DE68926351D1 - Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen - Google Patents

Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen

Info

Publication number
DE68926351D1
DE68926351D1 DE68926351T DE68926351T DE68926351D1 DE 68926351 D1 DE68926351 D1 DE 68926351D1 DE 68926351 T DE68926351 T DE 68926351T DE 68926351 T DE68926351 T DE 68926351T DE 68926351 D1 DE68926351 D1 DE 68926351D1
Authority
DE
Germany
Prior art keywords
trinical
novolacoligomer
derivatives
radiation
certain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68926351T
Other languages
English (en)
Other versions
DE68926351T2 (de
Inventor
Alfred Jeffries
Andrew Blakeney
Medhat Toukhy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OCG Microelectronic Materials Inc
Original Assignee
OCG Microelectronic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OCG Microelectronic Materials Inc filed Critical OCG Microelectronic Materials Inc
Application granted granted Critical
Publication of DE68926351D1 publication Critical patent/DE68926351D1/de
Publication of DE68926351T2 publication Critical patent/DE68926351T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/24—Halogenated derivatives
    • C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE68926351T 1988-12-27 1989-12-16 Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen Expired - Lifetime DE68926351T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/290,009 US4957846A (en) 1988-12-27 1988-12-27 Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
PCT/US1989/005595 WO1990007538A1 (en) 1988-12-27 1989-12-16 Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures

Publications (2)

Publication Number Publication Date
DE68926351D1 true DE68926351D1 (de) 1996-05-30
DE68926351T2 DE68926351T2 (de) 1996-09-05

Family

ID=23114140

Family Applications (2)

Application Number Title Priority Date Filing Date
DE68929328T Expired - Lifetime DE68929328T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige Novolakoligomerderivate
DE68926351T Expired - Lifetime DE68926351T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE68929328T Expired - Lifetime DE68929328T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige Novolakoligomerderivate

Country Status (6)

Country Link
US (1) US4957846A (de)
EP (2) EP0451170B1 (de)
JP (2) JP2608346B2 (de)
AU (1) AU4748690A (de)
DE (2) DE68929328T2 (de)
WO (1) WO1990007538A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991003769A1 (en) * 1989-09-08 1991-03-21 Olin Hunt Specialty Products Inc. Radiation-sensitive compositions containing fully substituted novolak polymers
US4957846A (en) 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JP2741243B2 (ja) * 1989-05-11 1998-04-15 日本ゼオン株式会社 ポジ型レジスト組成物
US5324620A (en) * 1989-09-08 1994-06-28 Ocg Microeletronic Materials, Inc. Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH0460548A (ja) * 1990-06-29 1992-02-26 Fuji Photo Film Co Ltd パターン形成用組成物及び微細パターン形成方法
JPH04178451A (ja) * 1990-11-09 1992-06-25 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5300396A (en) * 1990-11-28 1994-04-05 Hoechst Celanese Corporation Process of making naphthoquinone diazide esters using lactone solvents
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
JPH05204144A (ja) * 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5306594A (en) * 1991-11-04 1994-04-26 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3224115B2 (ja) * 1994-03-17 2001-10-29 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
JPH0915853A (ja) * 1995-04-27 1997-01-17 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
US6214516B1 (en) * 1998-10-01 2001-04-10 Arch Specialty Chemicals, Inc. Photosensitive resin compositions
US6127086A (en) * 1998-10-01 2000-10-03 Arch Specialty Chemicals, Inc. Photosensitive resin compositions
ATE366952T1 (de) * 1999-06-01 2007-08-15 Toray Industries Positiv arbeitende lichtempfindliche polyimidvorstufen-zusammensetzung
JP4179579B2 (ja) * 2000-05-08 2008-11-12 東洋合成工業株式会社 １，２−ナフトキノンジアジド系感光剤の製造方法
US6713225B2 (en) 2002-03-15 2004-03-30 Toyo Gosei Kogyo Co., Ltd. 1,2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition
US7563556B2 (en) * 2006-11-17 2009-07-21 Kodak Graphic Communications Gmbh Multilayer element with low pH developer solubility
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
US8173745B2 (en) 2009-12-16 2012-05-08 Momentive Specialty Chemicals Inc. Compositions useful for preparing composites and composites produced therewith

