DE60317370D1 - Verfahren zur herstellung eines optischen datenträgers, optischer datenträger und gerät zur ausführung besagten verfahrens - Google Patents

Verfahren zur herstellung eines optischen datenträgers, optischer datenträger und gerät zur ausführung besagten verfahrens

Info

Publication number
DE60317370D1
DE60317370D1 DE60317370T DE60317370T DE60317370D1 DE 60317370 D1 DE60317370 D1 DE 60317370D1 DE 60317370 T DE60317370 T DE 60317370T DE 60317370 T DE60317370 T DE 60317370T DE 60317370 D1 DE60317370 D1 DE 60317370D1
Authority
DE
Germany
Prior art keywords
layer
liquid
optical data
substrate
temperature rise
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60317370T
Other languages
English (en)
Other versions
DE60317370T2 (de
Inventor
Petrus H Vromans
Katerina Musialkova
De Kerkhof Fransiscus S Van
Erik J Prins
Johannes C Jacobs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE60317370D1 publication Critical patent/DE60317370D1/de
Application granted granted Critical
Publication of DE60317370T2 publication Critical patent/DE60317370T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0209—Multistage baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Holo Graphy (AREA)
DE60317370T 2003-01-14 2003-11-04 Verfahren zur herstellung eines optischen datenträgers, optischer datenträger und gerät zur ausführung besagten verfahrens Expired - Lifetime DE60317370T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03075140 2003-01-14
EP03075140 2003-01-14
PCT/IB2003/005010 WO2004064055A1 (en) 2003-01-14 2003-11-04 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method

Publications (2)

Publication Number Publication Date
DE60317370D1 true DE60317370D1 (de) 2007-12-20
DE60317370T2 DE60317370T2 (de) 2008-08-21

Family

ID=34354515

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60317370T Expired - Lifetime DE60317370T2 (de) 2003-01-14 2003-11-04 Verfahren zur herstellung eines optischen datenträgers, optischer datenträger und gerät zur ausführung besagten verfahrens

Country Status (10)

Country Link
US (2) US7897206B2 (de)
EP (1) EP1588362B1 (de)
JP (1) JP2006513516A (de)
KR (1) KR100971442B1 (de)
CN (1) CN100358032C (de)
AT (1) ATE377825T1 (de)
AU (1) AU2003274611A1 (de)
DE (1) DE60317370T2 (de)
TW (1) TWI344643B (de)
WO (1) WO2004064055A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7221640B2 (en) * 2002-05-21 2007-05-22 Koninklijke Philips Electronics N.V. Method of manufacturing an optical storage medium and optical storage medium
US8088438B2 (en) 2004-06-03 2012-01-03 Shibaura Mechatronics Corporation Resin layer formation method, resin layer formation device, and disk manufacturing method
WO2006030494A1 (ja) * 2004-09-14 2006-03-23 Origin Electric Company, Limited 樹脂膜の形成方法及び装置
JP2006155726A (ja) * 2004-11-29 2006-06-15 Tohoku Pioneer Corp 光ディスクの製造方法および製造装置
FR2891477B1 (fr) * 2005-10-04 2008-02-15 Essilor Int Procede de coloration d'une lentille par centrifugation ("spin-coating") et lentille coloree obtenue par ce procede
US20070105400A1 (en) * 2005-11-08 2007-05-10 Unaxis Balzers Ag Method and apparatus for control of layer thicknesses
JP4529895B2 (ja) * 2005-12-22 2010-08-25 ソニー株式会社 光ディスクの製造方法
DE102006061585B4 (de) * 2006-08-23 2013-11-28 Singulus Technologies Ag Verfahren und Vorrichtung zur Rotationsbeschichtung von Substraten
JP5262117B2 (ja) * 2007-04-11 2013-08-14 株式会社リコー スピンコート装置及びその温度制御方法、並びに光ディスク製造装置及び光ディスク製造方法
DE102007021249A1 (de) * 2007-05-07 2008-11-20 Singulus Technologies Ag Sauerstoff-Inhibierung eines härtbaren Materials beim Strukturieren von Substraten
EP2328149A1 (de) * 2009-11-26 2011-06-01 Pheenix Alpha AB Verfahren und Anordnung zur Erzeugung einer Oberflächenschicht auf einer Disk
US20140273498A1 (en) * 2013-03-15 2014-09-18 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus and substrate processing method
EP2995438A1 (de) * 2014-09-10 2016-03-16 Airbus Operations GmbH Verfahren zur Überwachung des Verfahrens zur Beschichtung einer Werkstückoberfläche
CN111842056B (zh) * 2020-07-29 2021-12-10 中科同帜半导体(江苏)有限公司 一种电子元器件生产用滚动涂胶装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59232339A (ja) * 1983-06-16 1984-12-27 Toshiba Corp フオトレジスト膜形成方法
JP2516573B2 (ja) * 1987-10-22 1996-07-24 日本コロムビア株式会社 塗布装置
JPH01173691A (ja) 1987-12-28 1989-07-10 Matsushita Electric Ind Co Ltd プリント配線基板のスクリーン印刷方法
JPH01262968A (ja) * 1988-04-14 1989-10-19 Daicel Chem Ind Ltd スピンコータ
JP2001176125A (ja) 1988-11-08 2001-06-29 Pioneer Electronic Corp 光学式情報記録担体
US5580607A (en) * 1991-07-26 1996-12-03 Tokyo Electron Limited Coating apparatus and method
US6042712A (en) * 1995-05-26 2000-03-28 Formfactor, Inc. Apparatus for controlling plating over a face of a substrate
JPH09167382A (ja) 1995-12-14 1997-06-24 Tosoh Corp 貼り合わせディスク及びその製造方法
US5916368A (en) * 1997-02-27 1999-06-29 The Fairchild Corporation Method and apparatus for temperature controlled spin-coating systems
JPH1173691A (ja) 1997-08-29 1999-03-16 Sony Corp 光ディスク製造方法及びその方法により製造された光ディスク
EP1047055A1 (de) 1999-04-22 2000-10-25 3M Innovative Properties Company Optisches Speichermedium
US6695922B2 (en) * 1999-12-15 2004-02-24 Tokyo Electron Limited Film forming unit
JP4258096B2 (ja) * 2000-04-25 2009-04-30 ソニー株式会社 光記録媒体の製造装置及び製造方法
JP2002184047A (ja) 2000-12-12 2002-06-28 Pioneer Electronic Corp 成膜装置および成膜方法
JP2002184048A (ja) 2000-12-12 2002-06-28 Pioneer Electronic Corp 成膜装置および成膜方法
EP1215670A3 (de) * 2000-12-12 2003-05-28 Pioneer Corporation Verfahren und Vorrichtung zur Herstellung von Filmen
JP2002279707A (ja) 2001-03-22 2002-09-27 Toshiba Corp 片面２層ディスクの作製方法、該２層ディスク及び記録再生装置
JP2003233936A (ja) * 2002-02-07 2003-08-22 Pioneer Electronic Corp 光ディスクの製造方法及びその製造装置
EP1569759B1 (de) * 2002-12-05 2008-02-13 OC Oerlikon Balzers AG Verfahren und vorichtung zur kontrolle der schichtdicke

Also Published As

Publication number Publication date
US7897206B2 (en) 2011-03-01
CN100358032C (zh) 2007-12-26
TWI344643B (en) 2011-07-01
CN1739152A (zh) 2006-02-22
KR20050097941A (ko) 2005-10-10
TW200421292A (en) 2004-10-16
US20060059501A1 (en) 2006-03-16
JP2006513516A (ja) 2006-04-20
EP1588362B1 (de) 2007-11-07
ATE377825T1 (de) 2007-11-15
DE60317370T2 (de) 2008-08-21
WO2004064055A1 (en) 2004-07-29
AU2003274611A1 (en) 2004-08-10
EP1588362A1 (de) 2005-10-26
KR100971442B1 (ko) 2010-07-21
US20110097532A1 (en) 2011-04-28

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