DE602005026968D1 - System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe - Google Patents

System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Info

Publication number
DE602005026968D1
DE602005026968D1 DE602005026968T DE602005026968T DE602005026968D1 DE 602005026968 D1 DE602005026968 D1 DE 602005026968D1 DE 602005026968 T DE602005026968 T DE 602005026968T DE 602005026968 T DE602005026968 T DE 602005026968T DE 602005026968 D1 DE602005026968 D1 DE 602005026968D1
Authority
DE
Germany
Prior art keywords
periodic
distance
sample
mask
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005026968T
Other languages
English (en)
Inventor
Harun H Solak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eulitha AG
Original Assignee
Eulitha AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36228141&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602005026968(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from EP04025105A external-priority patent/EP1650602A1/de
Application filed by Eulitha AG filed Critical Eulitha AG
Publication of DE602005026968D1 publication Critical patent/DE602005026968D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
DE602005026968T 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe Active DE602005026968D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04025105A EP1650602A1 (de) 2004-10-22 2004-10-22 System und Methode zur Herstellung von periodischen und / oder quasi-periodischen Strukturen auf einer Probe
EP05003271 2005-02-16
PCT/EP2005/010986 WO2006045439A2 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Publications (1)

Publication Number Publication Date
DE602005026968D1 true DE602005026968D1 (de) 2011-04-28

Family

ID=36228141

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005026968T Active DE602005026968D1 (de) 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Country Status (7)

Country Link
US (1) US8841046B2 (de)
EP (1) EP1810085B1 (de)
JP (1) JP4724183B2 (de)
CN (1) CN101052921B (de)
AT (1) ATE502325T1 (de)
DE (1) DE602005026968D1 (de)
WO (1) WO2006045439A2 (de)

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JP5606455B2 (ja) * 2009-02-05 2014-10-15 パウル・シェラー・インスティトゥート 逆投影のためのイメージング装置及びその作動方法
EP2499539B1 (de) 2009-11-13 2014-06-18 Eulitha AG Optimierter maskenentwurf zur herstellung von periodischen und quasi-periodischen strukturen
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
KR101755758B1 (ko) 2010-11-16 2017-07-07 유리타 아. 게. 고해상도 2차원 주기적 패턴을 인쇄하기 위한 방법 및 장치
JP5721858B2 (ja) * 2010-12-23 2015-05-20 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ 大きな面積にわたってナノ構造を製造するためのシステムおよび方法
US9280056B2 (en) 2011-01-12 2016-03-08 Eulitha A.G. Method and system for printing high-resolution periodic patterns
JPWO2012157697A1 (ja) * 2011-05-19 2014-07-31 株式会社日立ハイテクノロジーズ 回折格子製造方法、分光光度計、および半導体装置の製造方法
US20140307242A1 (en) 2011-06-01 2014-10-16 Eulitha A.G. Method and apparatus for printing periodic patterns using multiple lasers
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法
JP5838622B2 (ja) * 2011-07-05 2016-01-06 大日本印刷株式会社 露光装置および露光方法
WO2014147562A2 (en) 2013-03-18 2014-09-25 Eulitha A.G. Methods and systems for printing periodic patterns
WO2015008365A1 (ja) * 2013-07-18 2015-01-22 ギガフォトン株式会社 露光装置
JP5943886B2 (ja) * 2013-08-20 2016-07-05 株式会社東芝 パターン形成方法及び露光用マスク
JP6356510B2 (ja) * 2014-07-15 2018-07-11 東芝メモリ株式会社 露光方法及び露光装置
US10025197B2 (en) 2014-12-22 2018-07-17 Eulitha A.G. Method for printing colour images
JP2016152318A (ja) 2015-02-17 2016-08-22 株式会社東芝 パターン形成方法および露光装置
CN108369371A (zh) 2015-10-13 2018-08-03 麦克罗托知识产权私人有限公司 微结构图案
CN105242500B (zh) * 2015-11-10 2017-07-11 中国科学院光电技术研究所 一种基于紫外宽光谱泰伯自成像的光刻系统
WO2017091339A1 (en) 2015-11-25 2017-06-01 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
EP3391152B1 (de) 2015-12-14 2020-02-12 Eulitha A.G. Verfahren und system zum drucken von merkmalsanordnungen
CN106115681A (zh) * 2016-07-11 2016-11-16 浙江工业大学 一种实现二维材料图形化的方法
CN106054298B (zh) * 2016-08-23 2019-02-26 京东方科技集团股份有限公司 一种光栅以及3d显示装置
DE102017115169A1 (de) 2017-07-06 2019-01-10 Temicon Gmbh Erzeugung von belichteten Strukturen auf einem Werkstück
JP7044901B2 (ja) 2018-04-19 2022-03-30 ユーリタ アクチエンゲゼルシャフト 露光フィールドのオーバラップにより大きい周期パターンを印刷する方法およびシステム
US11042098B2 (en) * 2019-02-15 2021-06-22 Applied Materials, Inc. Large area high resolution feature reduction lithography technique
AU2020282386B2 (en) * 2019-05-30 2021-12-16 Microtau Ip Pty Ltd Systems and methods for fabricating microstructures
CN111856636B (zh) * 2020-07-03 2021-10-22 中国科学技术大学 一种变间距光栅掩模线密度分布可控微调方法
WO2023119224A1 (en) 2021-12-22 2023-06-29 Eulitha A.G. A method and apparatus for improving the uniformity of exposure of a periodic pattern

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EP2499539B1 (de) * 2009-11-13 2014-06-18 Eulitha AG Optimierter maskenentwurf zur herstellung von periodischen und quasi-periodischen strukturen
US8368871B2 (en) * 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9036133B2 (en) * 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns

Also Published As

Publication number Publication date
WO2006045439A3 (en) 2006-09-14
EP1810085A2 (de) 2007-07-25
JP4724183B2 (ja) 2011-07-13
WO2006045439A2 (en) 2006-05-04
US8841046B2 (en) 2014-09-23
ATE502325T1 (de) 2011-04-15
JP2008517472A (ja) 2008-05-22
CN101052921A (zh) 2007-10-10
CN101052921B (zh) 2013-03-27
EP1810085B1 (de) 2011-03-16
US20080186579A1 (en) 2008-08-07

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