DE602007006704D1 - Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium - Google Patents

Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Info

Publication number
DE602007006704D1
DE602007006704D1 DE602007006704T DE602007006704T DE602007006704D1 DE 602007006704 D1 DE602007006704 D1 DE 602007006704D1 DE 602007006704 T DE602007006704 T DE 602007006704T DE 602007006704 T DE602007006704 T DE 602007006704T DE 602007006704 D1 DE602007006704 D1 DE 602007006704D1
Authority
DE
Germany
Prior art keywords
cleaning
substrate
storage medium
program storage
program
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007006704T
Other languages
English (en)
Inventor
Tsukasa Watanabe
Naoki Shindo
Takahiro Furukawa
Yuji Kamikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE602007006704D1 publication Critical patent/DE602007006704D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/213—Measuring of the properties of the mixtures, e.g. temperature, density or colour
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/2132—Concentration, pH, pOH, p(ION) or oxygen-demand
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
    • B01F35/833—Flow control by valves, e.g. opening intermittently
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE602007006704T 2006-03-15 2007-03-14 Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium Active DE602007006704D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006070538A JP4999338B2 (ja) 2006-03-15 2006-03-15 基板洗浄方法、基板洗浄装置、プログラム、および記録媒体

Publications (1)

Publication Number Publication Date
DE602007006704D1 true DE602007006704D1 (de) 2010-07-08

Family

ID=38121662

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007006704T Active DE602007006704D1 (de) 2006-03-15 2007-03-14 Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Country Status (6)

Country Link
US (2) US8347901B2 (de)
EP (1) EP1834708B1 (de)
JP (1) JP4999338B2 (de)
KR (1) KR101191549B1 (de)
DE (1) DE602007006704D1 (de)
TW (1) TW200804008A (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576270B2 (ja) * 2005-03-29 2010-11-04 昭和電工株式会社 ハンダ回路基板の製造方法
WO2007007865A1 (en) * 2005-07-11 2007-01-18 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and solder-attached electronic circuit board
US20090041990A1 (en) * 2005-09-09 2009-02-12 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and soldered electronic circuit board
JP4890919B2 (ja) * 2006-04-13 2012-03-07 東京エレクトロン株式会社 基板洗浄方法、基板洗浄装置、プログラム、および記録媒体
US20090173358A1 (en) 2008-01-09 2009-07-09 Micron Technology, Inc. Megasonic cleaning with controlled boundary layer thickness and associated systems and methods
JP2009231579A (ja) * 2008-03-24 2009-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板処理方法
JP5154991B2 (ja) * 2008-03-27 2013-02-27 大日本スクリーン製造株式会社 基板処理装置
JP5526118B2 (ja) 2011-12-26 2014-06-18 ジルトロニック アクチエンゲゼルシャフト 超音波洗浄方法
JP5453488B2 (ja) 2012-05-24 2014-03-26 ジルトロニック アクチエンゲゼルシャフト 超音波洗浄方法および超音波洗浄装置
JP5453487B2 (ja) * 2012-05-24 2014-03-26 ジルトロニック アクチエンゲゼルシャフト 超音波洗浄方法および超音波洗浄装置
JP5894858B2 (ja) 2012-05-24 2016-03-30 ジルトロニック アクチエンゲゼルシャフトＳｉｌｔｒｏｎｉｃ ＡＧ 超音波洗浄方法
JP5872382B2 (ja) 2012-05-24 2016-03-01 ジルトロニック アクチエンゲゼルシャフトＳｉｌｔｒｏｎｉｃ ＡＧ 超音波洗浄方法
US9406501B2 (en) 2012-05-31 2016-08-02 Semes Co., Ltd. Apparatus and method for cleaning substrate
US20140196744A1 (en) * 2013-01-11 2014-07-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and device for cleaning a brush surface having a contamination
CN103752557A (zh) * 2014-02-13 2014-04-30 苏州众显电子科技有限公司 一种超声波清洗液晶显示屏基板工艺
DE102015226300A1 (de) 2015-12-21 2017-07-06 Siltronic Ag Verfahren und Vorrichtung zum Reinigen von Scheiben aus Halbleitermaterial
CN106449474A (zh) * 2016-09-29 2017-02-22 无锡宏纳科技有限公司 晶圆片边缘清洗处理装置
TWI718794B (zh) * 2019-10-08 2021-02-11 辛耘企業股份有限公司 濕製程裝置
CN112992740A (zh) * 2021-03-01 2021-06-18 李军平 一种切割晶圆用的清洗设备
CN113975860B (zh) * 2021-12-23 2022-03-22 常州铭赛机器人科技股份有限公司 胶水震动脱泡装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
US5322082A (en) * 1992-10-16 1994-06-21 Yoshihide Shibano Ultrasonic cleaning apparatus
US5505785A (en) * 1994-07-18 1996-04-09 Ferrell; Gary W. Method and apparatus for cleaning integrated circuit wafers
JPH0910468A (ja) * 1995-06-28 1997-01-14 Yoshihide Shibano 布製品の超音波洗浄方法
JP3690619B2 (ja) 1996-01-12 2005-08-31 忠弘 大見 洗浄方法及び洗浄装置
US6058945A (en) 1996-05-28 2000-05-09 Canon Kabushiki Kaisha Cleaning methods of porous surface and semiconductor surface
JP3274389B2 (ja) 1996-08-12 2002-04-15 株式会社東芝 半導体基板の洗浄方法
JP3349636B2 (ja) * 1996-10-04 2002-11-25 株式会社プレテック 高周波洗浄装置
JPH10109072A (ja) * 1996-10-04 1998-04-28 Puretetsuku:Kk 高周波洗浄装置
US5800626A (en) * 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
DE19840989A1 (de) 1997-09-09 1999-03-18 Tokyo Electron Ltd Reinigungsverfahren und Reinigungsgerät
JP2000077376A (ja) * 1998-08-27 2000-03-14 Toshiba Corp 超音波洗浄方法及びその装置
JP2001284306A (ja) * 2000-03-28 2001-10-12 Toshiba Corp 基板洗浄装置および基板洗浄方法
JP2003031535A (ja) * 2001-07-11 2003-01-31 Mitsubishi Electric Corp 半導体製造装置の超音波洗浄方法
US20030029479A1 (en) 2001-08-08 2003-02-13 Dainippon Screen Mfg. Co, Ltd. Substrate cleaning apparatus and method
JP4036626B2 (ja) * 2001-09-27 2008-01-23 シャープ株式会社 超音波洗浄方法および超音波洗浄装置
JP2003234320A (ja) * 2002-02-06 2003-08-22 Nec Electronics Corp 基板の洗浄方法、洗浄薬液、洗浄装置及び半導体装置
US7156927B2 (en) 2002-04-03 2007-01-02 Fsi International, Inc. Transition flow treatment process and apparatus
JP4472234B2 (ja) * 2002-06-12 2010-06-02 大日本スクリーン製造株式会社 基板処理装置および不活性ガス濃度制御方法

Also Published As

Publication number Publication date
KR101191549B1 (ko) 2012-10-15
KR20070093894A (ko) 2007-09-19
US20130152964A1 (en) 2013-06-20
US20070215172A1 (en) 2007-09-20
JP4999338B2 (ja) 2012-08-15
EP1834708A2 (de) 2007-09-19
US9358588B2 (en) 2016-06-07
TWI349585B (de) 2011-10-01
TW200804008A (en) 2008-01-16
JP2007250726A (ja) 2007-09-27
EP1834708B1 (de) 2010-05-26
US8347901B2 (en) 2013-01-08
EP1834708A3 (de) 2007-10-31

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Legal Events

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