DE602005022966D1 - Optischer Wellenleiter sowie Herstellungsverfahren dafür - Google Patents

Optischer Wellenleiter sowie Herstellungsverfahren dafür

Info

Publication number
DE602005022966D1
DE602005022966D1 DE602005022966T DE602005022966T DE602005022966D1 DE 602005022966 D1 DE602005022966 D1 DE 602005022966D1 DE 602005022966 T DE602005022966 T DE 602005022966T DE 602005022966 T DE602005022966 T DE 602005022966T DE 602005022966 D1 DE602005022966 D1 DE 602005022966D1
Authority
DE
Germany
Prior art keywords
manufacturing
optical waveguide
method therefor
therefor
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005022966T
Other languages
English (en)
Inventor
Yukio Maeda
Yuuichi Eriyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Publication of DE602005022966D1 publication Critical patent/DE602005022966D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optical Integrated Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
DE602005022966T 2004-10-21 2005-10-20 Optischer Wellenleiter sowie Herstellungsverfahren dafür Active DE602005022966D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004307036 2004-10-21
JP2005258601A JP4894995B2 (ja) 2004-10-21 2005-09-06 光導波路用感光性樹脂組成物、光導波路及びその製造方法

Publications (1)

Publication Number Publication Date
DE602005022966D1 true DE602005022966D1 (de) 2010-09-30

Family

ID=35744218

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005022966T Active DE602005022966D1 (de) 2004-10-21 2005-10-20 Optischer Wellenleiter sowie Herstellungsverfahren dafür

Country Status (6)

Country Link
US (2) US20060088257A1 (de)
EP (1) EP1650601B1 (de)
JP (1) JP4894995B2 (de)
KR (1) KR101265319B1 (de)
DE (1) DE602005022966D1 (de)
TW (1) TWI382993B (de)

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KR20080104292A (ko) * 2006-03-06 2008-12-02 아사히 가라스 가부시키가이샤 친수성 영역과 발수성 영역을 갖는 처리 기재 및 그 제조 방법
JP5309992B2 (ja) * 2006-04-25 2013-10-09 Ｊｓｒ株式会社 光導波路形成用ドライフィルム、光導波路およびその製造方法
JP4518089B2 (ja) * 2006-07-05 2010-08-04 Ｊｓｒ株式会社 光導波路用感光性樹脂組成物、ドライフィルム、光導波路及びその製造方法
JP4893934B2 (ja) * 2006-07-27 2012-03-07 Ｊｓｒ株式会社 光導波路フィルムの製造方法
WO2008038838A1 (fr) * 2006-09-29 2008-04-03 Jsr Corporation Guide d'onde optique de film
KR101506535B1 (ko) * 2007-02-28 2015-03-27 제이엔씨 주식회사 포지티브형 감광성 수지 조성물
EP2166395A1 (de) * 2007-07-03 2010-03-24 Konica Minolta Opto, Inc. Verfahren zur herstellung einer bildgebungsvorrichtung, bildgebungsvorrichtung und optisches element
JP5115205B2 (ja) * 2008-01-15 2013-01-09 Ｊｎｃ株式会社 ポジ型感光性重合体組成物
JP5003506B2 (ja) * 2008-01-18 2012-08-15 日立化成工業株式会社 光学材料用樹脂組成物、光学材料用樹脂フィルム、及びこれらを用いた光導波路
WO2010126116A1 (ja) 2009-04-30 2010-11-04 日立化成工業株式会社 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路
JP5263560B2 (ja) * 2009-08-25 2013-08-14 日産化学工業株式会社 高硬度インプリント材料
US9605143B2 (en) 2010-08-24 2017-03-28 Hitachi Chemicals Company, Ltd. Resin composition for formation of optical waveguide, resin film for formation of optical waveguide which comprises the resin composition, and optical waveguide produced using the resin composition or the resin film
JP5962954B2 (ja) * 2012-01-27 2016-08-03 Dic株式会社 フッ素原子含有シリコーン系重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品
JP5829932B2 (ja) * 2012-01-31 2015-12-09 大阪有機化学工業株式会社 ハードコートフィルム及びその製造に用いる樹脂組成物
JP5966615B2 (ja) * 2012-05-25 2016-08-10 日油株式会社 コロイド結晶用組成物、及び、これより得られるコロイド結晶硬化膜とその製造方法
US9031369B2 (en) * 2012-09-04 2015-05-12 Ofs Fitel, Llc Liquid and gaseous resistance compact fiber unit and method of making the same
JP6274498B2 (ja) * 2013-11-08 2018-02-07 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
TWI664199B (zh) 2014-12-26 2019-07-01 日商日鐵化學材料股份有限公司 末端改質可溶性多官能乙烯基芳香族共聚合物、其製造方法、硬化性組成物、硬化物、膜、硬化性複合材料、積層體、帶有樹脂的金屬箔、電路基板材料用清漆、硬化性樹脂組成物、光導波管形成用樹脂膜及光導波管
WO2017057853A1 (en) * 2015-10-01 2017-04-06 Rohm And Haas Electronic Materials Korea Ltd. Photosensitive resin composition and organic insulating film prepared therefrom

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
JP3218256B2 (ja) 1993-01-29 2001-10-15 東洋インキ製造株式会社 アルカリ現像型感光性着色組成物
US6023547A (en) * 1997-06-09 2000-02-08 Dsm N.V. Radiation curable composition comprising a urethane oligomer having a polyester backbone
JP4262822B2 (ja) * 1998-03-18 2009-05-13 大日本印刷株式会社 熱転写シート
JP3355313B2 (ja) * 1998-11-30 2002-12-09 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
US6344495B1 (en) * 1998-07-31 2002-02-05 Dai Nippon Printing Co., Ltd. Photo-curable resin composition and method for forming concave-convex pattern
JP3355308B2 (ja) * 1998-08-26 2002-12-09 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP3355309B2 (ja) * 1998-07-31 2002-12-09 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP4141015B2 (ja) * 1998-08-26 2008-08-27 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP2000063461A (ja) * 1998-08-26 2000-02-29 Dainippon Printing Co Ltd 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP4141016B2 (ja) * 1998-08-26 2008-08-27 大日本印刷株式会社 凹凸パターンの形成方法
JP3133039B2 (ja) 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
JP3357013B2 (ja) * 1999-07-23 2002-12-16 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP3357014B2 (ja) * 1999-07-23 2002-12-16 大日本印刷株式会社 光硬化性樹脂組成物及び凹凸パターンの形成方法
JP2002229208A (ja) * 2001-02-07 2002-08-14 Toppan Printing Co Ltd 感光性樹脂組成物
US6542684B2 (en) * 2001-05-01 2003-04-01 Corning Incorporated Optimized multi-layer optical waveguiding system
JP2003149475A (ja) * 2001-11-13 2003-05-21 Nippon Kayaku Co Ltd 光導波路用樹脂組成物及びその硬化物
JP4196562B2 (ja) * 2001-12-26 2008-12-17 Ｊｓｒ株式会社 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
JP2004182909A (ja) * 2002-12-05 2004-07-02 Nippon Kayaku Co Ltd ポリマー光導波路用樹脂組成物及びそれを用いたポリマー光導波路

Also Published As

Publication number Publication date
US7569335B2 (en) 2009-08-04
TW200624444A (en) 2006-07-16
EP1650601A2 (de) 2006-04-26
EP1650601B1 (de) 2010-08-18
JP4894995B2 (ja) 2012-03-14
TWI382993B (zh) 2013-01-21
KR101265319B1 (ko) 2013-05-20
JP2006146162A (ja) 2006-06-08
KR20060049089A (ko) 2006-05-18
US20060088257A1 (en) 2006-04-27
US20080145016A1 (en) 2008-06-19
EP1650601A3 (de) 2008-06-11

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