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3384618A (en) * 1960-11-24 1968-05-21 Imoto Minoru Method of producing synthetic resins from aromatic glycols and a phenol
GB1140528A (en) * 1965-10-18 1969-01-22 Ici Ltd Substances for use in improving the bondability to rubber or shaped articles of polyester
US4070318A (en) 1975-07-21 1978-01-24 The General Tire & Rubber Company Pollution free method of making 2,6-bis(2,4-dihydroxy phenylmethyl)-4-chlorophenol tire cord dips and products
EP0001321B1 (de) * 1977-08-19 1981-07-22 Vulnax International Limited Alkanolamin-Salze von Phenolharzen sowie deren Herstellung und Verwendung in Bindemitteln
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
EP0054258B1 (de) * 1980-12-17 1986-03-05 Konica Corporation Lichtempfindliche Zusammensetzungen
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4614826A (en) * 1983-02-28 1986-09-30 Mitsui Petrochemical Industries, Ltd. Polyglycidyl ethers of polynuclear polyhydric phenols
DE3323343A1 (de) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS6210646A (ja) 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPS62123451A (ja) * 1985-08-17 1987-06-04 Oki Electric Ind Co Ltd 放射線感応性ネガ型レジスト材料
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS62269946A (ja) * 1986-05-19 1987-11-24 Oki Electric Ind Co Ltd レジストパタ−ン形成方法
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
US4957846A (en) 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Also Published As

Publication number Publication date
AU4748690A (en) 1990-08-01
DE68929328T2 (de) 2002-07-04
JPH04502519A (ja) 1992-05-07
EP0451170A1 (de) 1991-10-16
WO1990007538A1 (en) 1990-07-12
EP0451170B1 (de) 1996-04-24
JPH08295716A (ja) 1996-11-12
JP2785926B2 (ja) 1998-08-13
JP2608346B2 (ja) 1997-05-07
EP0685766B1 (de) 2001-09-26
DE68929328D1 (de) 2001-10-31
EP0451170A4 (en) 1992-07-22
DE68926351T2 (de) 1996-09-05
US4957846A (en) 1990-09-18
EP0685766A1 (de) 1995-12-06

Similar Documents

Publication Publication Date Title
DE68926351D1 (de) Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen
DE69404382D1 (de) Urea-Derivate und ihre Verwendung als ACAT-hemmenden Verbindungen
DE58904478D1 (de) Strahlungsempfindliche gemische und deren verwendung.
ATE182880T1 (de) Alkylthio-oximäther-derivate und deren verwendung als fungizide
DE58907082D1 (de) Strahlungsempfindliche Gemische und deren Verwendung.
DE3785312D1 (de) Substituierte tetrahydropyridinoxime und ihre verwendung als cholinergische heilmittel.
DE69332898T2 (de) 4-Carboxamidopiperidinderivate und ihre Verwendung als Neurokinin Antagonisten
ATE172725T1 (de) Chinazolin-derivate als insektizide
DE68905946D1 (de) Sulfoniumsalze und deren verwendung als photoinitiatoren.
DE68929305D1 (de) Oligoribonukleotid-Derivate und Verwendung davon als Antiviral Arzneimittel
KR900700424A (ko) 디플루오로벤젠 유도체
DK405489A (da) Heterocykliske forbindelser
DE69228502D1 (de) Phthalocyaninverbindungen und ihre Verwendung
DE68919312D1 (de) p-Terphenylderivate und Flüssigkristall-Zusammensetzungen.
DE69131842D1 (de) Piperidinderivate und ihre Verwendung als antiarrhythmische Wirkstoffe
DE3888466D1 (de) 6-Arylaminomethylchinolin-Derivate und ihre Verwendung als Antitumorwirkstoff.
DE69214718D1 (de) 4,4'-Biphenylendiphosphonit Verbindungen und ihre Verwendung
FI96094C (fi) Absorptiokappale
DE3879811D1 (de) Pharmazeutische zusammensetzung und ihre verwendung.
DE3776962D1 (de) Lichtempfindliche harzzusammensetzung und ihre verwendung.
DE3761138D1 (de) Nitratderivate und ihre verwendung als gefaesserweiterer.
ATE113600T1 (de) Benzodiazepinverbindungen und ihre verwendung als arzneimittel.
DE69518322D1 (de) C-4 amid substituierte verbindungen und deren verwendung als therapeutische mittel
ATE9093T1 (de) Benzodiazepinderivate und ihre verwendung als arzneimittel.
DE3875877D1 (de) Phthalocyaninverbindungen und ihre verwendung.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition