DE60143881D1 - Vorrichtung zur Erzeugung von feinen Mustern - Google Patents
Vorrichtung zur Erzeugung von feinen MusternInfo
- Publication number
- DE60143881D1 DE60143881D1 DE60143881T DE60143881T DE60143881D1 DE 60143881 D1 DE60143881 D1 DE 60143881D1 DE 60143881 T DE60143881 T DE 60143881T DE 60143881 T DE60143881 T DE 60143881T DE 60143881 D1 DE60143881 D1 DE 60143881D1
- Authority
- DE
- Germany
- Prior art keywords
- fine patterns
- producing fine
- producing
- patterns
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/02—Ink jet characterised by the jet generation process generating a continuous ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1034—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves specially designed for conducting intermittent application of small quantities, e.g. drops, of coating material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Coating Apparatus (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Nozzles (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Liquid Crystal (AREA)
- Optical Filters (AREA)
- Electrostatic Spraying Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000220421 | 2000-07-21 | ||
JP2000220420 | 2000-07-21 | ||
JP2000220410 | 2000-07-21 | ||
JP2001010188A JP4690556B2 (ja) | 2000-07-21 | 2001-01-18 | 微細パターン形成装置と微細ノズルの製造方法 |
PCT/JP2001/006353 WO2002011182A2 (fr) | 2000-07-21 | 2001-07-23 | Technique de dessin a motifs fins |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60143881D1 true DE60143881D1 (de) | 2011-03-03 |
Family
ID=27481473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60143881T Expired - Lifetime DE60143881D1 (de) | 2000-07-21 | 2001-07-23 | Vorrichtung zur Erzeugung von feinen Mustern |
Country Status (6)
Country | Link |
---|---|
US (1) | US6767473B2 (de) |
EP (1) | EP1253626B1 (de) |
JP (1) | JP4690556B2 (de) |
KR (2) | KR100591721B1 (de) |
DE (1) | DE60143881D1 (de) |
WO (1) | WO2002011182A2 (de) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7041257B2 (en) * | 2001-09-25 | 2006-05-09 | Cytonome, Inc. | Microfabricated two-pin liquid sample dispensing system |
US7258839B2 (en) * | 2001-12-21 | 2007-08-21 | Cytonome, Inc. | Temperature controlled microfabricated two-pin liquid sample dispensing system |
US20040108061A1 (en) * | 2002-12-06 | 2004-06-10 | Eastman Kodak Company | Apparatus and method for making a light-emitting display |
EP1592049A1 (de) | 2003-02-05 | 2005-11-02 | Sel Semiconductor Energy Laboratory Co., Ltd. | Prozess zur display-herstellung |
JPWO2004070809A1 (ja) * | 2003-02-06 | 2006-05-25 | 株式会社半導体エネルギー研究所 | 表示装置の作製方法 |
CN100392828C (zh) | 2003-02-06 | 2008-06-04 | 株式会社半导体能源研究所 | 显示装置的制造方法 |
KR101145350B1 (ko) | 2003-02-06 | 2012-05-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체장치 및 표시장치의 제조 방법 |
US20050271804A1 (en) * | 2004-06-07 | 2005-12-08 | Hsin-Wei Lin | Manufacturing method of color filter film and image sensor device |
US20050274772A1 (en) * | 2004-06-14 | 2005-12-15 | Nelson Curtis L | Treating an area to increase affinity for a fluid |
US20060062899A1 (en) * | 2004-09-17 | 2006-03-23 | Eastman Kodak Company | Method of discontinuous stripe coating |
US7160391B2 (en) * | 2004-10-20 | 2007-01-09 | The Procter & Gamble Company | Electrostatic nozzle apparatus |
JP2006138911A (ja) * | 2004-11-10 | 2006-06-01 | Dainippon Screen Mfg Co Ltd | パターン形成方法およびパターン形成装置 |
WO2006062092A1 (ja) | 2004-12-07 | 2006-06-15 | Sharp Kabushiki Kaisha | インクジェットヘッドおよびインクジェットヘッドの製造方法 |
US7296871B2 (en) * | 2004-12-29 | 2007-11-20 | Lexmark International, Inc. | Device and structure arrangements for integrated circuits and methods for analyzing the same |
