circuit
DE3108726A1 (de) * 1981-03-07 1982-09-16 Deutsche Itt Industries Gmbh, 7800 Freiburg Monolithisch integrierte referenzspannungsquelle
US4495602A (en) * 1981-12-28 1985-01-22 Mostek Corporation Multi-bit read only memory circuit
US4577215A (en) * 1983-02-18 1986-03-18 Rca Corporation Dual word line, electrically alterable, nonvolatile floating gate memory device
US4442447A (en) * 1982-03-09 1984-04-10 Rca Corporation Electrically alterable nonvolatile floating gate memory device
JPS5984398A (ja) * 1982-11-08 1984-05-16 Hitachi Ltd Ｅｅｐｒｏｍ装置
JPS6032363A (ja) * 1983-08-02 1985-02-19 Nec Corp 不揮発性半導体記憶装置の製造方法
JPS6084836A (ja) * 1983-10-17 1985-05-14 Hitachi Ltd 半導体装置
JPH0638318B2 (ja) * 1985-02-15 1994-05-18 株式会社リコー Ｅｐｒｏｍの書込み方法
JPH0772996B2 (ja) * 1987-01-31 1995-08-02 株式会社東芝 不揮発性半導体メモリ
JPS63221415A (ja) * 1987-03-11 1988-09-14 Sony Corp 基準電圧発生装置
JPH01113999A (ja) * 1987-10-28 1989-05-02 Toshiba Corp 不揮発性メモリのストレステスト回路
US4888630A (en) * 1988-03-21 1989-12-19 Texas Instruments Incorporated Floating-gate transistor with a non-linear intergate dielectric

Also Published As

Publication number Publication date
JPH03214779A (ja) 1991-09-19
ES2047286T3 (es) 1994-02-16
DE69003321T2 (de) 1994-01-13
EP0409697B1 (de) 1993-09-15
CA2021585C (fr) 1994-02-22
EP0409697A1 (de) 1991-01-23
US5394359A (en) 1995-02-28
JP2860308B2 (ja) 1999-02-24
FR2650109A1 (fr) 1991-01-25
CA2021585A1 (fr) 1991-01-21
FR2650109B1 (fr) 1993-04-02

Similar Documents

Publication Publication Date Title
DE69003321D1 (de) MOS-integrierte Schaltung mit regelbarer Schwellspannung.
DE3884058D1 (de) Hochspannungshalbleiter mit integrierter Niederspannungsschaltung.
DE68917900D1 (de) Spannungsreglerschaltung.
NO891828D0 (no) Integrert kretskort.
DE69013267D1 (de) Integrierte Halbleiterschaltungsanordnung.
DE68911376D1 (de) MOSFET mit Drainspannungsdetektorfunktion.
DE69023479D1 (de) Fressenbeständige kugelumlaufschraubspindel.
DE69015666D1 (de) MOSFET-Transistor mit nicht-gleichmässiger Schwellspannung im Kanalbereich.
DE69023565D1 (de) Integrierte Halbleiterschaltung.
DE68912617D1 (de) Spannungsseitige MOS-Treiberschaltung.
DE69012194D1 (de) Integrierter Halbleiterschaltkreis.
DE3774253D1 (de) Spannungsschalter in mos-technologie.
DE68921088D1 (de) Integrierte Halbleiterschaltung.
DE69010618D1 (de) Batteriespannungs-Diskriminatorschaltung.
DE69016509D1 (de) Integrierte Halbleiterschaltungsanordnung mit Testschaltung.
DE69020316D1 (de) MOS-Schaltkreis mit einem Gate-optimierten lateralen bipolaren Transistor.
DE69011038D1 (de) Integrierte Halbleiterschaltung.
DE3788971D1 (de) Spannungsvergleichsschaltung.
DE69000150D1 (de) Hochspannungs-spiralwiderstand.
DE68916093D1 (de) Integrierte Schaltung.
DE69114408D1 (de) Konstantspannungserzeugungsschaltung.
DE69111528D1 (de) Integrierter Halbleiterschaltkreis.
DE69106986D1 (de) Hochspannungsschalter mit Selbstbeblasung.
DE3581159D1 (de) Halbleiteranordnung mit integrierter schaltung.
DE69015727D1 (de) Konstantspannungsschaltung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee