DE602006007049D1 - Heizelement und Heizvorrichtung mit Heizelementen - Google Patents

Heizelement und Heizvorrichtung mit Heizelementen

Info

Publication number
DE602006007049D1
DE602006007049D1 DE602006007049T DE602006007049T DE602006007049D1 DE 602006007049 D1 DE602006007049 D1 DE 602006007049D1 DE 602006007049 T DE602006007049 T DE 602006007049T DE 602006007049 T DE602006007049 T DE 602006007049T DE 602006007049 D1 DE602006007049 D1 DE 602006007049D1
Authority
DE
Germany
Prior art keywords
heating
elements
heating element
heating device
heating elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006007049T
Other languages
German (de)
English (en)
Inventor
Yoichi Mizukawa
Keita Kanazu
Masaki Yoshioka
Shinji Suzuki
Kyohei Seki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36481395&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602006007049(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE602006007049D1 publication Critical patent/DE602006007049D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K7/00—Lamps for purposes other than general lighting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01K—ELECTRIC INCANDESCENT LAMPS
    • H01K9/00—Lamps having two or more incandescent bodies separately heated
    • H01K9/08—Lamps having two or more incandescent bodies separately heated to provide selectively different light effects, e.g. for automobile headlamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Resistance Heating (AREA)
  • Control Of Resistance Heating (AREA)
  • Chemical Vapour Deposition (AREA)
DE602006007049T 2005-03-02 2006-02-28 Heizelement und Heizvorrichtung mit Heizelementen Active DE602006007049D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005057803 2005-03-02
JP2005191222A JP2006279008A (ja) 2005-03-02 2005-06-30 ヒータ及びヒータを備えた加熱装置

Publications (1)

Publication Number Publication Date
DE602006007049D1 true DE602006007049D1 (de) 2009-07-16

Family

ID=36481395

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006007049T Active DE602006007049D1 (de) 2005-03-02 2006-02-28 Heizelement und Heizvorrichtung mit Heizelementen

Country Status (6)

Country Link
US (1) US7656079B2 (enExample)
EP (1) EP1699071B1 (enExample)
JP (1) JP2006279008A (enExample)
KR (1) KR100859401B1 (enExample)
DE (1) DE602006007049D1 (enExample)
TW (1) TW200633166A (enExample)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4692249B2 (ja) * 2005-11-30 2011-06-01 ウシオ電機株式会社 フィラメントランプ
JP4893159B2 (ja) * 2006-08-24 2012-03-07 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
ITMI20061648A1 (it) * 2006-08-29 2008-02-29 Star Progetti Tecnologie Applicate Spa Dispositivo di irraggiamento di calore tramite infrarossi
JP2008135313A (ja) * 2006-11-29 2008-06-12 Matsushita Electric Ind Co Ltd 発熱体ユニット及び加熱装置
JP4894511B2 (ja) * 2006-12-27 2012-03-14 ウシオ電機株式会社 フィラメントランプ及び光照射式加熱装置
JP4935417B2 (ja) 2007-02-26 2012-05-23 ウシオ電機株式会社 光照射式加熱処理装置
EP2003677A3 (en) 2007-05-29 2009-08-26 Ushiodenki Kabushiki Kaisha Filament lamp and light irradiation type heat treatment device
JP4915532B2 (ja) * 2007-05-29 2012-04-11 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
JP4893474B2 (ja) 2007-05-29 2012-03-07 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
JP5041332B2 (ja) * 2007-05-29 2012-10-03 ウシオ電機株式会社 フィラメントランプ
KR20090005736A (ko) * 2007-07-10 2009-01-14 주성엔지니어링(주) 기판 가열 장치
JP5041149B2 (ja) 2007-10-10 2012-10-03 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
JP5282393B2 (ja) 2007-11-06 2013-09-04 ウシオ電機株式会社 光照射式加熱処理装置
JP5267765B2 (ja) * 2007-11-08 2013-08-21 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
JP5282409B2 (ja) * 2008-02-25 2013-09-04 ウシオ電機株式会社 光照射式加熱方法及び光照射式加熱装置
KR100918103B1 (ko) * 2008-03-25 2009-09-22 강병호 전기 발열관
JP2009238552A (ja) * 2008-03-27 2009-10-15 Ushio Inc フィラメントランプ
KR101103180B1 (ko) 2008-03-27 2012-01-04 우시오덴키 가부시키가이샤 필라멘트 램프
JP4670886B2 (ja) 2008-03-31 2011-04-13 ウシオ電機株式会社 フィラメントランプ
JP5315833B2 (ja) * 2008-07-28 2013-10-16 ウシオ電機株式会社 フィラメントランプ
JP5151773B2 (ja) * 2008-07-29 2013-02-27 ウシオ電機株式会社 フィラメントランプ
JP5120132B2 (ja) * 2008-08-01 2013-01-16 ウシオ電機株式会社 フィラメントランプ
JP4821819B2 (ja) * 2008-08-26 2011-11-24 ウシオ電機株式会社 フィラメントランプおよび光照射式加熱処理装置
JP5125933B2 (ja) * 2008-09-22 2013-01-23 ウシオ電機株式会社 フィラメントランプ
JP5251398B2 (ja) 2008-09-26 2013-07-31 ウシオ電機株式会社 フィラメントランプ
TW201038764A (en) * 2009-03-16 2010-11-01 Alta Devices Inc Reactor lid assembly for vapor deposition
KR101031226B1 (ko) * 2009-08-21 2011-04-29 에이피시스템 주식회사 급속열처리 장치의 히터블록
WO2013096748A1 (en) * 2011-12-23 2013-06-27 Applied Materials, Inc. Methods and apparatus for cleaning substrate surfaces with atomic hydrogen
US9049758B2 (en) * 2012-10-17 2015-06-02 Elwha Llc Multiple-filament tungsten-halogen lighting system having managed tungsten redeposition
US8970110B2 (en) * 2012-10-17 2015-03-03 Elwha Llc Managed multiple-filament incandescent lighting system
WO2015035046A1 (en) * 2013-09-05 2015-03-12 Applied Materials, Inc. Lamp cross-section for reduced coil heating
JP6219227B2 (ja) 2014-05-12 2017-10-25 東京エレクトロン株式会社 ヒータ給電機構及びステージの温度制御方法
TWI674071B (zh) 2014-12-15 2019-10-11 瑞士商菲利浦莫里斯製品股份有限公司 氣溶膠產生系統及用於在電熱式氣溶膠產生系統內導引氣流的方法
WO2016126381A1 (en) * 2015-02-05 2016-08-11 Applied Materials, Inc. Rapid thermal processing chamber with linear control lamps
JP2016206484A (ja) * 2015-04-24 2016-12-08 株式会社リコー ヒータ、定着装置及び画像形成装置
JP6473659B2 (ja) * 2015-05-13 2019-02-20 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置
CN107526269A (zh) * 2016-06-20 2017-12-29 株式会社东芝 加热器以及加热装置
JP6982446B2 (ja) * 2017-09-21 2021-12-17 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
JP7082514B2 (ja) 2018-04-04 2022-06-08 株式会社Kelk 流体加熱装置
CN114126101B (zh) * 2021-11-02 2024-01-26 Tcl华星光电技术有限公司 石英红外加热装置及其对基板加热的方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE413584A (enExample) * 1935-02-08
US3443144A (en) * 1964-12-31 1969-05-06 Sylvania Electric Prod Infrared incandescent lamp
JPH0652674B2 (ja) * 1985-02-05 1994-07-06 ミノルタカメラ株式会社 加熱装置用ハロゲン発熱体
JPH0730355B2 (ja) * 1986-01-17 1995-04-05 オリザ油化株式会社 粗油脂類から脂肪酸を分離する方法
JPH0221667A (ja) * 1988-07-08 1990-01-24 Mitsubishi Electric Corp 光検出素子
JP3103896B2 (ja) * 1991-03-15 2000-10-30 ソニー株式会社 ハロゲンランプ及び熱処理炉
JPH0737833A (ja) * 1993-07-22 1995-02-07 Dainippon Screen Mfg Co Ltd 基板の光照射式熱処理装置
JPH0716353U (ja) 1993-08-31 1995-03-17 ウシオ電機株式会社 管型ランプ
JP2000036469A (ja) * 1998-07-21 2000-02-02 Dainippon Screen Mfg Co Ltd 基板熱処理装置
JP3988338B2 (ja) * 1999-10-07 2007-10-10 ウシオ電機株式会社 光照射式急速加熱処理装置の制御装置
JP3528042B2 (ja) * 2000-01-24 2004-05-17 ウシオ電機株式会社 光加熱装置
DE10024709B4 (de) 2000-05-18 2008-03-13 Steag Rtp Systems Gmbh Vorrichtung zum thermischen Behandeln von Substraten
JP4948701B2 (ja) * 2000-12-28 2012-06-06 東京エレクトロン株式会社 加熱装置、当該加熱装置を有する熱処理装置、及び、熱処理制御方法
US6614008B2 (en) * 2001-12-14 2003-09-02 Xerox Corporation Universal voltage fuser heater lamp
US20040182847A1 (en) * 2003-02-17 2004-09-23 Kazuaki Ohkubo Radiation source for gas sensor

Also Published As

Publication number Publication date
KR100859401B1 (ko) 2008-09-22
JP2006279008A (ja) 2006-10-12
EP1699071B1 (en) 2009-06-03
US20060197454A1 (en) 2006-09-07
TWI348208B (enExample) 2011-09-01
TW200633166A (en) 2006-09-16
US7656079B2 (en) 2010-02-02
EP1699071A1 (en) 2006-09-06
KR20060096275A (ko) 2006-09-11

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Legal Events

Date Code Title Description
8363 Opposition against the patent