JP4489649B2 (ja) * | 2005-07-20 | 2010-06-23 | シャープ株式会社 | インクジェットヘッドの製造方法 |
JP2007216139A (ja) * | 2006-02-16 | 2007-08-30 | Alps Electric Co Ltd | 糊状接合剤の塗布装置 |
US7437820B2 (en) * | 2006-05-11 | 2008-10-21 | Eastman Kodak Company | Method of manufacturing a charge plate and orifice plate for continuous ink jet printers |
US7552534B2 (en) * | 2006-05-11 | 2009-06-30 | Eastman Kodak Company | Method of manufacturing an integrated orifice plate and electroformed charge plate |
KR101382738B1 (ko) * | 2007-01-10 | 2014-04-08 | 엘지전자 주식회사 | 정전 분무를 이용한 패턴 형성 장치와 방법 및, 표시패널의 제조 방법 |
US8105644B2 (en) * | 2007-03-08 | 2012-01-31 | Nitto Denko Corporation | Manufacturing method of printed circuit board |
JP2008238023A (ja) * | 2007-03-27 | 2008-10-09 | Seiko Epson Corp | 吐出装置および液状体配置方法 |
US8931431B2 (en) * | 2009-03-25 | 2015-01-13 | The Regents Of The University Of Michigan | Nozzle geometry for organic vapor jet printing |
JP2009184366A (ja) * | 2009-05-28 | 2009-08-20 | National Institute Of Advanced Industrial & Technology | 一括転写型インクジェット用ノズルプレート |
JP5901010B2 (ja) * | 2010-12-27 | 2016-04-06 | 株式会社Sat | 太陽電池集電極形成装置及びその方法と塗布ヘッド |
KR101068113B1 (ko) * | 2011-05-31 | 2011-09-27 | 주식회사 아바텍 | 유리기판 에칭장치 |
JP5854193B2 (ja) * | 2011-08-24 | 2016-02-09 | セイコーエプソン株式会社 | 液体噴射ヘッド及びこれを有する液体噴射装置 |
US9120190B2 (en) | 2011-11-30 | 2015-09-01 | Palo Alto Research Center Incorporated | Co-extruded microchannel heat pipes |
US10371468B2 (en) | 2011-11-30 | 2019-08-06 | Palo Alto Research Center Incorporated | Co-extruded microchannel heat pipes |
US8875653B2 (en) * | 2012-02-10 | 2014-11-04 | Palo Alto Research Center Incorporated | Micro-extrusion printhead with offset orifices for generating gridlines on non-square substrates |
TWI496625B (zh) * | 2012-06-29 | 2015-08-21 | Univ Nat Taiwan | 塗佈模組 |
JP6033130B2 (ja) * | 2013-03-13 | 2016-11-30 | 新光電気工業株式会社 | プローブガイド板及びその製造方法 |
WO2014178818A1 (en) * | 2013-04-29 | 2014-11-06 | Hewlett-Packard Development Company, L.P. | Selective slot coating |
KR102059136B1 (ko) * | 2013-06-13 | 2020-02-10 | 삼성디스플레이 주식회사 | 프린트 장치 |
JP6999870B2 (ja) * | 2015-12-08 | 2022-01-19 | セイコーエプソン株式会社 | 液体噴射ユニットおよび液体噴射装置 |
DE102016000390A1 (de) * | 2016-01-14 | 2017-07-20 | Dürr Systems Ag | Lochplatte mit vergrößertem Lochabstand in einem oder beiden Randbereichen einer Düsenreihe |
DE102016000356A1 (de) * | 2016-01-14 | 2017-07-20 | Dürr Systems Ag | Lochplatte mit reduziertem Durchmesser in einem oder beiden Randbereichen einer Düsenreihe |
GB201702027D0 (en) * | 2017-02-08 | 2017-03-22 | Highcon Systems Ltd | Multi-orifice nozzle and uses thereof |
KR101822927B1 (ko) | 2017-06-23 | 2018-03-15 | 한국과학기술원 | 마이크로 노즐 어레이, 그 제조 방법 및 마이크로 노즐 어레이를 이용한 공기 청정 장치 |
US11673409B2 (en) * | 2019-02-01 | 2023-06-13 | Xtpl S.A. | Fluid printing apparatus |
WO2022067350A1 (en) * | 2020-09-28 | 2022-03-31 | Axalta Coating Systems Gmbh | Nozzle plate comprising borosilicate glass |
CN112221852B (zh) * | 2020-10-10 | 2022-04-05 | 湖南亿等新能源有限公司 | 一种锂电池极片涂布生产加工系统 |
IT202100015842A1 (it) * | 2021-06-17 | 2022-12-17 | General Dosing Srl | Dispositivo e gruppo di erogazione di materiale fluido |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4047184A (en) * | 1976-01-28 | 1977-09-06 | International Business Machines Corporation | Charge electrode array and combination for ink jet printing and method of manufacture |
DE3275447D1 (en) * | 1982-07-03 | 1987-03-19 | Ibm Deutschland | Process for the formation of grooves having essentially vertical lateral silicium walls by reactive ion etching |
US4601777A (en) * | 1985-04-03 | 1986-07-22 | Xerox Corporation | Thermal ink jet printhead and process therefor |
