DE602008004255D1 - Verfahren zur elektrodeponierung von metallen mithilfe ionischer flüssigkeiten unter verwendung eines zusatzstoffs - Google Patents
Verfahren zur elektrodeponierung von metallen mithilfe ionischer flüssigkeiten unter verwendung eines zusatzstoffsInfo
- Publication number
- DE602008004255D1 DE602008004255D1 DE602008004255T DE602008004255T DE602008004255D1 DE 602008004255 D1 DE602008004255 D1 DE 602008004255D1 DE 602008004255 T DE602008004255 T DE 602008004255T DE 602008004255 T DE602008004255 T DE 602008004255T DE 602008004255 D1 DE602008004255 D1 DE 602008004255D1
- Authority
- DE
- Germany
- Prior art keywords
- metal
- additive
- ionic liquid
- electrodeponing
- metals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002184 metal Substances 0.000 title abstract 8
- 229910052751 metal Inorganic materials 0.000 title abstract 8
- 239000002608 ionic liquid Substances 0.000 title abstract 5
- 239000000654 additive Substances 0.000 title abstract 3
- 230000000996 additive effect Effects 0.000 title abstract 3
- 150000002739 metals Chemical class 0.000 title 1
- 239000003792 electrolyte Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07113717 | 2007-08-02 | ||
US95443407P | 2007-08-07 | 2007-08-07 | |
PCT/EP2008/059962 WO2009016189A1 (fr) | 2007-08-02 | 2008-07-30 | Procédé pour électrodéposer des métaux à l'aide de liquides ioniques en présence d'un additif |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602008004255D1 true DE602008004255D1 (de) | 2011-02-10 |
Family
ID=38870310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602008004255T Active DE602008004255D1 (de) | 2007-08-02 | 2008-07-30 | Verfahren zur elektrodeponierung von metallen mithilfe ionischer flüssigkeiten unter verwendung eines zusatzstoffs |
Country Status (12)
Country | Link |
---|---|
US (1) | US20100252446A1 (fr) |
EP (1) | EP2171131B1 (fr) |
JP (1) | JP2010535283A (fr) |
CN (1) | CN101765681B (fr) |
AT (1) | ATE493523T1 (fr) |
CA (1) | CA2695488A1 (fr) |
DE (1) | DE602008004255D1 (fr) |
ES (1) | ES2358967T3 (fr) |
HK (1) | HK1143194A1 (fr) |
PL (1) | PL2171131T3 (fr) |
TW (1) | TWI359880B (fr) |
WO (1) | WO2009016189A1 (fr) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2408950A4 (fr) * | 2009-03-17 | 2015-05-20 | Commw Scient Ind Res Org | Électro-récupération de métaux |
DE102009035660A1 (de) * | 2009-07-30 | 2011-02-03 | Ewald Dörken Ag | Verfahren zur elektrochemischen Beschichtung eines Werkstücks |
US20120189778A1 (en) * | 2011-01-26 | 2012-07-26 | Riewe Curtis H | Coating method using ionic liquid |
CN102888630B (zh) * | 2011-07-20 | 2015-11-18 | 中国科学院过程工程研究所 | 一种离子液体/添加剂体系低温电沉积制备纳米铝或纳米铝镀层的方法 |
US9758884B2 (en) * | 2012-02-16 | 2017-09-12 | Stacey Hingley | Color control of trivalent chromium deposits |
DE102012104707A1 (de) * | 2012-05-31 | 2013-12-05 | Benteler Automobiltechnik Gmbh | Verfahren zum Herstellen eines Abgaswärmetauschers |
DK2859138T3 (en) | 2012-06-08 | 2017-02-27 | Onderzoekscentrum Voor Aanwending Van Staal N V | Process for making a metal coating |
CN102839403B (zh) * | 2012-09-10 | 2015-02-25 | 太原理工大学 | 一种离子液体中电镀铝的方法 |
