ATE394525T1 - Grosse elektrode - Google Patents

Grosse elektrode

Info

Publication number
ATE394525T1
ATE394525T1 AT05739672T AT05739672T ATE394525T1 AT E394525 T1 ATE394525 T1 AT E394525T1 AT 05739672 T AT05739672 T AT 05739672T AT 05739672 T AT05739672 T AT 05739672T AT E394525 T1 ATE394525 T1 AT E394525T1
Authority
AT
Austria
Prior art keywords
average grain
grain diameter
diamond layer
large electrode
diamond
Prior art date
Application number
AT05739672T
Other languages
English (en)
Inventor
Martin Rueffer
Michael Foreta
Original Assignee
Diaccon Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Diaccon Gmbh filed Critical Diaccon Gmbh
Application granted granted Critical
Publication of ATE394525T1 publication Critical patent/ATE394525T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46152—Electrodes characterised by the shape or form
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Hydrology & Water Resources (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Semiconductor Memories (AREA)
  • Ticket-Dispensing Machines (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Thermistors And Varistors (AREA)
AT05739672T 2004-05-21 2005-05-13 Grosse elektrode ATE394525T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004025669A DE102004025669A1 (de) 2004-05-21 2004-05-21 Funktionelle CVD-Diamantschichten auf großflächigen Substraten

Publications (1)

Publication Number Publication Date
ATE394525T1 true ATE394525T1 (de) 2008-05-15

Family

ID=34967994

Family Applications (2)

Application Number Title Priority Date Filing Date
AT05743922T ATE376981T1 (de) 2004-05-21 2005-05-13 Diamantbeschichtete elektrode
AT05739672T ATE394525T1 (de) 2004-05-21 2005-05-13 Grosse elektrode

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT05743922T ATE376981T1 (de) 2004-05-21 2005-05-13 Diamantbeschichtete elektrode

Country Status (6)

Country Link
US (1) US20080160271A1 (de)
EP (2) EP1748958B1 (de)
JP (2) JP2007538151A (de)
AT (2) ATE376981T1 (de)
DE (3) DE102004025669A1 (de)
WO (2) WO2005113448A1 (de)

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JP4673696B2 (ja) * 2005-08-01 2011-04-20 ペルメレック電極株式会社 導電性ダイヤモンド電極及びその製造方法
GB0622483D0 (en) 2006-11-10 2006-12-20 Element Six Ltd Electrochemical apparatus having a forced flow arrangement
JP5419881B2 (ja) * 2008-09-24 2014-02-19 栗田工業株式会社 ダイヤモンド電極及びダイヤモンド電極の製造方法
JP2010202957A (ja) * 2009-03-05 2010-09-16 Mitsubishi Materials Corp 炭素膜、炭素膜の製造方法及びｃｍｐパッドコンディショナー
DE102009048108B3 (de) * 2009-10-01 2011-05-05 Condias Gmbh Verfahren zur Behandlung einer Diamantschicht und Substrat mit einer Diamantschicht
JP5402543B2 (ja) * 2009-11-09 2014-01-29 三菱マテリアル株式会社 すぐれた耐欠損性および耐摩耗性を発揮するダイヤモンド被覆工具
JP5499771B2 (ja) * 2010-02-26 2014-05-21 三菱マテリアル株式会社 ダイヤモンド被覆切削工具
EP3067324B1 (de) * 2015-03-11 2019-09-18 Politechnika Gdanska Verfahren zur herstellung von elektroden aus bordotiertem nanokristallinem diamant
US10662523B2 (en) 2015-05-27 2020-05-26 John Crane Inc. Extreme durability composite diamond film
US10907264B2 (en) * 2015-06-10 2021-02-02 Advanced Diamond Technologies, Inc. Extreme durability composite diamond electrodes
US10662550B2 (en) 2016-11-03 2020-05-26 John Crane Inc. Diamond nanostructures with large surface area and method of producing the same
DE102017219317A1 (de) * 2017-10-27 2019-05-02 Friedrich-Alexander-Universität Erlangen-Nürnberg Turbinen-, Verdichter-, im 3D-Druck hergestellte- und/oder Motor-Komponente sowie die Verwendung vorgefertigter Teilstücke zur Oberflächenbeschichtung
US20220235475A1 (en) 2019-06-12 2022-07-28 Friedrich-Alexander-Universität Erlangen-Nürnberg Electrolysis device having two boron doped diamond layers
CN110808181B (zh) * 2019-10-12 2021-09-03 深圳先进技术研究院 薄膜电极及制备方法

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JP2558448B2 (ja) * 1985-10-31 1996-11-27 京セラ株式会社 ダイヤモンド被覆切削工具
EP0307109A1 (de) * 1987-08-24 1989-03-15 Canon Kabushiki Kaisha Verfahren zur Herstellung eines Halbleiterkristalls und dabei hergestellter Halbleiterkristall
JPH01153228A (ja) * 1987-12-10 1989-06-15 Asahi Daiyamondo Kogyo Kk 気相合成ダイヤモンド工具の製造法
JP2949863B2 (ja) * 1991-01-21 1999-09-20 住友電気工業株式会社 高靱性多結晶ダイヤモンドおよびその製造方法
TW197534B (de) * 1991-03-21 1993-01-01 Eltech Systems Corp
GB9123331D0 (en) * 1991-11-04 1991-12-18 De Beers Ind Diamond Apparatus for depositing a material on a substrate by chemical vapour deposition
JP2767514B2 (ja) * 1992-03-24 1998-06-18 株式会社半導体エネルギー研究所 ダイヤモンド薄膜及びその作成方法
US5474816A (en) * 1993-04-16 1995-12-12 The Regents Of The University Of California Fabrication of amorphous diamond films
JP3397849B2 (ja) * 1993-09-10 2003-04-21 エムエムシーコベルコツール株式会社 ダイヤモンド被覆超硬合金工具
US5399247A (en) * 1993-12-22 1995-03-21 Eastman Kodak Company Method of electrolysis employing a doped diamond anode to oxidize solutes in wastewater
DE4423891A1 (de) * 1994-07-07 1996-01-11 Daimler Benz Ag Schichtaufbau mit einer organischen Schicht und einer die organische Schicht bedeckenden und gegenüber der organischen Schicht härteren, transparenten Deckschicht sowie Verfahren zur Herstellung des Schichtaufbaus
DE4423833C2 (de) * 1994-07-07 1998-07-23 Daimler Benz Ag Lackschicht zur späteren Beschichtung mit einer gegenüber der organischen Lackschicht härteren Deckschicht und Verfahren zur Oberflächenbehandlung der Lackschicht
JP3212057B2 (ja) * 1994-09-05 2001-09-25 東洋鋼鈑株式会社 ダイヤモンド被覆基体およびその製造方法
US5529805A (en) * 1994-09-22 1996-06-25 General Electric Company Method for manufacturing a diamond article
US5981071A (en) * 1996-05-20 1999-11-09 Borealis Technical Limited Doped diamond for vacuum diode heat pumps and vacuum diode thermionic generators
US5783261A (en) * 1996-07-11 1998-07-21 Ford Global Technologies, Inc. Using a coated fuel injector and method of making
DE19716330C2 (de) * 1997-04-18 1999-08-26 Fraunhofer Ges Forschung Verfahren zur Herstellung einer Beschichtung auf einem Schleifwerkzeug und Verwendung des Verfahrens
JPH11269686A (ja) * 1998-03-18 1999-10-05 Permelec Electrode Ltd 過酸化水素の製造方法及び過酸化水素製造用電解槽
JP4157615B2 (ja) * 1998-03-18 2008-10-01 ペルメレック電極株式会社 不溶性金属電極の製造方法及び該電極を使用する電解槽
GB9811213D0 (en) * 1998-05-27 1998-07-22 Camco Int Uk Ltd Methods of treating preform elements
DE19842396A1 (de) * 1998-09-16 2000-04-13 Fraunhofer Ges Forschung Elektrode für elektrochemische Prozesse
DE19844538C2 (de) * 1998-09-29 2002-04-11 Fraunhofer Ges Forschung Verfahren zur Diamant-Beschichtung von Oberflächen
US6572935B1 (en) * 1999-03-13 2003-06-03 The Regents Of The University Of California Optically transparent, scratch-resistant, diamond-like carbon coatings
DE19911746A1 (de) * 1999-03-16 2000-09-21 Basf Ag Diamantelektroden
KR100352985B1 (ko) * 1999-04-30 2002-09-18 한국과학기술연구원 균열이 없고 평탄한 다이아몬드막 합성 방법
US6423193B1 (en) * 1999-08-30 2002-07-23 Case Western Reserve University Nitrogen doped carbon electrodes
CA2327031C (en) * 1999-11-29 2007-07-03 Vladimir Gorokhovsky Composite vapour deposited coatings and process therefor
JP2000297374A (ja) * 2000-01-01 2000-10-24 Semiconductor Energy Lab Co Ltd 基板およびｐｅｔフィルム
DE10025167B4 (de) * 2000-05-24 2004-08-19 Dirk Schulze Elektrode für die elektrolytische Erzeugung von Ozon und/oder Sauerstoff, diese enthaltende Elektrolysezelle sowie Verfahren zur Herstellung einer solchen Elektrode
US7306674B2 (en) * 2001-01-19 2007-12-11 Chevron U.S.A. Inc. Nucleation of diamond films using higher diamondoids
JP2002338388A (ja) * 2001-02-15 2002-11-27 Ngk Insulators Ltd ダイヤモンドコート部材
WO2003091469A2 (de) * 2002-04-24 2003-11-06 Friedrich-Alexander- Universität Erlangen-Nürnberg Verfahren zum verbinden einer diamantschicht mit einem substrat und diamantbeschichtetes substrat
AT412002B (de) * 2002-07-08 2004-08-26 Wolfgang Dipl Ing Mag Wesner Diamantelektrode und verfahren zu ihrer herstellung
JP2004231983A (ja) * 2003-01-28 2004-08-19 Sumitomo Electric Ind Ltd ダイヤモンド被覆電極

Also Published As

Publication number Publication date
US20080160271A1 (en) 2008-07-03
DE602005003122T2 (de) 2008-08-28
WO2005113448A1 (en) 2005-12-01
DE602005006555D1 (de) 2008-06-19
ATE376981T1 (de) 2007-11-15
EP1749120B1 (de) 2008-05-07
WO2005113860A1 (en) 2005-12-01
JP2007538151A (ja) 2007-12-27
DE602005003122D1 (de) 2007-12-13
EP1749120A1 (de) 2007-02-07
DE102004025669A1 (de) 2005-12-15
EP1748958A1 (de) 2007-02-07
EP1748958B1 (de) 2007-10-31
JP2007538150A (ja) 2007-12-27

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