JPH0643133B2 (ja) * | 1985-06-19 | 1994-06-08 | 株式会社リコー | インクジエツトヘツドの帯電防止処理方法 |
JPS6287356A (ja) * | 1985-10-15 | 1987-04-21 | Olympus Optical Co Ltd | マルチ素子インクジエツトプリンタ− |
JPH0245154A (ja) * | 1988-08-05 | 1990-02-15 | Ricoh Co Ltd | インクジェット記録装置 |
JPH04338548A (ja) * | 1991-05-16 | 1992-11-25 | Tokyo Electric Co Ltd | インクジェットプリンタ |
US5387314A (en) * | 1993-01-25 | 1995-02-07 | Hewlett-Packard Company | Fabrication of ink fill slots in thermal ink-jet printheads utilizing chemical micromachining |
JPH0834635A (ja) * | 1994-07-27 | 1996-02-06 | Hoya Corp | マイクロチャンネルプレート用融着ガラス |
JPH0871477A (ja) * | 1994-08-31 | 1996-03-19 | Nec Corp | ノズル容器 |
US5905517A (en) * | 1995-04-12 | 1999-05-18 | Eastman Kodak Company | Heater structure and fabrication process for monolithic print heads |
JPH0957981A (ja) * | 1995-08-22 | 1997-03-04 | Seiko Epson Corp | インクジェットヘッド用ノズルプレート及びその製造方法 |
US5658471A (en) * | 1995-09-22 | 1997-08-19 | Lexmark International, Inc. | Fabrication of thermal ink-jet feed slots in a silicon substrate |
JP2842343B2 (ja) * | 1995-10-26 | 1999-01-06 | 日本電気株式会社 | 静電式インクジェット記録装置 |
JP3511762B2 (ja) * | 1995-11-16 | 2004-03-29 | 松下電器産業株式会社 | インクジェット記録ヘッドの製造方法 |
EP0841167B1 (de) * | 1996-11-11 | 2004-09-15 | Canon Kabushiki Kaisha | Verfahren zur Herstellung eines Durchgangslochs, Gebrauch dieses Verfahrens zur Herstellung eines Slikonsubstrates mit einem solchen Durchgangsloch oder eine Vorrichtung mit diesem Substrat, Verfahren zur Herstellung eines Tintenstrahl-Druckkopfes und Gebrauch dieses Verfahrens zur Herstellung eines Tintenstrahldruckkopfes |
WO1998051506A1 (fr) | 1997-05-14 | 1998-11-19 | Seiko Epson Corporation | Procede de formation d'ajutage pour injecteurs et procede de fabrication d'une tete a jet d'encre |
JPH11239748A (ja) | 1998-02-25 | 1999-09-07 | Toray Ind Inc | 凹凸基材への塗液の塗布装置および方法並びにプラズマディスプレイの製造装置および方法 |
JPH11290746A (ja) * | 1998-04-07 | 1999-10-26 | Musashi Eng Co Ltd | 流体の吐出路構造 |
CH694453A5 (de) * | 1998-07-24 | 2005-01-31 | Genspec Sa | Mikromechanisch hergestellte Düse zur Erzeugung reproduzierbarer Tröpfchen. |
JP2000189873A (ja) | 1998-12-28 | 2000-07-11 | Dainippon Printing Co Ltd | 高粘度物質吐出タイミング制御方法および制御装置 |
JP3986039B2 (ja) * | 1998-12-03 | 2007-10-03 | キヤノン株式会社 | 液体吐出ヘッドの製造方法、液体吐出ヘッド、ヘッドカートリッジおよび液体吐出記録装置 |
US6386686B1 (en) * | 1998-12-03 | 2002-05-14 | Canon Kabushiki Kaisha | Liquid discharge head, manufacturing method of liquid discharge head, head cartridge, and liquid discharge apparatus |
JP2000167463A (ja) * | 1998-12-08 | 2000-06-20 | Toray Ind Inc | ノズル並びに塗液の塗布装置および塗布方法並びにプラズマディスプレイパネル用部材の製造方法 |
-
2001
- 2001-01-18 JP JP2001010188A patent/JP4690556B2/ja not_active Expired - Fee Related
- 2001-07-23 EP EP01951979A patent/EP1253626B1/de not_active Expired - Lifetime
- 2001-07-23 WO PCT/JP2001/006353 patent/WO2002011182A2/ja not_active Application Discontinuation
- 2001-07-23 KR KR1020057006611A patent/KR100591721B1/ko not_active IP Right Cessation
- 2001-07-23 US US10/088,685 patent/US6767473B2/en not_active Expired - Lifetime
- 2001-07-23 DE DE60143881T patent/DE60143881D1/de not_active Expired - Lifetime
- 2001-07-23 KR KR10-2002-7003706A patent/KR100508541B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1253626B1 (de) | 2011-01-19 |
KR20020041442A (ko) | 2002-06-01 |
EP1253626A2 (de) | 2002-10-30 |
JP2002096474A (ja) | 2002-04-02 |
WO2002011182A2 (fr) | 2002-02-07 |
WO2002011182A3 (fr) | 2002-08-22 |
KR20050070064A (ko) | 2005-07-05 |
KR100508541B1 (ko) | 2005-08-17 |
US20020166232A1 (en) | 2002-11-14 |
JP4690556B2 (ja) | 2011-06-01 |
EP1253626A4 (de) | 2005-08-10 |
US6767473B2 (en) | 2004-07-27 |
KR100591721B1 (ko) | 2006-06-22 |
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