CN103484900A (zh) * | 2013-09-18 | 2014-01-01 | 湖南工业大学 | 一种离子液体中直接电沉积晶态纳米晶无微裂纹铬镀层的方法 |
EP3080338B1 (fr) | 2013-12-10 | 2018-10-03 | Lei Chen | Composite de nickel-chrome-aluminium par électrodéposition |
US10669867B2 (en) | 2013-12-10 | 2020-06-02 | Raytheon Technologies Corporation | Electrodeposited nickel-chromium alloy |
EP3080323B1 (fr) | 2013-12-11 | 2019-05-15 | United Technologies Corporation | Alliage nickel-chrome électroformé |
CN104294327B (zh) * | 2014-10-20 | 2016-07-13 | 中国科学院过程工程研究所 | 一种离子液体电解液及用该电解液制备光亮铝镀层的方法 |
CN105220216B (zh) * | 2015-09-28 | 2017-08-25 | 中国科学院兰州化学物理研究所 | 一种铝或铝合金电化学抛光方法 |
TWI662162B (zh) * | 2016-11-15 | 2019-06-11 | 財團法人工業技術研究院 | 一種電鍍方法及其系統 |
JP7072796B2 (ja) * | 2018-02-19 | 2022-05-23 | 国立大学法人 名古屋工業大学 | 調光部材 |
US20210156041A1 (en) * | 2019-11-22 | 2021-05-27 | Hamilton Sundstrand Corporation | Metallic coating and method of application |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5265120A (en) * | 1975-11-26 | 1977-05-30 | Sony Corp | Electro plating method of aluminium or aluminium alloy |
JPH01132571A (ja) * | 1987-11-18 | 1989-05-25 | Aguro Kanesho Kk | 農園芸用殺菌剤 |
GB0023708D0 (en) * | 2000-09-27 | 2000-11-08 | Scionix Ltd | Hydrated salt mixtures |
GB0023706D0 (en) * | 2000-09-27 | 2000-11-08 | Scionix Ltd | Ionic liquids |
US6552843B1 (en) * | 2002-01-31 | 2003-04-22 | Innovative Technology Licensing Llc | Reversible electrodeposition device with ionic liquid electrolyte |
US20050205425A1 (en) * | 2002-06-25 | 2005-09-22 | Integran Technologies | Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents |
US6721080B1 (en) * | 2002-09-27 | 2004-04-13 | D Morgan Tench | Optimum switching of a reversible electrochemical mirror device |
US6798556B2 (en) * | 2003-01-31 | 2004-09-28 | Rockwell Scientific Licensing, Llc. | Locally-switched reversible electrodeposition optical modulator |
DE102004059520A1 (de) * | 2004-12-10 | 2006-06-14 | Merck Patent Gmbh | Elektrochemische Abscheidung von Tantal und/oder Kupfer in ionischen Flüssigkeiten |
US7320832B2 (en) * | 2004-12-17 | 2008-01-22 | Integran Technologies Inc. | Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate |
JP2007070698A (ja) * | 2005-09-07 | 2007-03-22 | Kyoto Univ | 金属の電析方法 |
KR20080110989A (ko) * | 2006-02-15 | 2008-12-22 | 아크조 노벨 엔.브이. | 이온성 액체를 사용하여 금속을 전착시키는 방법 |
-
2008
- 2008-07-30 PL PL08786597T patent/PL2171131T3/pl unknown
- 2008-07-30 WO PCT/EP2008/059962 patent/WO2009016189A1/fr active Application Filing
- 2008-07-30 CA CA2695488A patent/CA2695488A1/fr not_active Abandoned
- 2008-07-30 CN CN2008801010499A patent/CN101765681B/zh not_active Expired - Fee Related
- 2008-07-30 JP JP2010518655A patent/JP2010535283A/ja active Pending
- 2008-07-30 US US12/671,830 patent/US20100252446A1/en not_active Abandoned
- 2008-07-30 ES ES08786597T patent/ES2358967T3/es active Active
- 2008-07-30 EP EP08786597A patent/EP2171131B1/fr not_active Not-in-force
- 2008-07-30 AT AT08786597T patent/ATE493523T1/de active
- 2008-07-30 DE DE602008004255T patent/DE602008004255D1/de active Active
- 2008-08-01 TW TW097129448A patent/TWI359880B/zh not_active IP Right Cessation
-
2010
- 2010-10-13 HK HK10109690.2A patent/HK1143194A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101765681B (zh) | 2013-03-20 |
