DE602005003122D1 - Diamantbeschichtete elektrode - Google Patents

Diamantbeschichtete elektrode

Info

Publication number
DE602005003122D1
DE602005003122D1 DE602005003122T DE602005003122T DE602005003122D1 DE 602005003122 D1 DE602005003122 D1 DE 602005003122D1 DE 602005003122 T DE602005003122 T DE 602005003122T DE 602005003122 T DE602005003122 T DE 602005003122T DE 602005003122 D1 DE602005003122 D1 DE 602005003122D1
Authority
DE
Germany
Prior art keywords
diamond
average grain
grain diameter
coated electrode
diamond layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005003122T
Other languages
English (en)
Other versions
DE602005003122T2 (de
Inventor
Martin Rueffer
Michael Foreta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DiaCCon GmbH
Ebara Corp
Original Assignee
DiaCCon GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DiaCCon GmbH filed Critical DiaCCon GmbH
Publication of DE602005003122D1 publication Critical patent/DE602005003122D1/de
Application granted granted Critical
Publication of DE602005003122T2 publication Critical patent/DE602005003122T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46152—Electrodes characterised by the shape or form
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Hydrology & Water Resources (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Semiconductor Memories (AREA)
  • Ticket-Dispensing Machines (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Thermistors And Varistors (AREA)
DE602005003122T 2004-05-21 2005-05-13 Diamantbeschichtete elektrode Active DE602005003122T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004025669 2004-05-21
DE102004025669A DE102004025669A1 (de) 2004-05-21 2004-05-21 Funktionelle CVD-Diamantschichten auf großflächigen Substraten
PCT/EP2005/005253 WO2005113448A1 (en) 2004-05-21 2005-05-13 Diamond coated electrode

Publications (2)

Publication Number Publication Date
DE602005003122D1 true DE602005003122D1 (de) 2007-12-13
DE602005003122T2 DE602005003122T2 (de) 2008-08-28

Family

ID=34967994

Family Applications (3)

Application Number Title Priority Date Filing Date
DE102004025669A Withdrawn DE102004025669A1 (de) 2004-05-21 2004-05-21 Funktionelle CVD-Diamantschichten auf großflächigen Substraten
DE602005003122T Active DE602005003122T2 (de) 2004-05-21 2005-05-13 Diamantbeschichtete elektrode
DE602005006555T Active DE602005006555D1 (de) 2004-05-21 2005-05-13 Grosse elektrode

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102004025669A Withdrawn DE102004025669A1 (de) 2004-05-21 2004-05-21 Funktionelle CVD-Diamantschichten auf großflächigen Substraten

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE602005006555T Active DE602005006555D1 (de) 2004-05-21 2005-05-13 Grosse elektrode

Country Status (6)

Country Link
US (1) US20080160271A1 (de)
EP (2) EP1748958B1 (de)
JP (2) JP2007538151A (de)
AT (2) ATE376981T1 (de)
DE (3) DE102004025669A1 (de)
WO (2) WO2005113860A1 (de)

Families Citing this family (14)

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JP4673696B2 (ja) * 2005-08-01 2011-04-20 ペルメレック電極株式会社 導電性ダイヤモンド電極及びその製造方法
GB0622483D0 (en) 2006-11-10 2006-12-20 Element Six Ltd Electrochemical apparatus having a forced flow arrangement
KR20110073461A (ko) * 2008-09-24 2011-06-29 쿠리타 고교 가부시키가이샤 다이아몬드 전극 및 다이아몬드 전극의 제조 방법
JP2010202957A (ja) * 2009-03-05 2010-09-16 Mitsubishi Materials Corp 炭素膜、炭素膜の製造方法及びｃｍｐパッドコンディショナー
DE102009048108B3 (de) * 2009-10-01 2011-05-05 Condias Gmbh Verfahren zur Behandlung einer Diamantschicht und Substrat mit einer Diamantschicht
JP5402543B2 (ja) * 2009-11-09 2014-01-29 三菱マテリアル株式会社 すぐれた耐欠損性および耐摩耗性を発揮するダイヤモンド被覆工具
JP5499771B2 (ja) * 2010-02-26 2014-05-21 三菱マテリアル株式会社 ダイヤモンド被覆切削工具
EP3067324B1 (de) * 2015-03-11 2019-09-18 Politechnika Gdanska Verfahren zur herstellung von elektroden aus bordotiertem nanokristallinem diamant
US10662523B2 (en) 2015-05-27 2020-05-26 John Crane Inc. Extreme durability composite diamond film
US10907264B2 (en) * 2015-06-10 2021-02-02 Advanced Diamond Technologies, Inc. Extreme durability composite diamond electrodes
US10662550B2 (en) 2016-11-03 2020-05-26 John Crane Inc. Diamond nanostructures with large surface area and method of producing the same
DE102017219317A1 (de) * 2017-10-27 2019-05-02 Friedrich-Alexander-Universität Erlangen-Nürnberg Turbinen-, Verdichter-, im 3D-Druck hergestellte- und/oder Motor-Komponente sowie die Verwendung vorgefertigter Teilstücke zur Oberflächenbeschichtung
US20220235475A1 (en) 2019-06-12 2022-07-28 Friedrich-Alexander-Universität Erlangen-Nürnberg Electrolysis device having two boron doped diamond layers
CN110808181B (zh) * 2019-10-12 2021-09-03 深圳先进技术研究院 薄膜电极及制备方法

Family Cites Families (34)

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JP2558448B2 (ja) * 1985-10-31 1996-11-27 京セラ株式会社 ダイヤモンド被覆切削工具
EP0307109A1 (de) * 1987-08-24 1989-03-15 Canon Kabushiki Kaisha Verfahren zur Herstellung eines Halbleiterkristalls und dabei hergestellter Halbleiterkristall
JPH01153228A (ja) * 1987-12-10 1989-06-15 Asahi Daiyamondo Kogyo Kk 気相合成ダイヤモンド工具の製造法
JP2949863B2 (ja) * 1991-01-21 1999-09-20 住友電気工業株式会社 高靱性多結晶ダイヤモンドおよびその製造方法
TW197534B (de) * 1991-03-21 1993-01-01 Eltech Systems Corp
GB9123331D0 (en) * 1991-11-04 1991-12-18 De Beers Ind Diamond Apparatus for depositing a material on a substrate by chemical vapour deposition
JP2767514B2 (ja) * 1992-03-24 1998-06-18 株式会社半導体エネルギー研究所 ダイヤモンド薄膜及びその作成方法
US5474816A (en) * 1993-04-16 1995-12-12 The Regents Of The University Of California Fabrication of amorphous diamond films
JP3397849B2 (ja) * 1993-09-10 2003-04-21 エムエムシーコベルコツール株式会社 ダイヤモンド被覆超硬合金工具
US5399247A (en) * 1993-12-22 1995-03-21 Eastman Kodak Company Method of electrolysis employing a doped diamond anode to oxidize solutes in wastewater
DE4423833C2 (de) * 1994-07-07 1998-07-23 Daimler Benz Ag Lackschicht zur späteren Beschichtung mit einer gegenüber der organischen Lackschicht härteren Deckschicht und Verfahren zur Oberflächenbehandlung der Lackschicht
DE4423891A1 (de) * 1994-07-07 1996-01-11 Daimler Benz Ag Schichtaufbau mit einer organischen Schicht und einer die organische Schicht bedeckenden und gegenüber der organischen Schicht härteren, transparenten Deckschicht sowie Verfahren zur Herstellung des Schichtaufbaus
JP3212057B2 (ja) * 1994-09-05 2001-09-25 東洋鋼鈑株式会社 ダイヤモンド被覆基体およびその製造方法
US5529805A (en) * 1994-09-22 1996-06-25 General Electric Company Method for manufacturing a diamond article
US5981071A (en) * 1996-05-20 1999-11-09 Borealis Technical Limited Doped diamond for vacuum diode heat pumps and vacuum diode thermionic generators
US5783261A (en) * 1996-07-11 1998-07-21 Ford Global Technologies, Inc. Using a coated fuel injector and method of making
DE19716330C2 (de) * 1997-04-18 1999-08-26 Fraunhofer Ges Forschung Verfahren zur Herstellung einer Beschichtung auf einem Schleifwerkzeug und Verwendung des Verfahrens
JPH11269686A (ja) * 1998-03-18 1999-10-05 Permelec Electrode Ltd 過酸化水素の製造方法及び過酸化水素製造用電解槽
JP4157615B2 (ja) * 1998-03-18 2008-10-01 ペルメレック電極株式会社 不溶性金属電極の製造方法及び該電極を使用する電解槽
GB9811213D0 (en) * 1998-05-27 1998-07-22 Camco Int Uk Ltd Methods of treating preform elements
DE19842396A1 (de) * 1998-09-16 2000-04-13 Fraunhofer Ges Forschung Elektrode für elektrochemische Prozesse
DE19844538C2 (de) * 1998-09-29 2002-04-11 Fraunhofer Ges Forschung Verfahren zur Diamant-Beschichtung von Oberflächen
US6572935B1 (en) * 1999-03-13 2003-06-03 The Regents Of The University Of California Optically transparent, scratch-resistant, diamond-like carbon coatings
DE19911746A1 (de) * 1999-03-16 2000-09-21 Basf Ag Diamantelektroden
KR100352985B1 (ko) * 1999-04-30 2002-09-18 한국과학기술연구원 균열이 없고 평탄한 다이아몬드막 합성 방법
US6423193B1 (en) * 1999-08-30 2002-07-23 Case Western Reserve University Nitrogen doped carbon electrodes
CA2327031C (en) * 1999-11-29 2007-07-03 Vladimir Gorokhovsky Composite vapour deposited coatings and process therefor
JP2000297374A (ja) * 2000-01-01 2000-10-24 Semiconductor Energy Lab Co Ltd 基板およびｐｅｔフィルム
DE10025167B4 (de) * 2000-05-24 2004-08-19 Dirk Schulze Elektrode für die elektrolytische Erzeugung von Ozon und/oder Sauerstoff, diese enthaltende Elektrolysezelle sowie Verfahren zur Herstellung einer solchen Elektrode
US7306674B2 (en) * 2001-01-19 2007-12-11 Chevron U.S.A. Inc. Nucleation of diamond films using higher diamondoids
JP2002338388A (ja) * 2001-02-15 2002-11-27 Ngk Insulators Ltd ダイヤモンドコート部材
WO2003091469A2 (de) * 2002-04-24 2003-11-06 Friedrich-Alexander- Universität Erlangen-Nürnberg Verfahren zum verbinden einer diamantschicht mit einem substrat und diamantbeschichtetes substrat
AT412002B (de) * 2002-07-08 2004-08-26 Wolfgang Dipl Ing Mag Wesner Diamantelektrode und verfahren zu ihrer herstellung
JP2004231983A (ja) * 2003-01-28 2004-08-19 Sumitomo Electric Ind Ltd ダイヤモンド被覆電極

Also Published As

Publication number Publication date
ATE376981T1 (de) 2007-11-15
DE602005006555D1 (de) 2008-06-19
DE102004025669A1 (de) 2005-12-15
ATE394525T1 (de) 2008-05-15
DE602005003122T2 (de) 2008-08-28
EP1749120A1 (de) 2007-02-07
EP1749120B1 (de) 2008-05-07
EP1748958A1 (de) 2007-02-07
JP2007538151A (ja) 2007-12-27
US20080160271A1 (en) 2008-07-03
WO2005113448A1 (en) 2005-12-01
JP2007538150A (ja) 2007-12-27
WO2005113860A1 (en) 2005-12-01
EP1748958B1 (de) 2007-10-31

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: EBARA CORP., TOKIO/TOKYO, JP

Owner name: DIACCON GMBH, 90762 FUERTH, DE

8364 No opposition during term of opposition
R082 Change of representative

Ref document number: 1748958

Country of ref document: EP

Representative=s name: DR. GASSNER & PARTNER, 91052 ERLANGEN, DE