JP2010535283A - 添加剤存在下でのイオン液体を用いる金属電着方法 - Google Patents
添加剤存在下でのイオン液体を用いる金属電着方法 Download PDFInfo
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- JP2010535283A JP2010535283A JP2010518655A JP2010518655A JP2010535283A JP 2010535283 A JP2010535283 A JP 2010535283A JP 2010518655 A JP2010518655 A JP 2010518655A JP 2010518655 A JP2010518655 A JP 2010518655A JP 2010535283 A JP2010535283 A JP 2010535283A
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- Prior art keywords
- chloride
- anion
- group
- metal
- ionic liquid
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 81
- 239000002184 metal Substances 0.000 title claims abstract description 81
- 239000002608 ionic liquid Substances 0.000 title claims abstract description 51
- 239000000654 additive Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000004070 electrodeposition Methods 0.000 title description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000003792 electrolyte Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 150000003839 salts Chemical class 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 230000000996 additive effect Effects 0.000 claims abstract description 16
- 238000009713 electroplating Methods 0.000 claims abstract description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 10
- -1 halide anion Chemical class 0.000 claims description 44
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 23
- 239000003760 tallow Substances 0.000 claims description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 20
- 150000001450 anions Chemical class 0.000 claims description 20
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 19
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 19
- 229910052804 chromium Inorganic materials 0.000 claims description 18
- 239000011651 chromium Substances 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 14
- 150000001768 cations Chemical class 0.000 claims description 12
- MPNXSZJPSVBLHP-UHFFFAOYSA-N 2-chloro-n-phenylpyridine-3-carboxamide Chemical compound ClC1=NC=CC=C1C(=O)NC1=CC=CC=C1 MPNXSZJPSVBLHP-UHFFFAOYSA-N 0.000 claims description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 11
- 235000019270 ammonium chloride Nutrition 0.000 claims description 11
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 10
- NQMRYBIKMRVZLB-UHFFFAOYSA-N methylamine hydrochloride Chemical compound [Cl-].[NH3+]C NQMRYBIKMRVZLB-UHFFFAOYSA-N 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- ROSDSFDQCJNGOL-UHFFFAOYSA-N protonated dimethyl amine Natural products CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 9
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- 229960001231 choline Drugs 0.000 claims description 7
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 claims description 7
- CADWTSSKOVRVJC-UHFFFAOYSA-N benzyl(dimethyl)azanium;chloride Chemical compound [Cl-].C[NH+](C)CC1=CC=CC=C1 CADWTSSKOVRVJC-UHFFFAOYSA-N 0.000 claims description 6
- OQADVBLQZQTGLL-UHFFFAOYSA-N 2-ethyl-n,n-dimethylhexan-1-amine Chemical compound CCCCC(CC)CN(C)C OQADVBLQZQTGLL-UHFFFAOYSA-N 0.000 claims description 5
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims description 5
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 5
- 125000000524 functional group Chemical group 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-M 1,1-dioxo-1,2-benzothiazol-3-olate Chemical compound C1=CC=C2C([O-])=NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-M 0.000 claims description 3
- VUQPJRPDRDVQMN-UHFFFAOYSA-N 1-chlorooctadecane Chemical compound CCCCCCCCCCCCCCCCCCCl VUQPJRPDRDVQMN-UHFFFAOYSA-N 0.000 claims description 3
- LKAWQFHWVVSFTR-UHFFFAOYSA-N 2-(methylamino)ethanol;hydrochloride Chemical compound [Cl-].C[NH2+]CCO LKAWQFHWVVSFTR-UHFFFAOYSA-N 0.000 claims description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 claims description 3
- HMVYIDXCIJENRW-UHFFFAOYSA-O 2-hydroxyethyl(methyl)azanium;nitrate Chemical compound [O-][N+]([O-])=O.C[NH2+]CCO HMVYIDXCIJENRW-UHFFFAOYSA-O 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