PL2171131T3 (pl) | 2011-05-31 |
CA2695488A1 (fr) | 2009-02-05 |
TW200925334A (en) | 2009-06-16 |
EP2171131A1 (fr) | 2010-04-07 |
ATE493523T1 (de) | 2011-01-15 |
HK1143194A1 (en) | 2010-12-24 |
CN101765681A (zh) | 2010-06-30 |
US20100252446A1 (en) | 2010-10-07 |
WO2009016189A1 (fr) | 2009-02-05 |
ES2358967T3 (es) | 2011-05-17 |
JP2010535283A (ja) | 2010-11-18 |
EP2171131B1 (fr) | 2010-12-29 |
TWI359880B (en) | 2012-03-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602008004255D1 (de) | Verfahren zur elektrodeponierung von metallen mithilfe ionischer flüssigkeiten unter verwendung eines zusatzstoffs | |
Wu et al. | Study on the anodizing of AZ31 magnesium alloys in alkaline borate solutions | |
Lamaka et al. | Complex anticorrosion coating for ZK30 magnesium alloy | |
Tang et al. | The effect of H2S concentration on the corrosion behavior of carbon steel at 90 C | |
Liu et al. | The corrosion of two aluminium sacrificial anode alloys in SRB-containing sea mud | |
Song et al. | Investigation of a novel self-sealing pore micro-arc oxidation film on AM60 magnesium alloy | |
Khorsand et al. | An investigation on the role of texture and surface morphology in the corrosion resistance of zinc electrodeposits | |
ATE510044T1 (de) | Verfahren zur präzisionsbearbeitung von substraten und dessen verwendung | |
RU2011145280A (ru) | Компонент из суперсплава и способ его усовершенствования | |
TW200641185A (en) | Electrolytic anode and method for electrolytically synthesizing fluorine-containing substance using the electrolytic anode | |
Sassi et al. | Study of the electroplating mechanism and physicochemical proprieties of deposited Ni-W-Silicate composite alloy | |
MY161119A (en) | Steel sheet for container and method of manufacturing the same | |
ATE455879T1 (de) | Vorrichtung und verfahren zur galvanischen beschichtung | |
GB0612094D0 (en) | Electrode, method of manufacture and use thereof | |
EP2562294A3 (fr) | Appareil et bain de placage | |
ATE360712T1 (de) | Verfahren zur ausbildung eines polymerfilms auf einer elektrisch leitenden oder halbleitenden fläche durch elektropfropfen, erhaltene flächen und anwendungen davon | |
ATE505438T1 (de) | Verfahren zur aktivierung einer auf diamant basierenden elektrode | |
EP2006417A3 (fr) | Structure d'électrode en diamant conductrice et procédé pour la synthèse électrolytique de matériau contenant du fluor | |
CN104404511B (zh) | 一种镁合金表面多巴胺生物质防腐蚀膜的制备方法 | |
WO2007087050A8 (fr) | Revetements electrolytiques composites utilisables a la place du chrome dur | |
Sánchez et al. | Electrochemical and analytical assessment of galvanized steel reinforcement pre-treated with Ce and La salts under alkaline media | |
SG10201408084WA (en) | Composition | |
ATE394381T1 (de) | Saures bad zur elektrolytischen abscheidung eines kupferniederschlags, enthaltend halogenierte oder pseudohalogenierte monomere phenaziniumverbindungen | |
TW201407004A (zh) | 電解退鍍液及應用該電解退鍍液進行退鍍的方法 | |
Jiang et al. | Superhydrophobic copper coating with ultrahigh corrosion resistance by electrodeposition process in a deep eutectic solvent |