CA2695488A1 - Procede pour electrodeposer des metaux a l'aide de liquides ioniques en presence d'un additif - Google Patents

Procede pour electrodeposer des metaux a l'aide de liquides ioniques en presence d'un additif Download PDF

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Publication number
CA2695488A1
CA2695488A1 CA2695488A CA2695488A CA2695488A1 CA 2695488 A1 CA2695488 A1 CA 2695488A1 CA 2695488 A CA2695488 A CA 2695488A CA 2695488 A CA2695488 A CA 2695488A CA 2695488 A1 CA2695488 A1 CA 2695488A1
Authority
CA
Canada
Prior art keywords
ammonium chloride
group
metal
anion
ionic liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA2695488A
Other languages
English (en)
Inventor
Boris Kuzmanovic
Lamberdine Johanna Willemina Maria Nabuurs-Willems
Cornelis Johannes Govardus Van Strien
Franz Winfried Welter
Johanna Christina Speelman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akzo Nobel NV
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2695488A1 publication Critical patent/CA2695488A1/fr
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/66Electroplating: Baths therefor from melts
    • C25D3/665Electroplating: Baths therefor from melts from ionic liquids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrolytic Production Of Metals (AREA)
CA2695488A 2007-08-02 2008-07-30 Procede pour electrodeposer des metaux a l'aide de liquides ioniques en presence d'un additif Abandoned CA2695488A1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP07113717.8 2007-08-02
EP07113717 2007-08-02
US95443407P 2007-08-07 2007-08-07
US60/954,434 2007-08-07
PCT/EP2008/059962 WO2009016189A1 (fr) 2007-08-02 2008-07-30 Procédé pour électrodéposer des métaux à l'aide de liquides ioniques en présence d'un additif

Publications (1)

Publication Number Publication Date
CA2695488A1 true CA2695488A1 (fr) 2009-02-05

Family

ID=38870310

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2695488A Abandoned CA2695488A1 (fr) 2007-08-02 2008-07-30 Procede pour electrodeposer des metaux a l'aide de liquides ioniques en presence d'un additif

Country Status (12)

Country Link
US (1) US20100252446A1 (fr)
EP (1) EP2171131B1 (fr)
JP (1) JP2010535283A (fr)
CN (1) CN101765681B (fr)
AT (1) ATE493523T1 (fr)
CA (1) CA2695488A1 (fr)
DE (1) DE602008004255D1 (fr)
ES (1) ES2358967T3 (fr)
HK (1) HK1143194A1 (fr)
PL (1) PL2171131T3 (fr)
TW (1) TWI359880B (fr)
WO (1) WO2009016189A1 (fr)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9580772B2 (en) * 2009-03-17 2017-02-28 Commonwealth Scientific And Industrial Research Organisation Electrorecovery of metals
DE102009035660A1 (de) * 2009-07-30 2011-02-03 Ewald Dörken Ag Verfahren zur elektrochemischen Beschichtung eines Werkstücks
US20120189778A1 (en) * 2011-01-26 2012-07-26 Riewe Curtis H Coating method using ionic liquid
CN102888630B (zh) * 2011-07-20 2015-11-18 中国科学院过程工程研究所 一种离子液体/添加剂体系低温电沉积制备纳米铝或纳米铝镀层的方法
US9758884B2 (en) * 2012-02-16 2017-09-12 Stacey Hingley Color control of trivalent chromium deposits
DE102012104707A1 (de) * 2012-05-31 2013-12-05 Benteler Automobiltechnik Gmbh Verfahren zum Herstellen eines Abgaswärmetauschers
WO2013182631A1 (fr) 2012-06-08 2013-12-12 Onderzoekscentrum Voor Aanwending Van Staal N.V. Procédé de production d'un revêtement métallique
CN102839403B (zh) * 2012-09-10 2015-02-25 太原理工大学 一种离子液体中电镀铝的方法
CN103484900A (zh) * 2013-09-18 2014-01-01 湖南工业大学 一种离子液体中直接电沉积晶态纳米晶无微裂纹铬镀层的方法
WO2015088859A2 (fr) 2013-12-10 2015-06-18 Lei Chen Alliage nickel-chrome électrodéposé
EP3080338B1 (fr) 2013-12-10 2018-10-03 Lei Chen Composite de nickel-chrome-aluminium par électrodéposition
US10378118B2 (en) * 2013-12-11 2019-08-13 United Technologies Corporation Electroformed nickel-chromium alloy
CN104294327B (zh) * 2014-10-20 2016-07-13 中国科学院过程工程研究所 一种离子液体电解液及用该电解液制备光亮铝镀层的方法
CN105220216B (zh) * 2015-09-28 2017-08-25 中国科学院兰州化学物理研究所 一种铝或铝合金电化学抛光方法
TWI662162B (zh) * 2016-11-15 2019-06-11 財團法人工業技術研究院 一種電鍍方法及其系統
JP7072796B2 (ja) * 2018-02-19 2022-05-23 国立大学法人 名古屋工業大学 調光部材
US20210156041A1 (en) * 2019-11-22 2021-05-27 Hamilton Sundstrand Corporation Metallic coating and method of application

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265120A (en) * 1975-11-26 1977-05-30 Sony Corp Electro plating method of aluminium or aluminium alloy
JPH01132571A (ja) * 1987-11-18 1989-05-25 Aguro Kanesho Kk 農園芸用殺菌剤
GB0023708D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Hydrated salt mixtures
GB0023706D0 (en) * 2000-09-27 2000-11-08 Scionix Ltd Ionic liquids
US6552843B1 (en) * 2002-01-31 2003-04-22 Innovative Technology Licensing Llc Reversible electrodeposition device with ionic liquid electrolyte
US20050205425A1 (en) * 2002-06-25 2005-09-22 Integran Technologies Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents
US6721080B1 (en) * 2002-09-27 2004-04-13 D Morgan Tench Optimum switching of a reversible electrochemical mirror device
US6798556B2 (en) * 2003-01-31 2004-09-28 Rockwell Scientific Licensing, Llc. Locally-switched reversible electrodeposition optical modulator
DE102004059520A1 (de) * 2004-12-10 2006-06-14 Merck Patent Gmbh Elektrochemische Abscheidung von Tantal und/oder Kupfer in ionischen Flüssigkeiten
US7320832B2 (en) * 2004-12-17 2008-01-22 Integran Technologies Inc. Fine-grained metallic coatings having the coefficient of thermal expansion matched to the one of the substrate
JP2007070698A (ja) * 2005-09-07 2007-03-22 Kyoto Univ 金属の電析方法
CA2642427C (fr) * 2006-02-15 2014-03-25 Akzo Nobel N.V. Procede d'electrodeposition de metaux utilisant des liquides ioniques

Also Published As

Publication number Publication date
HK1143194A1 (en) 2010-12-24
DE602008004255D1 (de) 2011-02-10
TW200925334A (en) 2009-06-16
US20100252446A1 (en) 2010-10-07
PL2171131T3 (pl) 2011-05-31
JP2010535283A (ja) 2010-11-18
EP2171131B1 (fr) 2010-12-29
TWI359880B (en) 2012-03-11
ATE493523T1 (de) 2011-01-15
WO2009016189A1 (fr) 2009-02-05
EP2171131A1 (fr) 2010-04-07
CN101765681B (zh) 2013-03-20
CN101765681A (zh) 2010-06-30
ES2358967T3 (es) 2011-05-17

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Legal Events

Date Code Title Description
EEER Examination request

Effective date: 20130718

FZDE Discontinued

Effective date: 20160801