- JMHWNJGXUIJPKG-UHFFFAOYSA-N CC(=O)O[SiH](CC=C)OC(C)=O Chemical compound CC(=O)O[SiH](CC=C)OC(C)=O JMHWNJGXUIJPKG-UHFFFAOYSA-N 0.000 claims description 3
- RUPBZQFQVRMKDG-UHFFFAOYSA-M Didecyldimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)CCCCCCCCCC RUPBZQFQVRMKDG-UHFFFAOYSA-M 0.000 claims description 3
- 235000010469 Glycine max Nutrition 0.000 claims description 3
- 244000068988 Glycine max Species 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- CBSOFSBFHDQRLV-UHFFFAOYSA-N N-methylbenzylamine hydrochloride Chemical compound [Cl-].C[NH2+]CC1=CC=CC=C1 CBSOFSBFHDQRLV-UHFFFAOYSA-N 0.000 claims description 3
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 claims description 3
- 239000007983 Tris buffer Substances 0.000 claims description 3
- 125000006177 alkyl benzyl group Chemical group 0.000 claims description 3
- RBRXPPLNXDVMKG-GMFCBQQYSA-M bis(2-hydroxyethyl)-methyl-[(z)-octadec-9-enyl]azanium;chloride Chemical compound [Cl-].CCCCCCCC\C=C/CCCCCCCC[N+](C)(CCO)CCO RBRXPPLNXDVMKG-GMFCBQQYSA-M 0.000 claims description 3
- SUZSZZWHCFLFSP-UHFFFAOYSA-M bis(2-hydroxyethyl)-methyl-octadecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(CCO)CCO SUZSZZWHCFLFSP-UHFFFAOYSA-M 0.000 claims description 3
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 3
- 229960004670 didecyldimethylammonium chloride Drugs 0.000 claims description 3
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- JZMJDSHXVKJFKW-UHFFFAOYSA-M methyl sulfate(1-) Chemical compound COS([O-])(=O)=O JZMJDSHXVKJFKW-UHFFFAOYSA-M 0.000 claims description 3
- FAGMGMRSURYROS-UHFFFAOYSA-M trihexadecyl(methyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(CCCCCCCCCCCCCCCC)CCCCCCCCCCCCCCCC FAGMGMRSURYROS-UHFFFAOYSA-M 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- 150000001879 copper Chemical class 0.000 claims 2
- QYWVQMLYIXYLRE-SEYXRHQNSA-N trimethyl-[(z)-octadec-9-enyl]azanium Chemical compound CCCCCCCC\C=C/CCCCCCCC[N+](C)(C)C QYWVQMLYIXYLRE-SEYXRHQNSA-N 0.000 claims 2
- YXLXNENXOJSQEI-UHFFFAOYSA-L Oxine-copper Chemical compound [Cu+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 YXLXNENXOJSQEI-UHFFFAOYSA-L 0.000 claims 1
- 238000005498 polishing Methods 0.000 abstract 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 13
- 239000010962 carbon steel Substances 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- 238000007747 plating Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000001763 2-hydroxyethyl(trimethyl)azanium Substances 0.000 description 4
- 235000019743 Choline chloride Nutrition 0.000 description 4
- 238000000441 X-ray spectroscopy Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- SGMZJAMFUVOLNK-UHFFFAOYSA-M choline chloride Chemical compound [Cl-].C[N+](C)(C)CCO SGMZJAMFUVOLNK-UHFFFAOYSA-M 0.000 description 4
- 229960003178 choline chloride Drugs 0.000 description 4
- LJAOOBNHPFKCDR-UHFFFAOYSA-K chromium(3+) trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Cl-].[Cr+3] LJAOOBNHPFKCDR-UHFFFAOYSA-K 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000004626 scanning electron microscopy Methods 0.000 description 4
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- 239000007787 solid Substances 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- NAOLWIGVYRIGTP-UHFFFAOYSA-N 1,3,5-trihydroxyanthracene-9,10-dione Chemical compound C1=CC(O)=C2C(=O)C3=CC(O)=CC(O)=C3C(=O)C2=C1 NAOLWIGVYRIGTP-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- 229910021556 Chromium(III) chloride Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 description 2
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 235000007831 chromium(III) chloride Nutrition 0.000 description 2
- 239000011636 chromium(III) chloride Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
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- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
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- 108010010803 Gelatin Proteins 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
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- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- PXWLUICTRPHECG-UHFFFAOYSA-N azane;trihydrochloride Chemical compound N.Cl.Cl.Cl PXWLUICTRPHECG-UHFFFAOYSA-N 0.000 description 1
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- IBGXTGBPGSOZST-UHFFFAOYSA-N benzyl(2-hydroxyethyl)azanium;chloride Chemical compound Cl.OCCNCC1=CC=CC=C1 IBGXTGBPGSOZST-UHFFFAOYSA-N 0.000 description 1
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- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000003765 sweetening agent Substances 0.000 description 1
- HRTKQUHFGZFPPF-UHFFFAOYSA-M tetraethylazanium;fluoride;dihydrate Chemical compound O.O.[F-].CC[N+](CC)(CC)CC HRTKQUHFGZFPPF-UHFFFAOYSA-M 0.000 description 1
- MYXKPFMQWULLOH-UHFFFAOYSA-M tetramethylazanium;hydroxide;pentahydrate Chemical compound O.O.O.O.O.[OH-].C[N+](C)(C)C MYXKPFMQWULLOH-UHFFFAOYSA-M 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- HVLUSYMLLVVXGI-USGGBSEESA-M trimethyl-[(z)-octadec-9-enyl]azanium;chloride Chemical compound [Cl-].CCCCCCCC\C=C/CCCCCCCC[N+](C)(C)C HVLUSYMLLVVXGI-USGGBSEESA-M 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 1
- FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 1
- 235000012141 vanillin Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/66—Electroplating: Baths therefor from melts
- C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07113717 | 2007-08-02 | ||
| US95443407P | 2007-08-07 | 2007-08-07 | |
| PCT/EP2008/059962 WO2009016189A1 (fr) | 2007-08-02 | 2008-07-30 | Procédé pour électrodéposer des métaux à l'aide de liquides ioniques en présence d'un additif |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2010535283A true JP2010535283A (ja) | 2010-11-18 |
Family
ID=38870310
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010518655A Pending JP2010535283A (ja) | 2007-08-02 | 2008-07-30 | 添加剤存在下でのイオン液体を用いる金属電着方法 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US20100252446A1 (fr) |
| EP (1) | EP2171131B1 (fr) |
| JP (1) | JP2010535283A (fr) |
| CN (1) | CN101765681B (fr) |
| AT (1) | ATE493523T1 (fr) |
| CA (1) | CA2695488A1 (fr) |
| DE (1) | DE602008004255D1 (fr) |
| ES (1) | ES2358967T3 (fr) |
| HK (1) | HK1143194A1 (fr) |
| PL (1) | PL2171131T3 (fr) |
| TW (1) | TWI359880B (fr) |
| WO (1) | WO2009016189A1 (fr) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9580772B2 (en) * | 2009-03-17 | 2017-02-28 | Commonwealth Scientific And Industrial Research Organisation | Electrorecovery of metals |
| DE102009035660A1 (de) * | 2009-07-30 | 2011-02-03 | Ewald Dörken Ag | Verfahren zur elektrochemischen Beschichtung eines Werkstücks |
| US20120189778A1 (en) * | 2011-01-26 | 2012-07-26 | Riewe Curtis H | Coating method using ionic liquid |
| CN102888630B (zh) * | 2011-07-20 | 2015-11-18 | 中国科学院过程工程研究所 | 一种离子液体/添加剂体系低温电沉积制备纳米铝或纳米铝镀层的方法 |
| US9758884B2 (en) * | 2012-02-16 | 2017-09-12 | Stacey Hingley | Color control of trivalent chromium deposits |
| DE102012104707A1 (de) * | 2012-05-31 | 2013-12-05 | Benteler Automobiltechnik Gmbh | Verfahren zum Herstellen eines Abgaswärmetauschers |
| WO2013182631A1 (fr) | 2012-06-08 | 2013-12-12 | Onderzoekscentrum Voor Aanwending Van Staal N.V. | Procédé de production d'un revêtement métallique |
| CN102839403B (zh) * | 2012-09-10 | 2015-02-25 | 太原理工大学 | 一种离子液体中电镀铝的方法 |
| CN103484900A (zh) * | 2013-09-18 | 2014-01-01 | 湖南工业大学 | 一种离子液体中直接电沉积晶态纳米晶无微裂纹铬镀层的方法 |
| WO2015088859A2 (fr) | 2013-12-10 | 2015-06-18 | Lei Chen | Alliage nickel-chrome électrodéposé |
| EP3080338B1 (fr) | 2013-12-10 | 2018-10-03 | Lei Chen | Composite de nickel-chrome-aluminium par électrodéposition |
| US10378118B2 (en) * | 2013-12-11 | 2019-08-13 | United Technologies Corporation | Electroformed nickel-chromium alloy |
| CN104294327B (zh) * | 2014-10-20 | 2016-07-13 | 中国科学院过程工程研究所 | 一种离子液体电解液及用该电解液制备光亮铝镀层的方法 |
| CN105220216B (zh) * | 2015-09-28 | 2017-08-25 | 中国科学院兰州化学物理研究所 | 一种铝或铝合金电化学抛光方法 |
| TWI662162B (zh) * | 2016-11-15 | 2019-06-11 | 財團法人工業技術研究院 | 一種電鍍方法及其系統 |
| JP7072796B2 (ja) * | 2018-02-19 | 2022-05-23 | 国立大学法人 名古屋工業大学 | 調光部材 |
| US20210156041A1 (en) * | 2019-11-22 | 2021-05-27 | Hamilton Sundstrand Corporation | Metallic coating and method of application |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5265120A (en) * | 1975-11-26 | 1977-05-30 | Sony Corp | Electro plating method of aluminium or aluminium alloy |
| JP2004509927A (ja) * | 2000-09-27 | 2004-04-02 | サイオニックス・リミテッド | イオン性液体類及びその使用方法 |
| JP2004509945A (ja) * | 2000-09-27 | 2004-04-02 | サイオニックス・リミテッド | イオン性液体類及び溶媒としてのその使用方法 |
| JP2007070698A (ja) * | 2005-09-07 | 2007-03-22 | Kyoto Univ | 金属の電析方法 |
| JP2008523242A (ja) * | 2004-12-10 | 2008-07-03 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | イオン性液体中でのタンタルおよび／または銅の電気化学的沈着 |
| JP2009526910A (ja) * | 2006-02-15 | 2009-07-23 | アクゾ ノーベル ナムローゼ フェンノートシャップ | イオン液体を用いる金属電着法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01132571A (ja) * | 1987-11-18 | 1989-05-25 | Aguro Kanesho Kk | 農園芸用殺菌剤 |
| US6552843B1 (en) * | 2002-01-31 | 2003-04-22 | Innovative Technology Licensing Llc | Reversible electrodeposition device with ionic liquid electrolyte |
| US20050205425A1 (en) * | 2002-06-25 | 2005-09-22 | Integran Technologies | Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents |
| US6721080B1 (en) * | 2002-09-27 | 2004-04-13 | D Morgan Tench | Optimum switching of a reversible electrochemical mirror device |
| US6798556B2 (en) * | 2003-01-31 | 2004-09-28 | Rockwell Scientific Licensing, Llc. | Locally-switched reversible electrodeposition optical modulator |
| US7320832B2 (en) * | 2004-12-17 | 2008-01-22 | Integran Technologies Inc. | Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate |
-
2008
- 2008-07-30 US US12/671,830 patent/US20100252446A1/en not_active Abandoned
- 2008-07-30 JP JP2010518655A patent/JP2010535283A/ja active Pending
- 2008-07-30 DE DE602008004255T patent/DE602008004255D1/de active Active
- 2008-07-30 AT AT08786597T patent/ATE493523T1/de active
- 2008-07-30 WO PCT/EP2008/059962 patent/WO2009016189A1/fr active Application Filing
- 2008-07-30 CN CN2008801010499A patent/CN101765681B/zh not_active Expired - Fee Related
- 2008-07-30 CA CA2695488A patent/CA2695488A1/fr not_active Abandoned
- 2008-07-30 ES ES08786597T patent/ES2358967T3/es active Active
- 2008-07-30 EP EP08786597A patent/EP2171131B1/fr not_active Not-in-force
- 2008-07-30 PL PL08786597T patent/PL2171131T3/pl unknown
- 2008-08-01 TW TW097129448A patent/TWI359880B/zh not_active IP Right Cessation
-
2010
- 2010-10-13 HK HK10109690.2A patent/HK1143194A1/xx not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5265120A (en) * | 1975-11-26 | 1977-05-30 | Sony Corp | Electro plating method of aluminium or aluminium alloy |
| JP2004509927A (ja) * | 2000-09-27 | 2004-04-02 | サイオニックス・リミテッド | イオン性液体類及びその使用方法 |
| JP2004509945A (ja) * | 2000-09-27 | 2004-04-02 | サイオニックス・リミテッド | イオン性液体類及び溶媒としてのその使用方法 |
| JP2008523242A (ja) * | 2004-12-10 | 2008-07-03 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | イオン性液体中でのタンタルおよび／または銅の電気化学的沈着 |
| JP2007070698A (ja) * | 2005-09-07 | 2007-03-22 | Kyoto Univ | 金属の電析方法 |
| JP2009526910A (ja) * | 2006-02-15 | 2009-07-23 | アクゾ ノーベル ナムローゼ フェンノートシャップ | イオン液体を用いる金属電着法 |
Also Published As
| Publication number | Publication date |
|---|---|
| HK1143194A1 (en) | 2010-12-24 |
| DE602008004255D1 (de) | 2011-02-10 |
| TW200925334A (en) | 2009-06-16 |
| CA2695488A1 (fr) | 2009-02-05 |
| US20100252446A1 (en) | 2010-10-07 |
| PL2171131T3 (pl) | 2011-05-31 |
| EP2171131B1 (fr) | 2010-12-29 |
| TWI359880B (en) | 2012-03-11 |
| ATE493523T1 (de) | 2011-01-15 |
| WO2009016189A1 (fr) | 2009-02-05 |
| EP2171131A1 (fr) | 2010-04-07 |
| CN101765681B (zh) | 2013-03-20 |
| CN101765681A (zh) | 2010-06-30 |
| ES2358967T3 (es) | 2011-05-17 |
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