DE602004024758D1 - Polyimidzusammensetzungen mit Widerstand gegen Wassersorption, und Verfahren hierzu - Google Patents
Polyimidzusammensetzungen mit Widerstand gegen Wassersorption, und Verfahren hierzuInfo
- Publication number
- DE602004024758D1 DE602004024758D1 DE602004024758T DE602004024758T DE602004024758D1 DE 602004024758 D1 DE602004024758 D1 DE 602004024758D1 DE 602004024758 T DE602004024758 T DE 602004024758T DE 602004024758 T DE602004024758 T DE 602004024758T DE 602004024758 D1 DE602004024758 D1 DE 602004024758D1
- Authority
- DE
- Germany
- Prior art keywords
- resistance
- methods
- water sorption
- polyimide compositions
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1028—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
- C08G73/1032—Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous characterised by the solvent(s) used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Non-Adjustable Resistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US53545304P | 2004-01-09 | 2004-01-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE602004024758D1 true DE602004024758D1 (de) | 2010-02-04 |
Family
ID=35471921
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE602004024758T Expired - Lifetime DE602004024758D1 (de) | 2004-01-09 | 2004-11-15 | Polyimidzusammensetzungen mit Widerstand gegen Wassersorption, und Verfahren hierzu |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7348373B2 (https=) |
| EP (1) | EP1553134B1 (https=) |
| JP (1) | JP2005325332A (https=) |
| DE (1) | DE602004024758D1 (https=) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7169330B2 (en) * | 2004-02-25 | 2007-01-30 | E. I. Du Pont De Nemours And Company | Composition of conductive paste |
| JP2006206756A (ja) | 2005-01-28 | 2006-08-10 | Sony Chem Corp | ポリイミド化合物及びフレキシブル配線板 |
| US7745516B2 (en) * | 2005-10-12 | 2010-06-29 | E. I. Du Pont De Nemours And Company | Composition of polyimide and sterically-hindered hydrophobic epoxy |
| US20070290379A1 (en) * | 2006-06-15 | 2007-12-20 | Dueber Thomas E | Hydrophobic compositions for electronic applications |
| US20080035567A1 (en) * | 2006-08-08 | 2008-02-14 | Sabottke Craig Y | Enhanced membrane separation system |
| US7604754B2 (en) * | 2006-11-17 | 2009-10-20 | E. I. Du Pont De Nemours And Company | Resistor compositions for electronic circuitry applications |
| JP2010512449A (ja) * | 2006-12-12 | 2010-04-22 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 結晶性封入剤 |
| EP2092807B1 (en) | 2006-12-12 | 2013-04-17 | CDA Processing Limited Liability Company | Composite organic encapsulants |
| US20090111948A1 (en) * | 2007-10-25 | 2009-04-30 | Thomas Eugene Dueber | Compositions comprising polyimide and hydrophobic epoxy and phenolic resins, and methods relating thereto |
| JP5256018B2 (ja) * | 2008-12-26 | 2013-08-07 | 旭化成イーマテリアルズ株式会社 | 組成物、組成物からなる塗膜、塗膜を含む積層体、及び積層体を組み込んだ電子機器 |
| KR101455760B1 (ko) | 2010-12-16 | 2014-10-28 | 주식회사 엘지화학 | 회로 기판용 금속 적층체 및 이의 제조 방법 |
| MX2014008364A (es) * | 2012-01-09 | 2015-04-16 | Du Pont | Soluciones aglomerantes. |
| CN102604584B (zh) * | 2012-03-28 | 2013-08-21 | 黑龙江省科学院石油化学研究院 | 一种高剥离聚酰亚胺胶粘剂及其制备方法 |
| US20150228374A1 (en) * | 2014-02-07 | 2015-08-13 | E I Du Pont De Nemours And Company | Thermally conductive electronic substrates and methods relating thereto |
| TWI551652B (zh) * | 2014-05-30 | 2016-10-01 | Lg化學股份有限公司 | 聚醯亞胺系溶液和使用其製備的聚醯亞胺系膜及含聚醯亞胺系膜的顯示器基板與裝置 |
| US10822499B2 (en) | 2014-10-10 | 2020-11-03 | Sabic Global Technologies B.V. | Polyetherimide varnish compositions, methods of manufacture, and articles prepared therefrom |
| WO2016100629A1 (en) * | 2014-12-17 | 2016-06-23 | E. I. Du Pont De Nemours And Company | High temperature conductive thick film pastes polyimide for heater |
| JP6597645B2 (ja) * | 2015-02-12 | 2019-10-30 | 日産化学株式会社 | 液晶配向剤 |
| KR102339037B1 (ko) * | 2015-06-26 | 2021-12-14 | 코오롱인더스트리 주식회사 | 폴리아마이드-이미드 전구체, 폴리아마이드-이미드 필름 및 이를 포함하는 표시소자 |
| CN105001778B (zh) * | 2015-07-10 | 2018-01-02 | 东华大学 | 一种含氟聚酰亚胺湿敏电容及其制备方法 |
| US20170044382A1 (en) * | 2015-08-12 | 2017-02-16 | E I Du Pont De Nemours And Company | Process for forming a solderable polyimide-based polymer thick film conductor |
| US9649730B2 (en) * | 2015-08-12 | 2017-05-16 | E I Du Pont De Nemours And Company | Paste and process for forming a solderable polyimide-based polymer thick film conductor |
| US9637648B2 (en) * | 2015-08-13 | 2017-05-02 | E I Du Pont De Nemours And Company | Photonic sintering of a solderable polymer thick film copper conductor composition |
| US9637647B2 (en) * | 2015-08-13 | 2017-05-02 | E I Du Pont De Nemours And Company | Photonic sintering of a polymer thick film copper conductor composition |
| CN105086424B (zh) * | 2015-09-02 | 2018-06-22 | 东华大学 | 一种耐高温bahpfp型覆铜箔板及其制备方法 |
| CN105111927B (zh) * | 2015-09-02 | 2017-04-05 | 东华大学 | 一种耐高温bahpfp型漆包线漆及其制备方法 |
| US20170121058A1 (en) * | 2015-10-30 | 2017-05-04 | Corning Incorporated | Glass articles with mixed polymer and metal oxide coatings |
| US10189950B2 (en) * | 2015-12-22 | 2019-01-29 | E I Du Pont De Nemours And Company | Polyimide-based polymer thick film compositions |
| CN105924649B (zh) * | 2016-05-19 | 2019-06-18 | 航天材料及工艺研究所 | 一种聚酰亚胺泡沫材料及其制备方法 |
| CN109417834B (zh) | 2016-07-22 | 2022-04-12 | E.I.内穆尔杜邦公司 | 薄膜加热装置 |
| KR102494637B1 (ko) * | 2016-09-30 | 2023-02-02 | 스미또모 가가꾸 가부시키가이샤 | 폴리이미드계 고분자 바니시의 제조방법, 폴리이미드계 고분자 필름의 제조방법, 및, 투명 폴리이미드계 고분자 필름 |
| KR20180060259A (ko) * | 2016-11-28 | 2018-06-07 | 한국생산기술연구원 | 전하 이동 복합체를 이용한 자동차용 스크래치 자기치유 클리어코트 조성물, 이를 포함하는 클리어코트 및 이의 제조방법 |
| TWI773745B (zh) * | 2017-04-24 | 2022-08-11 | 日商味之素股份有限公司 | 樹脂組成物 |
| CN109561526B (zh) * | 2017-09-26 | 2023-04-25 | 杜邦电子公司 | 加热元件和加热装置 |
| TWI749351B (zh) * | 2019-08-08 | 2021-12-11 | 達興材料股份有限公司 | 暫時黏著組成物、暫時黏著膜、複合膜、暫時黏著被加工物之方法以及半導體晶圓封裝 |
| CN114502659A (zh) * | 2019-10-29 | 2022-05-13 | 东丽株式会社 | 树脂组合物、树脂片材、固化膜、固化膜的制造方法、半导体装置、有机el显示装置及显示装置 |
| CN113322714B (zh) * | 2020-02-28 | 2022-12-02 | 中国科学院成都有机化学有限公司 | 一种聚酰亚胺复配型抗高温老化助剂及其绝缘纸和制备方法 |
| CN111849399A (zh) * | 2020-06-16 | 2020-10-30 | 廖铁仙 | 一种半导体装置的散热组合物及其制备方法 |
| WO2022051645A2 (en) | 2020-09-04 | 2022-03-10 | Corning Incorporated | Ultraviolet light-blocking coated pharmaceutical packages |
