DE68929328D1 - Bestimmte dreikernige Novolakoligomerderivate - Google Patents

Bestimmte dreikernige Novolakoligomerderivate

Info

Publication number
DE68929328D1
DE68929328D1 DE68929328T DE68929328T DE68929328D1 DE 68929328 D1 DE68929328 D1 DE 68929328D1 DE 68929328 T DE68929328 T DE 68929328T DE 68929328 T DE68929328 T DE 68929328T DE 68929328 D1 DE68929328 D1 DE 68929328D1
Authority
DE
Germany
Prior art keywords
certain
oligomer derivatives
novolak oligomer
trinuclear
trinuclear novolak
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68929328T
Other languages
English (en)
Other versions
DE68929328T2 (de
Inventor
Alfred T Jeffries Iii
Andrew J Blakeney
Medhat A Toukhy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arch Specialty Chemicals Inc
Original Assignee
Arch Specialty Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arch Specialty Chemicals Inc filed Critical Arch Specialty Chemicals Inc
Application granted granted Critical
Publication of DE68929328D1 publication Critical patent/DE68929328D1/de
Publication of DE68929328T2 publication Critical patent/DE68929328T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/24—Halogenated derivatives
    • C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE68929328T 1988-12-27 1989-12-16 Bestimmte dreikernige Novolakoligomerderivate Expired - Lifetime DE68929328T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/290,009 US4957846A (en) 1988-12-27 1988-12-27 Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Publications (2)

Publication Number Publication Date
DE68929328D1 true DE68929328D1 (de) 2001-10-31
DE68929328T2 DE68929328T2 (de) 2002-07-04

Family

ID=23114140

Family Applications (2)

Application Number Title Priority Date Filing Date
DE68926351T Expired - Lifetime DE68926351T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen
DE68929328T Expired - Lifetime DE68929328T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige Novolakoligomerderivate

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE68926351T Expired - Lifetime DE68926351T2 (de) 1988-12-27 1989-12-16 Bestimmte dreikernige novolakoligomerderivate als photoaktive verbindungen und ihre verwendung in strahlungsempfindlichen mischungen

Country Status (6)

Country Link
US (1) US4957846A (de)
EP (2) EP0451170B1 (de)
JP (2) JP2608346B2 (de)
AU (1) AU4748690A (de)
DE (2) DE68926351T2 (de)
WO (1) WO1990007538A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4957846A (en) 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
JP2741243B2 (ja) * 1989-05-11 1998-04-15 日本ゼオン株式会社 ポジ型レジスト組成物
EP0701169B1 (de) * 1989-09-08 1998-12-30 Olin Microelectronic Chemicals, Inc. Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen
US5324620A (en) * 1989-09-08 1994-06-28 Ocg Microeletronic Materials, Inc. Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH0460548A (ja) * 1990-06-29 1992-02-26 Fuji Photo Film Co Ltd パターン形成用組成物及び微細パターン形成方法
JPH04178451A (ja) * 1990-11-09 1992-06-25 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5300396A (en) * 1990-11-28 1994-04-05 Hoechst Celanese Corporation Process of making naphthoquinone diazide esters using lactone solvents
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
JPH05204144A (ja) * 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
US5306594A (en) * 1991-11-04 1994-04-26 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3224115B2 (ja) * 1994-03-17 2001-10-29 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
JPH0915853A (ja) * 1995-04-27 1997-01-17 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
US6127086A (en) * 1998-10-01 2000-10-03 Arch Specialty Chemicals, Inc. Photosensitive resin compositions
US6214516B1 (en) * 1998-10-01 2001-04-10 Arch Specialty Chemicals, Inc. Photosensitive resin compositions
US6524764B1 (en) * 1999-06-01 2003-02-25 Toray Industries, Inc. Positive-type photosensitive polyimide precursor composition
JP4179579B2 (ja) * 2000-05-08 2008-11-12 東洋合成工業株式会社 １，２−ナフトキノンジアジド系感光剤の製造方法
EP1345080A3 (de) 2002-03-15 2004-02-04 Toyo Gosei Kogyo Co., Ltd. 1,2-Naphthoquinone-2-Diazidesulfonate Ester lichtempfindliche Verbindung, Verfahren zur Herstellung einer lichtempfindlichen Verbindung Photoresistzusammensetzung
US7563556B2 (en) * 2006-11-17 2009-07-21 Kodak Graphic Communications Gmbh Multilayer element with low pH developer solubility
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
US8173745B2 (en) 2009-12-16 2012-05-08 Momentive Specialty Chemicals Inc. Compositions useful for preparing composites and composites produced therewith

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3384618A (en) * 1960-11-24 1968-05-21 Imoto Minoru Method of producing synthetic resins from aromatic glycols and a phenol
GB1140528A (en) * 1965-10-18 1969-01-22 Ici Ltd Substances for use in improving the bondability to rubber or shaped articles of polyester
US4070318A (en) 1975-07-21 1978-01-24 The General Tire & Rubber Company Pollution free method of making 2,6-bis(2,4-dihydroxy phenylmethyl)-4-chlorophenol tire cord dips and products
DE2860859D1 (en) * 1977-08-19 1981-10-29 Vulnax International Ltd Alkanolamine salts of phenolic resins, their manufacture and their use as bonding agents
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3174017D1 (en) * 1980-12-17 1986-04-10 Konishiroku Photo Ind Photosensitive compositions
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4614826A (en) * 1983-02-28 1986-09-30 Mitsui Petrochemical Industries, Ltd. Polyglycidyl ethers of polynuclear polyhydric phenols
DE3323343A1 (de) * 1983-06-29 1985-01-10 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS6210646A (ja) 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPS62123451A (ja) * 1985-08-17 1987-06-04 Oki Electric Ind Co Ltd 放射線感応性ネガ型レジスト材料
EP0227487B1 (de) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JPS62269946A (ja) * 1986-05-19 1987-11-24 Oki Electric Ind Co Ltd レジストパタ−ン形成方法
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
US4957846A (en) 1988-12-27 1990-09-18 Olin Hunt Specialty Products Inc. Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Also Published As

Publication number Publication date
JP2785926B2 (ja) 1998-08-13
AU4748690A (en) 1990-08-01
US4957846A (en) 1990-09-18
JP2608346B2 (ja) 1997-05-07
EP0451170B1 (de) 1996-04-24
JPH04502519A (ja) 1992-05-07
DE68929328T2 (de) 2002-07-04
EP0451170A1 (de) 1991-10-16
WO1990007538A1 (en) 1990-07-12
DE68926351D1 (de) 1996-05-30
EP0451170A4 (en) 1992-07-22
DE68926351T2 (de) 1996-09-05
JPH08295716A (ja) 1996-11-12
EP0685766B1 (de) 2001-09-26
EP0685766A1 (de) 1995-12-06

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Legal Events

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8364 No opposition during term of opposition