DE68923487T2 - Elektronischer Speicher. - Google Patents
Elektronischer Speicher.Info
- Publication number
- DE68923487T2 DE68923487T2 DE68923487T DE68923487T DE68923487T2 DE 68923487 T2 DE68923487 T2 DE 68923487T2 DE 68923487 T DE68923487 T DE 68923487T DE 68923487 T DE68923487 T DE 68923487T DE 68923487 T2 DE68923487 T2 DE 68923487T2
- Authority
- DE
- Germany
- Prior art keywords
- floating gate
- cell
- read
- write
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007667 floating Methods 0.000 claims abstract description 145
- 239000003990 capacitor Substances 0.000 claims abstract description 68
- 239000004020 conductor Substances 0.000 claims 1
- 230000008878 coupling Effects 0.000 abstract description 11
- 238000010168 coupling process Methods 0.000 abstract description 11
- 238000005859 coupling reaction Methods 0.000 abstract description 11
- 230000005684 electric field Effects 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 3
- 206010011906 Death Diseases 0.000 description 2
- 230000005689 Fowler Nordheim tunneling Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000005641 tunneling Effects 0.000 description 2
- 238000005513 bias potential Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
- G11C16/0441—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
- Saccharide Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/207,323 US5005155A (en) | 1988-06-15 | 1988-06-15 | Optimized electrically erasable PLA cell for minimum read disturb |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE68923487D1 DE68923487D1 (de) | 1995-08-24 |
| DE68923487T2 true DE68923487T2 (de) | 1996-03-21 |
Family
ID=22770053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE68923487T Expired - Fee Related DE68923487T2 (de) | 1988-06-15 | 1989-06-07 | Elektronischer Speicher. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5005155A (enExample) |
| EP (2) | EP0347093B1 (enExample) |
| JP (1) | JP2688612B2 (enExample) |
| AT (1) | ATE125385T1 (enExample) |
| DE (1) | DE68923487T2 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5170373A (en) * | 1989-10-31 | 1992-12-08 | Sgs-Thomson Microelectronics, Inc. | Three transistor eeprom cell |
| DE69124849T2 (de) * | 1990-06-29 | 1997-06-12 | Texas Instruments Inc | Elektrisch löschbare, elektrisch programmierbare Festwertspeicherzelle mit wählbarer Schwellspannung und Verfahren zu ihrer Verwendung |
| JP2829156B2 (ja) * | 1991-07-25 | 1998-11-25 | 株式会社東芝 | 不揮発性半導体記憶装置の冗長回路 |
| US5247478A (en) * | 1992-03-06 | 1993-09-21 | Altera Corporation | Programmable transfer-devices |
| JPH09512658A (ja) * | 1994-04-29 | 1997-12-16 | アトメル・コーポレイション | 高速で、不揮発性の電気的にプログラム可能で、かつ消去可能なセルおよび方法 |
| TW318961B (enExample) * | 1994-05-04 | 1997-11-01 | Nippon Precision Circuits | |
| WO1996001499A1 (en) * | 1994-07-05 | 1996-01-18 | Zycad Corporation | A general purpose, non-volatile reprogrammable switch |
| US5648669A (en) * | 1995-05-26 | 1997-07-15 | Cypress Semiconductor | High speed flash memory cell structure and method |
| US5742542A (en) * | 1995-07-03 | 1998-04-21 | Advanced Micro Devices, Inc. | Non-volatile memory cells using only positive charge to store data |
| US5640344A (en) * | 1995-07-25 | 1997-06-17 | Btr, Inc. | Programmable non-volatile bidirectional switch for programmable logic |
| US5581501A (en) * | 1995-08-17 | 1996-12-03 | Altera Corporation | Nonvolatile SRAM cells and cell arrays |
| US6331724B1 (en) * | 1995-11-17 | 2001-12-18 | Nippon Precision Circuits, Inc. | Single transistor E2prom memory device with controlled erasing |
| EP0778581B1 (en) * | 1995-12-07 | 2002-08-14 | Samsung Electronics Co., Ltd. | Nonvolatile memory device |
| US6005806A (en) | 1996-03-14 | 1999-12-21 | Altera Corporation | Nonvolatile configuration cells and cell arrays |
| US5949710A (en) * | 1996-04-10 | 1999-09-07 | Altera Corporation | Programmable interconnect junction |
| US5959891A (en) | 1996-08-16 | 1999-09-28 | Altera Corporation | Evaluation of memory cell characteristics |
