DE602006004331D1 - Vorrichtung zur strahlungslenkung auf eine schicht, gerät mit einer derartigen vorrichtung und verfahren unter verwendung eines derartigen geräts - Google Patents
Vorrichtung zur strahlungslenkung auf eine schicht, gerät mit einer derartigen vorrichtung und verfahren unter verwendung eines derartigen gerätsInfo
- Publication number
- DE602006004331D1 DE602006004331D1 DE602006004331T DE602006004331T DE602006004331D1 DE 602006004331 D1 DE602006004331 D1 DE 602006004331D1 DE 602006004331 T DE602006004331 T DE 602006004331T DE 602006004331 T DE602006004331 T DE 602006004331T DE 602006004331 D1 DE602006004331 D1 DE 602006004331D1
- Authority
- DE
- Germany
- Prior art keywords
- radiation
- optical element
- layer
- radiation beam
- originating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Head (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Radiation-Therapy Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05103140 | 2005-04-19 | ||
PCT/IB2006/051149 WO2006111896A2 (en) | 2005-04-19 | 2006-04-13 | Device for directing radiation to a layer, apparatus with such device and method using such apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006004331D1 true DE602006004331D1 (de) | 2009-01-29 |
Family
ID=36955044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602006004331T Active DE602006004331D1 (de) | 2005-04-19 | 2006-04-13 | Vorrichtung zur strahlungslenkung auf eine schicht, gerät mit einer derartigen vorrichtung und verfahren unter verwendung eines derartigen geräts |
Country Status (9)
Country | Link |
---|---|
US (1) | US7605979B2 (de) |
EP (1) | EP1875469B1 (de) |
JP (1) | JP2008537178A (de) |
KR (1) | KR20070122548A (de) |
CN (1) | CN101164111B (de) |
AT (1) | ATE418143T1 (de) |
DE (1) | DE602006004331D1 (de) |
TW (1) | TW200727292A (de) |
WO (1) | WO2006111896A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220141930A (ko) * | 2016-09-15 | 2022-10-20 | 케이엘에이 코포레이션 | 이미징 기반 오버레이 계측을 위한 포커스 최적화를 위한 시스템 및 방법 |
CN114460740B (zh) * | 2022-01-21 | 2023-03-28 | 华中科技大学 | 一种单镜环形光斑光学系统 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2624121A1 (de) | 1976-05-28 | 1977-12-15 | Siemens Ag | Verfahren zum genauen bearbeiten eines im arbeitsfeld eines bearbeitungslasers angeordneten werkstueckes sowie vorrichtung zur ausuebung des verfahrens |
JPS5641088A (en) | 1979-09-12 | 1981-04-17 | Hitachi Ltd | Monitoring device for laser light axis |
JPS5843420A (ja) | 1981-09-08 | 1983-03-14 | Matsushita Electric Ind Co Ltd | レ−ザ用外部光学装置 |
JPS60254109A (ja) * | 1984-05-31 | 1985-12-14 | Canon Inc | 光学装置 |
JPS6047482A (ja) | 1983-08-26 | 1985-03-14 | Toshiba Corp | レ−ザ照射装置 |
JPS60216988A (ja) | 1984-04-13 | 1985-10-30 | Hitachi Ltd | 高出力レ−ザ加工装置 |
JPS63273587A (ja) | 1987-04-30 | 1988-11-10 | Toshiba Corp | レ−ザ加工方法 |
FR2627874B1 (fr) * | 1988-02-29 | 1995-06-16 | Framatome Sa | Systeme d'alignement d'un faisceau de puissance |
JPH0722685A (ja) | 1993-06-21 | 1995-01-24 | Mitsubishi Heavy Ind Ltd | 光線の焦点合成方法及びその焦点合成装置 |
JPH09128818A (ja) | 1995-11-02 | 1997-05-16 | Sony Corp | 露光装置 |
JP3179322B2 (ja) | 1995-12-06 | 2001-06-25 | 新日本製鐵株式会社 | 高出力レーザ伝送方法及び装置 |
JPH09288850A (ja) | 1996-04-18 | 1997-11-04 | Sony Disc Technol:Kk | 露光装置及び露光方法 |
JP3872871B2 (ja) * | 1996-07-29 | 2007-01-24 | オリンパス株式会社 | 対物レンズ及び顕微鏡 |
KR100205428B1 (ko) * | 1996-12-27 | 1999-07-01 | 구자홍 | 멀티포커싱 레이저 빔 레코더 및 그의 멀티포커싱 방법 |
JPH10289475A (ja) * | 1997-04-16 | 1998-10-27 | Sony Corp | 露光装置 |
JP2001504974A (ja) | 1997-08-26 | 2001-04-10 | オーエムデイ・デバイシズ・エルエルシー | 三次元の情報担体用の読取り方法およびその装置 |
NL1007068C2 (nl) * | 1997-09-18 | 1999-03-22 | Nl Laser Res | Laserbewerkingsapparaat. |
DE19852302A1 (de) * | 1998-11-12 | 2000-05-25 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Bearbeiten von Werkstücken mit Hochenergiestrahlung |
JP2000306274A (ja) | 1999-04-23 | 2000-11-02 | Nippon Columbia Co Ltd | 光ディスク用原盤の記録装置 |
NL1013003C2 (nl) * | 1999-09-08 | 2001-03-12 | Odme Internat B V | Inrichting geschikt voor het vervaardigen van een optische registratiedrager zoals bijvoorbeeld een moederplaat. |
JP2002008254A (ja) | 2000-06-22 | 2002-01-11 | Matsushita Electric Ind Co Ltd | 情報記録装置 |
US6596961B2 (en) * | 2001-09-12 | 2003-07-22 | Fraunhofer Usa, Inc. | Method and apparatus for monitoring and adjusting a laser welding process |
JP3683851B2 (ja) * | 2001-11-29 | 2005-08-17 | 哲也 牧村 | 光パターニングにより無機透明材料を加工する光加工装置及び光加工方法 |
JP2003272187A (ja) | 2002-03-20 | 2003-09-26 | Hitachi Ltd | フォーカス制御装置及び光ディスク原盤露光装置 |
EP1349008A1 (de) * | 2002-03-28 | 2003-10-01 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
WO2006067723A1 (en) * | 2004-12-22 | 2006-06-29 | Arima Devices Corporation | Optical scanning device with low building height |
-
2006
- 2006-04-13 US US11/911,559 patent/US7605979B2/en not_active Expired - Fee Related
- 2006-04-13 DE DE602006004331T patent/DE602006004331D1/de active Active
- 2006-04-13 KR KR1020077026560A patent/KR20070122548A/ko not_active Application Discontinuation
- 2006-04-13 AT AT06727917T patent/ATE418143T1/de not_active IP Right Cessation
- 2006-04-13 WO PCT/IB2006/051149 patent/WO2006111896A2/en not_active Application Discontinuation
- 2006-04-13 CN CN2006800130403A patent/CN101164111B/zh not_active Expired - Fee Related
- 2006-04-13 EP EP06727917A patent/EP1875469B1/de not_active Not-in-force
- 2006-04-13 JP JP2008507226A patent/JP2008537178A/ja active Pending
- 2006-04-14 TW TW095113557A patent/TW200727292A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2008537178A (ja) | 2008-09-11 |
TW200727292A (en) | 2007-07-16 |
ATE418143T1 (de) | 2009-01-15 |
WO2006111896A3 (en) | 2006-12-07 |
CN101164111B (zh) | 2010-06-16 |
WO2006111896A2 (en) | 2006-10-26 |
KR20070122548A (ko) | 2007-12-31 |
EP1875469B1 (de) | 2008-12-17 |
EP1875469A2 (de) | 2008-01-09 |
US7605979B2 (en) | 2009-10-20 |
US20080186549A1 (en) | 2008-08-07 |
CN101164111A (zh) | 2008-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |