ATE496396T1 - LASER PROCESSING APPARATUS AND METHODS - Google Patents
LASER PROCESSING APPARATUS AND METHODSInfo
- Publication number
- ATE496396T1 ATE496396T1 AT04735829T AT04735829T ATE496396T1 AT E496396 T1 ATE496396 T1 AT E496396T1 AT 04735829 T AT04735829 T AT 04735829T AT 04735829 T AT04735829 T AT 04735829T AT E496396 T1 ATE496396 T1 AT E496396T1
- Authority
- AT
- Austria
- Prior art keywords
- processing
- laser
- laser beam
- processing apparatus
- irradiated
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0736—Shaping the laser spot into an oval shape, e.g. elliptic shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
Disclosed is a laser processing apparatus for minimizing generation of sludge and enhancing the processing efficiency while processing an object. The laser processing apparatus includes a beam irradiator for emitting a laser beam from a laser light source, a beam scanner for operating the laser beam emitted from the beam scanner, to be irradiated on a predetermined interval of a processing position of the object repeatedly on the straight, and a condensing lens for regulating a focus of the laser beam emitted from the beam irradiator. The object is movable at least once along a processing direction during processing the object. According to the present invention, it is able to improve the processing efficiency and to work an object with a uniform morphology by using a mask filtering a laser beam irradiated at a rotation turning point of a beam scanning mirror, capable of continuously irradiating a laser beam by deforming the laser beam into an elliptical pattern.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040026749A KR100514996B1 (en) | 2004-04-19 | 2004-04-19 | Apparatus for manufacturing using laser |
PCT/KR2004/001315 WO2005101487A1 (en) | 2004-04-19 | 2004-06-02 | Laser processing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE496396T1 true ATE496396T1 (en) | 2011-02-15 |
Family
ID=35150255
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04735829T ATE496396T1 (en) | 2004-04-19 | 2004-06-02 | LASER PROCESSING APPARATUS AND METHODS |
Country Status (9)
Country | Link |
---|---|
US (1) | US7688492B2 (en) |
EP (1) | EP1738409B1 (en) |
JP (1) | JP4856058B2 (en) |
KR (1) | KR100514996B1 (en) |
CN (1) | CN1947239B (en) |
AT (1) | ATE496396T1 (en) |
CA (1) | CA2564124A1 (en) |
DE (1) | DE602004031154D1 (en) |
WO (1) | WO2005101487A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
AU2005307746B2 (en) | 2004-11-16 | 2011-05-12 | Illumina, Inc. | And methods and apparatus for reading coded microbeads |
US7423818B2 (en) * | 2005-07-15 | 2008-09-09 | Electro Scientific Industries, Inc. | Method of suppressing distortion of a working laser beam of a laser link processing system |
FI119593B (en) * | 2006-01-19 | 2009-01-15 | Savcor Alfa Oy | Laser welding procedure |
US7830575B2 (en) * | 2006-04-10 | 2010-11-09 | Illumina, Inc. | Optical scanner with improved scan time |
KR20080079828A (en) * | 2007-02-28 | 2008-09-02 | 주식회사 이오테크닉스 | Laser processing apparatus and method |
KR100954563B1 (en) | 2008-12-30 | 2010-04-22 | 송혁규 | Mems scanning mirror |
CN101879657B (en) * | 2009-05-08 | 2016-06-29 | 东莞市中镓半导体科技有限公司 | Solid laser lift equipment and stripping means |
CN101882578B (en) * | 2009-05-08 | 2014-03-12 | 东莞市中镓半导体科技有限公司 | Integral solid laser lift-off and cutting equipment |
US8237132B2 (en) * | 2009-06-17 | 2012-08-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for reducing down time of a lithography system |
JP2013515612A (en) * | 2009-12-23 | 2013-05-09 | イムラ アメリカ インコーポレイテッド | Laser-based pattern formation using optical element structure and focused beam |
JP5644033B2 (en) * | 2011-02-07 | 2014-12-24 | 株式会社ブイ・テクノロジー | Laser processing apparatus and laser processing method using microlens array |
JP5894384B2 (en) * | 2011-07-08 | 2016-03-30 | 株式会社ディスコ | Processing equipment |
GB2494857B (en) | 2011-08-23 | 2016-07-27 | Biochrom Ltd | Cuvette |
TWI448730B (en) * | 2011-10-25 | 2014-08-11 | Ind Tech Res Inst | Even lighting scanning type visual system |
KR20150028339A (en) * | 2012-07-04 | 2015-03-13 | 쌩-고벵 글래스 프랑스 | Device and method for laser processing of large-area substrates using at least two bridges |
CN103894734A (en) * | 2012-12-31 | 2014-07-02 | 上海微电子装备有限公司 | Laser annealing device and operation method of laser annealing device |
JP6161188B2 (en) * | 2013-02-05 | 2017-07-12 | 株式会社ブイ・テクノロジー | Laser processing apparatus and laser processing method |
CN103551735A (en) * | 2013-10-18 | 2014-02-05 | 昆山思拓机器有限公司 | Processing device and process for conductive rubber pad |
JP6347714B2 (en) * | 2014-10-02 | 2018-06-27 | 株式会社ディスコ | Wafer processing method |
CN106271105B (en) * | 2016-08-31 | 2018-05-25 | 武汉凌云光电科技有限责任公司 | A kind of laser cutting method and system of achievable fiber end face angle control |
CN106362992B (en) * | 2016-11-29 | 2019-03-01 | 苏州热工研究院有限公司 | The laser cleaning system of inner wall of the pipe decontamination |
FR3080321B1 (en) * | 2018-04-23 | 2020-03-27 | Addup | APPARATUS AND METHOD FOR MANUFACTURING A THREE-DIMENSIONAL OBJECT |
US11318558B2 (en) | 2018-05-15 | 2022-05-03 | The Chancellor, Masters And Scholars Of The University Of Cambridge | Fabrication of components using shaped energy beam profiles |
US10903121B1 (en) | 2019-08-14 | 2021-01-26 | Applied Materials, Inc. | Hybrid wafer dicing approach using a uniform rotating beam laser scribing process and plasma etch process |
Family Cites Families (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4662708A (en) | 1983-10-24 | 1987-05-05 | Armco Inc. | Optical scanning system for laser treatment of electrical steel and the like |
JPS6243620A (en) * | 1985-08-21 | 1987-02-25 | Fuji Photo Film Co Ltd | Semiconductor laser light source device |
US5708252A (en) | 1986-09-26 | 1998-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Excimer laser scanning system |
JPH01224193A (en) * | 1988-03-04 | 1989-09-07 | Tanaka Seisakusho:Kk | Laser beam machine and its machining method |
JPH0241784A (en) * | 1988-07-30 | 1990-02-09 | Nec Corp | Laser beam marking device |
JPH02137687A (en) * | 1988-11-18 | 1990-05-25 | Fuji Electric Co Ltd | Laser light condensing device |
US5397327A (en) * | 1993-07-27 | 1995-03-14 | Coherent, Inc. | Surgical laser handpiece for slit incisions |
JPH07100670A (en) * | 1993-10-05 | 1995-04-18 | Nippon Steel Corp | Laser beam machine |
JPH07148583A (en) * | 1994-09-02 | 1995-06-13 | Osaka Prefecture | Laser beam processing method of metallic surface |
JP3141715B2 (en) | 1994-12-22 | 2001-03-05 | 松下電器産業株式会社 | Laser processing method |
US5854803A (en) * | 1995-01-12 | 1998-12-29 | Semiconductor Energy Laboratory Co., Ltd. | Laser illumination system |
JPH08197271A (en) * | 1995-01-27 | 1996-08-06 | Ricoh Co Ltd | Method for cracking brittle material and device for cracking brittle material |
JPH08272104A (en) * | 1995-03-31 | 1996-10-18 | Sony Corp | Exposing method for photoresist and device thereof |
JP3738790B2 (en) * | 1996-07-26 | 2006-01-25 | セイコーエプソン株式会社 | Method for perforating openings in components of ink jet recording head |
JP3140968B2 (en) * | 1996-08-06 | 2001-03-05 | 日立建機株式会社 | Laser processing equipment |
JP3199653B2 (en) * | 1996-12-27 | 2001-08-20 | イビデン株式会社 | Apparatus and method for manufacturing multilayer printed wiring board |
JPH10242617A (en) * | 1997-02-28 | 1998-09-11 | Murata Mfg Co Ltd | Method and apparatus for processing ceramic green sheet |
JPH11151584A (en) * | 1997-11-17 | 1999-06-08 | Toshiba Corp | Laser beam machining method, and its device |
JPH11156567A (en) | 1997-12-02 | 1999-06-15 | Fuji Electric Co Ltd | Laser printing device |
JP3323987B2 (en) | 1998-05-25 | 2002-09-09 | 住友重機械工業株式会社 | Laser processing equipment |
JP4119528B2 (en) | 1998-06-16 | 2008-07-16 | 富士重工業株式会社 | Fender insulator for vehicles |
US6635849B1 (en) * | 1999-03-05 | 2003-10-21 | Mitsubishi Denki Kabushiki Kaisha | Laser beam machine for micro-hole machining |