| US6236597B1 (en) | 1996-09-16 | 2001-05-22 | Altera Corporation | Nonvolatile memory cell with multiple gate oxide thicknesses |
| US6018476A (en) * | 1996-09-16 | 2000-01-25 | Altera Corporation | Nonvolatile configuration cells and cell arrays |
| US5914904A (en) * | 1996-10-01 | 1999-06-22 | Altera Corporation | Compact electrically erasable memory cells and arrays |
| US6201732B1 (en) | 1997-01-02 | 2001-03-13 | John M. Caywood | Low voltage single CMOS electrically erasable read-only memory |
| US5986931A (en) | 1997-01-02 | 1999-11-16 | Caywood; John M. | Low voltage single CMOS electrically erasable read-only memory |
| US5905675A (en) * | 1997-03-20 | 1999-05-18 | Altera Corporation | Biasing scheme for reducing stress and improving reliability in EEPROM cells |
| US6268623B1 (en) | 1997-03-20 | 2001-07-31 | Altera Corporation | Apparatus and method for margin testing single polysilicon EEPROM cells |
| US6781883B1 (en) | 1997-03-20 | 2004-08-24 | Altera Corporation | Apparatus and method for margin testing single polysilicon EEPROM cells |
| US5847993A (en) * | 1997-06-23 | 1998-12-08 | Xilinx, Inc. | Non-volatile programmable CMOS logic cell and method of operating same |
| US5912836A (en) * | 1997-12-01 | 1999-06-15 | Amic Technology, Inc. | Circuit for detecting both charge gain and charge loss properties in a non-volatile memory array |
| JP4530464B2 (ja) * | 2000-03-09 | 2010-08-25 | ルネサスエレクトロニクス株式会社 | 半導体集積回路 |
| CN100461424C (zh) * | 2003-12-30 | 2009-02-11 | 中芯国际集成电路制造(上海)有限公司 | 半导体集成电路隧道氧化窗口区域设计的结构及方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6034198B2 (ja) * | 1980-11-26 | 1985-08-07 | 富士通株式会社 | 不揮発性メモリ |
| US4546454A (en) * | 1982-11-05 | 1985-10-08 | Seeq Technology, Inc. | Non-volatile memory cell fuse element |
| US4654825A (en) * | 1984-01-06 | 1987-03-31 | Advanced Micro Devices, Inc. | E2 prom memory cell |
| EP0160720B1 (de) * | 1984-05-07 | 1988-01-07 | Deutsche ITT Industries GmbH | Halbleiterspeicherzelle mit einem potentialmässig schwebenden Speichergate |
| US4628487A (en) * | 1984-08-14 | 1986-12-09 | Texas Instruments Incorporated | Dual slope, feedback controlled, EEPROM programming |
| EP0215064A1 (en) * | 1985-03-08 | 1987-03-25 | Ncr Corporation | Floating gate nonvolatile field effect memory device |
| US4663740A (en) * | 1985-07-01 | 1987-05-05 | Silicon Macrosystems Incorporated | High speed eprom cell and array |
| US4695979A (en) * | 1985-09-09 | 1987-09-22 | Texas Instruments Incorporated | Modified four transistor EEPROM cell |
| US4715014A (en) * | 1985-10-29 | 1987-12-22 | Texas Instruments Incorporated | Modified three transistor EEPROM cell |
| JP2554620B2 (ja) * | 1985-12-12 | 1996-11-13 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| EP0265554A1 (en) * | 1986-10-31 | 1988-05-04 | INTERSIL, INC. (a Delaware corp.) | Electrically erasable fused programmable logic array |
| JPH0640589B2 (ja) * | 1987-03-16 | 1994-05-25 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| US4788663A (en) * | 1987-04-24 | 1988-11-29 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device with a lightly-doped drain structure |
-
1988
- 1988-06-15 US US07/207,323 patent/US5005155A/en not_active Expired - Lifetime
-
1989
- 1989-06-07 AT AT89305724T patent/ATE125385T1/de active
- 1989-06-07 DE DE68923487T patent/DE68923487T2/de not_active Expired - Fee Related
- 1989-06-07 EP EP89305724A patent/EP0347093B1/en not_active Expired - Lifetime
- 1989-06-07 EP EP19930115685 patent/EP0582319A2/en not_active Withdrawn
- 1989-06-12 JP JP14927989A patent/JP2688612B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0582319A2 (en) | 1994-02-09 |
| JPH02103796A (ja) | 1990-04-16 |
| EP0582319A3 (enExample) | 1994-03-23 |
| EP0347093B1 (en) | 1995-07-19 |
| JP2688612B2 (ja) | 1997-12-10 |
| US5005155A (en) | 1991-04-02 |
| EP0347093A2 (en) | 1989-12-20 |
| EP0347093A3 (en) | 1992-03-11 |
| ATE125385T1 (de) | 1995-08-15 |
| DE68923487D1 (de) | 1995-08-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: VANTIS CORP.)N.D.GES.D.STAATES DELAWARE), SUNNYVAL |
|
| 8339 | Ceased/non-payment of the annual fee |