| WO2022261654A1 (en) * | 2021-06-10 | 2022-12-15 | Zymergen Inc. | Optically transparent polyimide |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0337412B1 (en) | 1988-04-15 | 1995-07-05 | E.I. Du Pont De Nemours And Company | Encapsulant composition |
| US5093036A (en) | 1988-09-20 | 1992-03-03 | Raychem Corporation | Conductive polymer composition |
| US5302412A (en) * | 1989-02-03 | 1994-04-12 | The Boc Group, Inc. | Single atmosphere for firing compatible thick film material |
| US5071997A (en) | 1989-07-20 | 1991-12-10 | University Of Akron | Polyimides comprising substituted benzidines |
| JPH03129701A (ja) | 1989-09-19 | 1991-06-03 | Mitsubishi Electric Corp | 抵抗体装置 |
| JPH0461703A (ja) | 1990-06-27 | 1992-02-27 | Haisoole Kk | 印刷用導電性ペースト |
| US5202412A (en) * | 1990-10-02 | 1993-04-13 | E. I. Du Pont De Nemours And Company | Polyimide copolymer precursors |
| US5275750A (en) | 1991-07-18 | 1994-01-04 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing a solid polymer electrolyte |
| US5268497A (en) * | 1992-02-24 | 1993-12-07 | The Boc Group, Inc. | Process for the production of nitriles |
| AU2466092A (en) | 1992-07-22 | 1994-02-14 | Michael F. Lucey | Highly filled polymeric compositions |
| DE69305942T2 (de) | 1992-09-15 | 1997-03-13 | Du Pont | Zusammensetzung für einen Polymer-Dickschichtwiderstand |
| DE4335323A1 (de) | 1993-10-18 | 1995-04-20 | Basf Lacke & Farben | Lösungen von polyimidbildenden Substanzen und deren Verwendung |
| JP3117175B2 (ja) | 1994-02-09 | 2000-12-11 | アルプス電気株式会社 | 抵抗体 |
| US5426071A (en) | 1994-03-04 | 1995-06-20 | E. I. Du Pont De Nemours And Company | Polyimide copolymer film for lift-off metallization |
| JPH09118825A (ja) * | 1995-10-24 | 1997-05-06 | Shin Etsu Chem Co Ltd | ポリイミド樹脂組成物 |
| EP0875906B1 (en) * | 1997-04-30 | 2004-04-07 | JSR Corporation | Electronic part and process for manufacturing the same |
| US5993698A (en) | 1997-11-06 | 1999-11-30 | Acheson Industries, Inc. | Electrical device containing positive temperature coefficient resistor composition and method of manufacturing the device |
| JP2000164403A (ja) | 1998-11-24 | 2000-06-16 | Matsushita Electric Ind Co Ltd | 耐熱抵抗体ペーストおよび耐熱抵抗体と耐熱抵抗体の製造方法 |
| US6030553A (en) | 1999-04-01 | 2000-02-29 | Industrial Technology Research Institute | Polymer thick film resistor pastes |
| US7018776B2 (en) * | 2002-12-12 | 2006-03-28 | Arch Specialty Chemicals, Inc. | Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems |
-
2004
- 2004-02-19 US US10/782,326 patent/US7348373B2/en not_active Expired - Fee Related
- 2004-11-15 DE DE602004024758T patent/DE602004024758D1/de not_active Expired - Lifetime
- 2004-11-15 EP EP04027061A patent/EP1553134B1/en not_active Expired - Lifetime
-
2005
- 2005-01-07 JP JP2005002744A patent/JP2005325332A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP1553134A2 (en) | 2005-07-13 |
| US7348373B2 (en) | 2008-03-25 |
| US20050154181A1 (en) | 2005-07-14 |
| JP2005325332A (ja) | 2005-11-24 |
| EP1553134A3 (en) | 2005-09-21 |
| EP1553134B1 (en) | 2009-12-23 |
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| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| R082 | Change of representative |
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