TW200710603A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200710603A
TW200710603A TW095131920A TW95131920A TW200710603A TW 200710603 A TW200710603 A TW 200710603A TW 095131920 A TW095131920 A TW 095131920A TW 95131920 A TW95131920 A TW 95131920A TW 200710603 A TW200710603 A TW 200710603A
Authority
TW
Taiwan
Prior art keywords
photomask
exposing
light
light source
strip shaped
Prior art date
Application number
TW095131920A
Other languages
Chinese (zh)
Inventor
Koichi Kajiyama
Yoshio Watanabe
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200710603A publication Critical patent/TW200710603A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)

Abstract

The exposure apparatus of the present invention comprises an entrainer 13 for entraining a color filter substrate 10 on its upper surface 13a, a photomask stage 6 for holding a strip shaped photomask 5 parallelly on the entrainer 13, and a light source 2 for irradiating the photomask 5 held on the photomask stage 6 with an exposing light. The exposing light emitted from the light source 2 irradiates the color filter substrate 11 through the photomask 5 to form a predetermined exposing pattern on a predetermined position. A cylindrical lens 10 is disposed on a light passage between the light source 2 and the photomask stage 6 for trimming the cross section of the exposing light beam emitted from the light source 2 to match the configuration of the strip shaped photomask 5 so as to improve the utilization of the exposing light radiated on the strip shaped photomask 5.
TW095131920A 2005-09-09 2006-08-30 Exposure apparatus TW200710603A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005261981A JP2007072371A (en) 2005-09-09 2005-09-09 Exposure apparatus

Publications (1)

Publication Number Publication Date
TW200710603A true TW200710603A (en) 2007-03-16

Family

ID=37835682

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131920A TW200710603A (en) 2005-09-09 2006-08-30 Exposure apparatus

Country Status (5)

Country Link
JP (1) JP2007072371A (en)
KR (1) KR20080059558A (en)
CN (1) CN101258447B (en)
TW (1) TW200710603A (en)
WO (1) WO2007029561A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007028859B4 (en) * 2007-06-22 2010-09-30 Josef Lindthaler Apparatus for contact exposure of a printing form
WO2009145032A1 (en) 2008-05-28 2009-12-03 凸版印刷株式会社 Method for producing color filter, method for producing substrate with pattern, and small photomask
JP5355261B2 (en) * 2009-07-07 2013-11-27 株式会社日立ハイテクノロジーズ Proximity exposure apparatus, exposure light forming method for proximity exposure apparatus, and display panel substrate manufacturing method
JP2013195442A (en) * 2012-03-15 2013-09-30 V Technology Co Ltd Exposure device, exposure method, and manufacturing method of exposed material
CN105022234B (en) * 2015-07-14 2017-05-17 浙江大学 Cross-scale microstructure fabrication method based on multiple exposures
CN105137722A (en) * 2015-09-24 2015-12-09 京东方科技集团股份有限公司 Edge exposure device and edge exposure method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60207204A (en) * 1984-03-30 1985-10-18 市光工業株式会社 Lamp implement for vehicle
JPS636501A (en) * 1986-06-27 1988-01-12 Komatsu Ltd Integrator prism
JP3415571B2 (en) * 1992-11-05 2003-06-09 株式会社ニコン Scanning exposure apparatus, exposure method, and semiconductor manufacturing method
JPH07249561A (en) * 1994-03-09 1995-09-26 Nikon Corp Illuminating optical device
JPH08278404A (en) * 1995-04-10 1996-10-22 Toppan Printing Co Ltd Lens sheet and its production
JPH08304732A (en) * 1995-04-28 1996-11-22 Kowa Co Slit light irradiation optical system
JP3627355B2 (en) * 1996-02-22 2005-03-09 ソニー株式会社 Scanning exposure equipment
JPH09274323A (en) * 1996-04-04 1997-10-21 Toppan Printing Co Ltd Pattern exposing method
JPH09281711A (en) * 1996-04-18 1997-10-31 Toppan Printing Co Ltd Pattern exposure method
JPH10213743A (en) * 1997-01-28 1998-08-11 Fuitsuto:Kk Optical system for converting aspect ratio and image processor capable of converting aspect ratio
JP3658209B2 (en) * 1998-10-08 2005-06-08 キヤノン株式会社 Arc illumination optical system and exposure apparatus using the same
JP3340720B2 (en) * 2000-06-06 2002-11-05 東レエンジニアリング株式会社 Peripheral exposure equipment
JP2002139696A (en) * 2000-11-01 2002-05-17 Sony Corp Illuminator having beam intensity distribution changing optical system
JP2003255552A (en) * 2002-03-06 2003-09-10 Nec Corp Laser irradiation device, exposure method using scanning laser beam, and manufacturing method for color filter using scanning laser beam

Also Published As

Publication number Publication date
CN101258447A (en) 2008-09-03
WO2007029561A1 (en) 2007-03-15
CN101258447B (en) 2011-06-22
JP2007072371A (en) 2007-03-22
KR20080059558A (en) 2008-06-30

Similar Documents

Publication Publication Date Title
TW200710603A (en) Exposure apparatus
ATE542167T1 (en) LITHOGRAPHIC IMMERSION DEVICE
TW200608152A (en) Method for manufacturing a microstructure, exposure device, and electronic apparatus
EP1705520A3 (en) Exposure apparatus and exposing method and method of manufacturing a printed wiring board
EP1770443A3 (en) Laser processing apparatus, exposure apparatus and exposure method
ATE502325T1 (en) SYSTEM AND METHOD FOR GENERATING A PERIODIC AND/OR NEAR-PERIODIC PATTERN ON A SAMPLE
ATE462991T1 (en) EXPOSURE APPARATUS AND METHOD FOR PRODUCING A DEVICE
ATE328303T1 (en) DIRECTIONAL SHIELDING FOR USE WITH DIPOLE EXPOSURE
ATE544094T1 (en) COMPOUND FOR USE IN A PHOTOSENSITIVE COMPOSITION
TW200707122A (en) Exposure method and apparatus
TW200702947A (en) Liquid immersion lithography system having a tilted showerhead relative to a substrate
JP2008147314A5 (en)
SG148993A1 (en) Exposure apparatus, exposure method, method for producing device, and optical part
TW200611082A (en) Exposure system and device production method
ATE469723T1 (en) DEVICE FOR INDUSTRIAL PROCESSING OF A MATERIAL BY OPTICAL RADIATION
ATE476686T1 (en) RADIATION PROCEDURE
TW200715372A (en) Exposure method
ATE496396T1 (en) LASER PROCESSING APPARATUS AND METHODS
TWI266872B (en) Unevenness defect inspection method and device of pattern
WO2007081913A3 (en) Surface plasmon enhanced radiation methods and apparatus
EP1355194A3 (en) Projection exposure apparatus and device manufacturing method
WO2006086815A3 (en) Charged-particle exposure apparatus
ATE547667T1 (en) METHOD AND DEVICE FOR CONTROLLING THE DIFFUSION AND COLOR OF A LIGHT BEAM
JP2007036016A5 (en)
TW200500822A (en) Lithographic apparatus and device manufacturing method