DE602004026022D1 - Sulfoniumsalze als Photoinitiatoren - Google Patents
Sulfoniumsalze als PhotoinitiatorenInfo
- Publication number
- DE602004026022D1 DE602004026022D1 DE602004026022T DE602004026022T DE602004026022D1 DE 602004026022 D1 DE602004026022 D1 DE 602004026022D1 DE 602004026022 T DE602004026022 T DE 602004026022T DE 602004026022 T DE602004026022 T DE 602004026022T DE 602004026022 D1 DE602004026022 D1 DE 602004026022D1
- Authority
- DE
- Germany
- Prior art keywords
- photoinitiators
- sulfonium salts
- compounds
- tricyclic
- structural formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
- C07D335/12—Thioxanthenes
- C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
- C07D335/16—Oxygen atoms, e.g. thioxanthones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/688—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/700,754 US7230122B2 (en) | 2003-11-04 | 2003-11-04 | Sulfonium salt photinitiators and use thereof |
US10/918,946 US20050095531A1 (en) | 2003-11-04 | 2004-08-16 | Sulfonium salt photoinitiators and use thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004026022D1 true DE602004026022D1 (de) | 2010-04-29 |
Family
ID=34551274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004026022T Active DE602004026022D1 (de) | 2003-11-04 | 2004-11-04 | Sulfoniumsalze als Photoinitiatoren |
Country Status (7)
Country | Link |
---|---|
US (3) | US7230122B2 (de) |
EP (2) | EP2112146A1 (de) |
JP (1) | JP5547660B2 (de) |
KR (1) | KR20120099348A (de) |
AT (1) | ATE461185T1 (de) |
DE (1) | DE602004026022D1 (de) |
TW (1) | TWI364418B (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7611817B2 (en) * | 2002-09-25 | 2009-11-03 | Adeka Corporation | Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
WO2005029188A1 (ja) * | 2003-09-24 | 2005-03-31 | Hitachi Chemical Co., Ltd. | 感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
US7230122B2 (en) * | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
EP2545132B1 (de) | 2010-03-09 | 2015-11-04 | Henkel IP & Holding GmbH | Kationische uv-vernetzbare acrylpolymere für druckempfindliche haftmittel |
CN102174185B (zh) * | 2011-01-31 | 2012-10-10 | 武汉工程大学 | 端羟基聚环氧氯丙烷的合成工艺 |
JP5879229B2 (ja) * | 2012-08-20 | 2016-03-08 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
EP2842980B1 (de) | 2013-08-09 | 2021-05-05 | DSM IP Assets B.V. | Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen |
US9228073B2 (en) | 2013-11-05 | 2016-01-05 | Dsm Ip Assets B.V. | Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication |
KR102698770B1 (ko) | 2015-06-08 | 2024-08-23 | 스트래터시스,인코포레이티드 | 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물 |
EP3341793B1 (de) | 2015-10-01 | 2021-05-26 | DSM IP Assets B.V. | Flüssige hybride uv/vis-strahlungshärtbare harzzusammensetzungen zur generativen fertigung |
US11332625B2 (en) | 2015-11-17 | 2022-05-17 | Covestro (Netherlands) B.V. | Antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes |
KR102427130B1 (ko) | 2016-03-14 | 2022-08-01 | 코베스트로 (네덜란드) 비.브이. | 개선된 인성 및 고온 내성을 갖는 부가 제조용 방사선 경화성 조성물 |
CN109456242B (zh) | 2017-09-06 | 2021-02-12 | 常州强力电子新材料股份有限公司 | 硫鎓盐光引发剂、其制备方法、包含其的光固化组合物及其应用 |
EP3724280A1 (de) | 2017-12-15 | 2020-10-21 | DSM IP Assets B.V. | Zusammensetzungen und verfahren zum hochtemperaturspritzen von viskosen duroplasten zur erzeugung von festen artikeln mittels generativer fertigung |
CN115179545A (zh) | 2017-12-29 | 2022-10-14 | 科思创(荷兰)有限公司 | 用于加成制造的组合物和制品及其使用方法 |
JP7368738B2 (ja) * | 2018-10-18 | 2023-10-25 | 株式会社スリーボンド | 光硬化性組成物 |
WO2021042013A1 (en) | 2019-08-30 | 2021-03-04 | Dsm Ip Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3577398A (en) | 1966-06-09 | 1971-05-04 | Goodyear Tire & Rubber | Synthetic resin |
US4231951A (en) | 1978-02-08 | 1980-11-04 | Minnesota Mining And Manufacturing Company | Complex salt photoinitiator |
CH636387A5 (de) * | 1979-04-25 | 1983-05-31 | Sulzer Ag | Kettfadenwaechtereinrichtung fuer eine webmaschine. |
US4694029A (en) * | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
US5010118A (en) * | 1989-06-22 | 1991-04-23 | General Electric Company | UV curable non-toxic epoxysilicone release coating compositions |
US5082686A (en) * | 1989-06-22 | 1992-01-21 | General Electric Company | UV curable non-toxic epoxysilicone release coating compositions and method |
US5382604A (en) | 1991-10-07 | 1995-01-17 | Shell Oil Company | Crosslinked epoxy functionalized polydiene block polymers and adhesives |
US5229464A (en) | 1991-04-29 | 1993-07-20 | Shell Oil Company | Epoxidized viscous conjugated diene block copolymers |
US5686535A (en) | 1991-04-29 | 1997-11-11 | Shell Oil Company | Viscous conjugated diene block copolymers |
GB9113580D0 (en) * | 1991-06-24 | 1991-08-14 | Int Bio Synthetics Ltd | Thioxanthone derivatives |
US5393818A (en) | 1993-04-06 | 1995-02-28 | Shell Oil Company | Solvent-free laminating adhesive composition from epoxidized block polymer |
US5776998A (en) | 1995-06-16 | 1998-07-07 | Shell Oil Company | Non-aqueous solvent free process for making UV curable adhesives and sealants from epoxidized monohydroxylated diene polymers |
JPH0912615A (ja) * | 1995-06-29 | 1997-01-14 | Nippon Kayaku Co Ltd | エネルギー線硬化性組成物及びその硬化物 |
US5837749A (en) | 1996-04-26 | 1998-11-17 | Shell Oil Company | Non-aqueous solvent free process for making UV curable adhesives and sealants from epoxidized monohydroxylated diene polymers (III) |
US6054501A (en) * | 1996-06-12 | 2000-04-25 | Nippon Kayaku Kabushiki Kaisha | Photopolymerization initiator and energy ray curable composition containing the same |
JPH107649A (ja) | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
JPH10212307A (ja) * | 1997-01-30 | 1998-08-11 | Nippon Kayaku Co Ltd | エネルギー線硬化性組成物及びその硬化物 |
JPH10212286A (ja) | 1997-01-30 | 1998-08-11 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH10287643A (ja) * | 1997-04-10 | 1998-10-27 | Nippon Kayaku Co Ltd | 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH11269169A (ja) | 1998-03-20 | 1999-10-05 | Nippon Kayaku Co Ltd | スルホニウム塩の製造方法 |
JP2002317172A (ja) * | 2001-04-20 | 2002-10-31 | Nippon Kayaku Co Ltd | 液晶表示装置用シール材樹脂組成物 |
GB0115588D0 (en) | 2001-06-26 | 2001-08-15 | Coates Brothers Plc | Novel compounds for use as photoinitiators |
US7230121B2 (en) * | 2001-07-19 | 2007-06-12 | Lamberti Spa | Sulfoniun salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
DE60230679D1 (de) | 2002-03-04 | 2009-02-12 | Wako Pure Chem Ind Ltd | Heterocyclustragende oniumsalze |
US7244473B2 (en) * | 2003-04-22 | 2007-07-17 | Konica Minolta Medical & Graphic, Inc. | Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound |
US7230122B2 (en) * | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
-
2003
- 2003-11-04 US US10/700,754 patent/US7230122B2/en not_active Expired - Lifetime
-
2004
- 2004-08-16 US US10/918,946 patent/US20050095531A1/en not_active Abandoned
- 2004-11-03 TW TW093133414A patent/TWI364418B/zh not_active IP Right Cessation
- 2004-11-04 EP EP09004994A patent/EP2112146A1/de not_active Withdrawn
- 2004-11-04 EP EP09004995A patent/EP2112147A1/de not_active Withdrawn
- 2004-11-04 AT AT04026159T patent/ATE461185T1/de not_active IP Right Cessation
- 2004-11-04 DE DE602004026022T patent/DE602004026022D1/de active Active
-
2007
- 2007-04-26 US US11/789,873 patent/US7560219B2/en not_active Expired - Lifetime
-
2011
- 2011-01-06 JP JP2011001379A patent/JP5547660B2/ja not_active Expired - Fee Related
-
2012
- 2012-06-01 KR KR1020120059210A patent/KR20120099348A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP2112147A1 (de) | 2009-10-28 |
JP2011089135A (ja) | 2011-05-06 |
US20070203254A1 (en) | 2007-08-30 |
US20050095531A1 (en) | 2005-05-05 |
US20050095528A1 (en) | 2005-05-05 |
TW200533662A (en) | 2005-10-16 |
US7230122B2 (en) | 2007-06-12 |
TWI364418B (en) | 2012-05-21 |
ATE461185T1 (de) | 2010-04-15 |
US7560219B2 (en) | 2009-07-14 |
KR20120099348A (ko) | 2012-09-10 |
JP5547660B2 (ja) | 2014-07-16 |
EP2112146A1 (de) | 2009-10-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |