ATE502325T1 - System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe - Google Patents

System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Info

Publication number
ATE502325T1
ATE502325T1 AT05803386T AT05803386T ATE502325T1 AT E502325 T1 ATE502325 T1 AT E502325T1 AT 05803386 T AT05803386 T AT 05803386T AT 05803386 T AT05803386 T AT 05803386T AT E502325 T1 ATE502325 T1 AT E502325T1
Authority
AT
Austria
Prior art keywords
distance
periodic
sample
mask
generating
Prior art date
Application number
AT05803386T
Other languages
English (en)
Inventor
Harun Solak
Original Assignee
Eulitha Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36228141&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE502325(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from EP04025105A external-priority patent/EP1650602A1/de
Application filed by Eulitha Ag filed Critical Eulitha Ag
Application granted granted Critical
Publication of ATE502325T1 publication Critical patent/ATE502325T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT05803386T 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe ATE502325T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04025105A EP1650602A1 (de) 2004-10-22 2004-10-22 System und Methode zur Herstellung von periodischen und / oder quasi-periodischen Strukturen auf einer Probe
EP05003271 2005-02-16
PCT/EP2005/010986 WO2006045439A2 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Publications (1)

Publication Number Publication Date
ATE502325T1 true ATE502325T1 (de) 2011-04-15

Family

ID=36228141

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05803386T ATE502325T1 (de) 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Country Status (7)

Country Link
US (1) US8841046B2 (de)
EP (1) EP1810085B1 (de)
JP (1) JP4724183B2 (de)
CN (1) CN101052921B (de)
AT (1) ATE502325T1 (de)
DE (1) DE602005026968D1 (de)
WO (1) WO2006045439A2 (de)

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US9081193B2 (en) 2006-06-13 2015-07-14 The Arizona Board Of Regents On Behalf Of The University Of Arizona Interferometric systems and methods
WO2009105481A1 (en) * 2008-02-19 2009-08-27 The Buck Institute For Age Research Mao-b elevation as an early parkinson's disease biomarker
CN101750664B (zh) * 2008-12-12 2012-05-23 比亚迪股份有限公司 一种衍射导光薄膜及其制备方法
US8972191B2 (en) 2009-02-05 2015-03-03 Paul Scherrer Institut Low dose single step grating based X-ray phase contrast imaging
US8617775B2 (en) 2009-11-13 2013-12-31 Eulitha Ag Optimized mask design for fabricating periodic and quasi-periodic patterns
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US8904316B2 (en) 2010-11-16 2014-12-02 Eulitha A.G. Method and apparatus for printing high-resolution two-dimensional periodic patterns
KR101820558B1 (ko) * 2010-12-23 2018-02-28 유리타 아. 게. 넓은 영역에 나노 구조체를 생산하기 위한 시스템 및 방법
US9280056B2 (en) 2011-01-12 2016-03-08 Eulitha A.G. Method and system for printing high-resolution periodic patterns
EP2711746A4 (de) * 2011-05-19 2015-04-01 Hitachi High Tech Corp Herstellungsverfahren für ein beugungsgitter, spektrophotometer und herstellungsverfahren für eine halbleitervorrichtung
WO2012164539A1 (en) 2011-06-01 2012-12-06 Eulitha A.G. Printing periodic patterns using multiple lasers
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法
JP5838622B2 (ja) * 2011-07-05 2016-01-06 大日本印刷株式会社 露光装置および露光方法
JP6218918B2 (ja) * 2013-03-18 2017-10-25 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ 周期的パターンを印刷するための方法およびシステム
WO2015008365A1 (ja) * 2013-07-18 2015-01-22 ギガフォトン株式会社 露光装置
JP5943886B2 (ja) 2013-08-20 2016-07-05 株式会社東芝 パターン形成方法及び露光用マスク
JP6356510B2 (ja) * 2014-07-15 2018-07-11 東芝メモリ株式会社 露光方法及び露光装置
KR102454617B1 (ko) 2014-12-22 2022-10-17 유리타 아. 게. 컬러 이미지를 인쇄하기 위한 방법
JP2016152318A (ja) 2015-02-17 2016-08-22 株式会社東芝 パターン形成方法および露光装置
WO2017063040A1 (en) 2015-10-13 2017-04-20 Bilinsky Henry Claudius Microstructure patterns
CN105242500B (zh) * 2015-11-10 2017-07-11 中国科学院光电技术研究所 一种基于紫外宽光谱泰伯自成像的光刻系统
WO2017091339A1 (en) 2015-11-25 2017-06-01 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
WO2017103817A1 (en) 2015-12-14 2017-06-22 Eulitha A.G. Methods and systems for printing arrays of features
CN106115681A (zh) * 2016-07-11 2016-11-16 浙江工业大学 一种实现二维材料图形化的方法
CN106054298B (zh) * 2016-08-23 2019-02-26 京东方科技集团股份有限公司 一种光栅以及3d显示装置
DE102017115169A1 (de) 2017-07-06 2019-01-10 Temicon Gmbh Erzeugung von belichteten Strukturen auf einem Werkstück
WO2019202551A1 (en) 2018-04-19 2019-10-24 Eulitha A.G. Methods and systems for printing large periodic patterns by overlapping exposure fields
US11042098B2 (en) * 2019-02-15 2021-06-22 Applied Materials, Inc. Large area high resolution feature reduction lithography technique
EP3977206A4 (de) * 2019-05-30 2023-06-14 Microtau IP Pty Ltd. Systeme und verfahren zur herstellung von mikrostrukturen
CN111856636B (zh) * 2020-07-03 2021-10-22 中国科学技术大学 一种变间距光栅掩模线密度分布可控微调方法
WO2023119224A1 (en) 2021-12-22 2023-06-29 Eulitha A.G. A method and apparatus for improving the uniformity of exposure of a periodic pattern

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US8617775B2 (en) * 2009-11-13 2013-12-31 Eulitha Ag Optimized mask design for fabricating periodic and quasi-periodic patterns
US9036133B2 (en) * 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8368871B2 (en) * 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns

Also Published As

Publication number Publication date
JP2008517472A (ja) 2008-05-22
JP4724183B2 (ja) 2011-07-13
WO2006045439A3 (en) 2006-09-14
US20080186579A1 (en) 2008-08-07
CN101052921B (zh) 2013-03-27
US8841046B2 (en) 2014-09-23
EP1810085A2 (de) 2007-07-25
DE602005026968D1 (de) 2011-04-28
EP1810085B1 (de) 2011-03-16
CN101052921A (zh) 2007-10-10
WO2006045439A2 (en) 2006-05-04

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