DE68926373T2 - Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur - Google Patents

Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur

Info

Publication number
DE68926373T2
DE68926373T2 DE68926373T DE68926373T DE68926373T2 DE 68926373 T2 DE68926373 T2 DE 68926373T2 DE 68926373 T DE68926373 T DE 68926373T DE 68926373 T DE68926373 T DE 68926373T DE 68926373 T2 DE68926373 T2 DE 68926373T2
Authority
DE
Germany
Prior art keywords
producing
mask structure
ray mask
ray
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68926373T
Other languages
English (en)
Other versions
DE68926373D1 (de
Inventor
Takeshi Miyachi
Yasuaki Fukuda
Keiko Chiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63243912A external-priority patent/JPH0294423A/ja
Priority claimed from JP63243916A external-priority patent/JPH0294426A/ja
Priority claimed from JP63243918A external-priority patent/JPH0294428A/ja
Priority claimed from JP1223276A external-priority patent/JPH0388319A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68926373D1 publication Critical patent/DE68926373D1/de
Application granted granted Critical
Publication of DE68926373T2 publication Critical patent/DE68926373T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE68926373T 1988-09-30 1989-09-29 Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur Expired - Fee Related DE68926373T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP63243912A JPH0294423A (ja) 1988-09-30 1988-09-30 Ｘ線マスク構造体
JP63243916A JPH0294426A (ja) 1988-09-30 1988-09-30 Ｘ線マスク構造体及びその製造方法
JP63243918A JPH0294428A (ja) 1988-09-30 1988-09-30 Ｘ線マスク構造体
JP1223276A JPH0388319A (ja) 1989-08-31 1989-08-31 Ｘ線マスク構造体の製造方法

Publications (2)

Publication Number Publication Date
DE68926373D1 DE68926373D1 (de) 1996-06-05
DE68926373T2 true DE68926373T2 (de) 1996-09-26

Family

ID=27477071

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68926373T Expired - Fee Related DE68926373T2 (de) 1988-09-30 1989-09-29 Verfahren zur Herstellung einer Röntgenstrahlmasken-Struktur

Country Status (3)

Country Link
US (1) US5656398A (de)
EP (1) EP0361516B1 (de)
DE (1) DE68926373T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715880B2 (ja) * 1989-12-26 1995-02-22 信越化学工業株式会社 Ｘ線リソグラフィー用ＳｉＣ膜、その製造方法およびＸ線リソグラフィー用マスク
JP4252262B2 (ja) * 2002-07-11 2009-04-08 株式会社オクテック 露光用転写マスクの製造方法
US8377859B2 (en) * 2007-07-25 2013-02-19 Exxonmobil Research And Engineering Company Hydrocarbon fluids with improved pour point
DE102008037387A1 (de) * 2008-09-24 2010-03-25 Aixtron Ag Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske
US20140165906A1 (en) * 2012-12-13 2014-06-19 Varian Semiconductor Equipment Associates, Inc. Magnetic masks for an ion implant apparatus

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3927943A (en) * 1974-07-01 1975-12-23 Bell Telephone Labor Inc Mask alignment method
JPS5315256A (en) * 1976-07-28 1978-02-10 Sumitomo Light Metal Ind Method of fabricating expanding material
US4522842A (en) * 1982-09-09 1985-06-11 At&T Bell Laboratories Boron nitride X-ray masks with controlled stress
JPS6068340A (ja) * 1983-09-26 1985-04-18 Canon Inc Ｘ線リソグラフィー用マスク構造体の保持方法
JPS6077424A (ja) * 1983-10-05 1985-05-02 Hitachi Ltd Ｘ線露光装置のマスク固定装置
JPS60251621A (ja) * 1984-05-29 1985-12-12 Hitachi Ltd Ｘ線マスク及びこれを用いたｘ線露光装置
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
CN1007847B (zh) * 1984-12-24 1990-05-02 住友特殊金属株式会社 制造具有改进耐蚀性磁铁的方法
US4963921A (en) * 1985-06-24 1990-10-16 Canon Kabushiki Kaisha Device for holding a mask
DE3620970A1 (de) * 1985-06-24 1987-01-08 Canon Kk Maskenhaltevorrichtung
US4735877A (en) * 1985-10-07 1988-04-05 Canon Kabushiki Kaisha Lithographic mask structure and lithographic process
JPH0679158B2 (ja) * 1985-11-08 1994-10-05 キヤノン株式会社 リソグラフイ−用マスク構造体
JPS62249066A (ja) * 1986-04-22 1987-10-30 Eruma:Kk 血液検査用校正液
JPS62260335A (ja) * 1986-05-06 1987-11-12 Hitachi Ltd パタ−ン検査方法および装置
DE3789829T2 (de) * 1986-06-06 1994-09-01 Seiko Instr Inc Seltene Erden-Eisenmagnet und Herstellungsverfahren.
JPH0732113B2 (ja) * 1986-06-12 1995-04-10 日本電信電話株式会社 Ｘ線マスクの製法及びｘ線マスク製造用基板
JPS6351633A (ja) * 1986-08-20 1988-03-04 Nec Corp Ｘ線露光マスク
JPH0746681B2 (ja) * 1986-10-28 1995-05-17 富士通株式会社 Ｘ線ステッパー用マスクの製造方法
JPS63210845A (ja) * 1987-02-27 1988-09-01 Hitachi Ltd 欠陥修正方法
AT392857B (de) * 1987-07-13 1991-06-25 Ims Ionen Mikrofab Syst Vorrichtung und verfahren zur inspektion einer maske
JPH02310395A (ja) * 1989-05-26 1990-12-26 Johoku Riken Kogyo:Kk ネオジウム―鉄―ボロン系焼結磁石の防食方法

Also Published As

Publication number Publication date
DE68926373D1 (de) 1996-06-05
US5656398A (en) 1997-08-12
EP0361516A3 (de) 1991-05-02
EP0361516B1 (de) 1996-05-01
EP0361516A2 (de) 1990-04-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: WESER & KOLLEGEN, 81245 MUENCHEN

8339 Ceased/non-payment of the annual fee