DE60200679D1 - Polymer enthaltend Ethinyl-Wiederholeinheiten, Prozess zur Herstellung des Polymers, Zusammensetzung zur Filmherstellung sowie Methode zur Filmherstellung und isolierender Film - Google Patents

Polymer enthaltend Ethinyl-Wiederholeinheiten, Prozess zur Herstellung des Polymers, Zusammensetzung zur Filmherstellung sowie Methode zur Filmherstellung und isolierender Film

Info

Publication number
DE60200679D1
DE60200679D1 DE60200679T DE60200679T DE60200679D1 DE 60200679 D1 DE60200679 D1 DE 60200679D1 DE 60200679 T DE60200679 T DE 60200679T DE 60200679 T DE60200679 T DE 60200679T DE 60200679 D1 DE60200679 D1 DE 60200679D1
Authority
DE
Germany
Prior art keywords
film production
polymer
film
producing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60200679T
Other languages
English (en)
Other versions
DE60200679T2 (de
Inventor
Takashi Okada
Noriyasu Sinohara
Kaori Shirato
Masahiko Ebisawa
Michinori Nishikawa
Kinji Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE60200679D1 publication Critical patent/DE60200679D1/de
Publication of DE60200679T2 publication Critical patent/DE60200679T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F38/00Homopolymers and copolymers of compounds having one or more carbon-to-carbon triple bonds
    • C08F38/02Acetylene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
DE2002600679 2001-04-27 2002-04-25 Polymer enthaltend Ethinyl-Wiederholeinheiten, Prozess zur Herstellung des Polymers, Zusammensetzung zur Filmherstellung sowie Methode zur Filmherstellung und isolierender Film Expired - Lifetime DE60200679T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001131385A JP3606224B2 (ja) 2001-04-27 2001-04-27 重合体及びその製造方法、並びにそれを含有する膜形成用組成物
JP2001131385 2001-04-27

Publications (2)

Publication Number Publication Date
DE60200679D1 true DE60200679D1 (de) 2004-08-05
DE60200679T2 DE60200679T2 (de) 2005-08-25

Family

ID=18979582

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2002600679 Expired - Lifetime DE60200679T2 (de) 2001-04-27 2002-04-25 Polymer enthaltend Ethinyl-Wiederholeinheiten, Prozess zur Herstellung des Polymers, Zusammensetzung zur Filmherstellung sowie Methode zur Filmherstellung und isolierender Film

Country Status (6)

Country Link
US (1) US6884862B2 (de)
EP (1) EP1254917B1 (de)
JP (1) JP3606224B2 (de)
KR (1) KR100864776B1 (de)
DE (1) DE60200679T2 (de)
TW (1) TW583212B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4867078B2 (ja) * 2001-04-27 2012-02-01 Jsr株式会社 重合体及びその製造方法、並びにそれを含有する膜形成用組成物
JP4654568B2 (ja) * 2003-06-17 2011-03-23 日本電気株式会社 二次電池
JP2006291160A (ja) * 2005-03-14 2006-10-26 Fuji Photo Film Co Ltd 膜形成用組成物、それを用いた絶縁膜および電子デバイス
US7211642B2 (en) * 2005-03-29 2007-05-01 The Board Of Trustees Of The Univeristy Of Illinois Thermosetting aromatic dielectric material
GB2451865A (en) * 2007-08-15 2009-02-18 Univ Liverpool Microporous polymers from alkynyl monomers
KR101956925B1 (ko) * 2011-09-30 2019-03-11 제이에스알 가부시끼가이샤 레지스트 하층막 형성용 조성물, 레지스트 하층막 및 그의 형성 방법, 및 패턴 형성 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3300456A (en) 1962-11-21 1967-01-24 Gen Electric Polymeric acetylenes and process for producing the same
US5644013A (en) * 1994-08-18 1997-07-01 Wisconsin Alumni Research Foundation Fluorescent organosilicon polymers
JP4211161B2 (ja) 1999-11-09 2009-01-21 Jsr株式会社 ジイン含有(共)重合体、その製造方法及び硬化膜
JP5320653B2 (ja) * 2001-03-26 2013-10-23 Jsr株式会社 膜形成用組成物および絶縁膜形成用材料

Also Published As

Publication number Publication date
EP1254917A1 (de) 2002-11-06
DE60200679T2 (de) 2005-08-25
US6884862B2 (en) 2005-04-26
JP2002322245A (ja) 2002-11-08
KR100864776B1 (ko) 2008-10-22
EP1254917B1 (de) 2004-06-30
US20020161173A1 (en) 2002-10-31
KR20020083467A (ko) 2002-11-02
TW583212B (en) 2004-04-11
JP3606224B2 (ja) 2005-01-05

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