KR20020021100A (en) * | 1999-05-24 | 2002-03-18 | 야마사키 노리쓰카 | Laser machining of plastic film of circuit board, and method of manufacturing circuit board |
US6313434B1 (en) * | 1999-05-27 | 2001-11-06 | International Business Machines Corporation | Method for creation of inclined microstructures using a scanned laser image |
JP2001001178A (en) * | 1999-06-21 | 2001-01-09 | Nippon Steel Corp | Laser beam machine for printed circuit board |
JP3562389B2 (en) | 1999-06-25 | 2004-09-08 | 三菱電機株式会社 | Laser heat treatment equipment |
JP2001079678A (en) * | 1999-09-13 | 2001-03-27 | Sumitomo Heavy Ind Ltd | Method for laser piercing and device therefor |
JP2002028798A (en) * | 2000-07-11 | 2002-01-29 | Nippon Steel Chem Co Ltd | Laser machining device and method of laser machining |
JP2002045985A (en) | 2000-08-07 | 2002-02-12 | Matsushita Electric Ind Co Ltd | Method for machining ellipsoidal hole with laser beam and device for machining ellipsoidal hole with laser beam |
JP2002184307A (en) * | 2000-12-18 | 2002-06-28 | Toshiba Corp | Manufacturing method of display device and laser processing device |
JP2002239772A (en) | 2001-02-16 | 2002-08-28 | Matsushita Electric Ind Co Ltd | Method and device for laser beam machining |
JP4590782B2 (en) * | 2001-06-01 | 2010-12-01 | 三菱電機株式会社 | Laser processing equipment |
JP2003045820A (en) | 2001-07-30 | 2003-02-14 | Semiconductor Energy Lab Co Ltd | Laser irradiation apparatus, and method, and method of manufacturing semiconductor device |
JP2003117676A (en) * | 2001-10-15 | 2003-04-23 | Ricoh Microelectronics Co Ltd | Laser beam machining method and laser beam machining device |
JP2003224083A (en) * | 2001-10-30 | 2003-08-08 | Semiconductor Energy Lab Co Ltd | Laser irradiation equipment |
JP3908153B2 (en) * | 2001-11-16 | 2007-04-25 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
US6849825B2 (en) | 2001-11-30 | 2005-02-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus |
JP4293414B2 (en) * | 2002-07-04 | 2009-07-08 | 株式会社半導体エネルギー研究所 | Method for crystallizing semiconductor film and method for manufacturing semiconductor device using the same |
JP2004090062A (en) * | 2002-09-02 | 2004-03-25 | Tdk Corp | Laser beam machining device, machining method, and method for manufacturing circuit board by using the machining method |
JP2004098087A (en) * | 2002-09-05 | 2004-04-02 | Dainippon Screen Mfg Co Ltd | Laser beam machining apparatus and laser beam machining method |
JP4364611B2 (en) * | 2002-11-29 | 2009-11-18 | 株式会社半導体エネルギー研究所 | Method for manufacturing crystalline semiconductor film |
US7208395B2 (en) * | 2003-06-26 | 2007-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device |
-
2004
- 2004-04-19 KR KR1020040026749A patent/KR100514996B1/en active IP Right Grant
- 2004-06-02 CN CN2004800427779A patent/CN1947239B/en not_active Expired - Fee Related
- 2004-06-02 WO PCT/KR2004/001315 patent/WO2005101487A1/en active Application Filing
- 2004-06-02 DE DE602004031154T patent/DE602004031154D1/en not_active Expired - Lifetime
- 2004-06-02 US US11/578,373 patent/US7688492B2/en not_active Expired - Fee Related
- 2004-06-02 CA CA002564124A patent/CA2564124A1/en not_active Abandoned
- 2004-06-02 JP JP2007509387A patent/JP4856058B2/en not_active Expired - Fee Related
- 2004-06-02 EP EP04735829A patent/EP1738409B1/en not_active Expired - Lifetime
- 2004-06-02 AT AT04735829T patent/ATE496396T1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100514996B1 (en) | 2005-09-15 |
DE602004031154D1 (en) | 2011-03-03 |
JP4856058B2 (en) | 2012-01-18 |
US7688492B2 (en) | 2010-03-30 |
EP1738409B1 (en) | 2011-01-19 |
CA2564124A1 (en) | 2005-10-27 |
EP1738409A1 (en) | 2007-01-03 |
JP2007532322A (en) | 2007-11-15 |
CN1947239B (en) | 2011-08-31 |
CN1947239A (en) | 2007-04-11 |
EP1738409A4 (en) | 2008-10-08 |
US20080088900A1 (en) | 2008-04-17 |
WO2005101487A1 (en) | 2005-10-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |