DE60142385D1 - Maske zur Herstellung von Bildschirmen - Google Patents

Maske zur Herstellung von Bildschirmen

Info

Publication number
DE60142385D1
DE60142385D1 DE60142385T DE60142385T DE60142385D1 DE 60142385 D1 DE60142385 D1 DE 60142385D1 DE 60142385 T DE60142385 T DE 60142385T DE 60142385 T DE60142385 T DE 60142385T DE 60142385 D1 DE60142385 D1 DE 60142385D1
Authority
DE
Germany
Prior art keywords
screens
mask
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142385T
Other languages
English (en)
Inventor
Chang Nam Kim
Dong Uk Shin
Jong Min Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Display Co Ltd filed Critical LG Display Co Ltd
Application granted granted Critical
Publication of DE60142385D1 publication Critical patent/DE60142385D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Gas-Filled Discharge Tubes (AREA)
DE60142385T 2000-11-28 2001-11-27 Maske zur Herstellung von Bildschirmen Expired - Lifetime DE60142385D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2000-0071327A KR100382491B1 (ko) 2000-11-28 2000-11-28 유기 ｅｌ의 새도우 마스크

Publications (1)

Publication Number Publication Date
DE60142385D1 true DE60142385D1 (de) 2010-07-29

Family

ID=19702008

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60142385T Expired - Lifetime DE60142385D1 (de) 2000-11-28 2001-11-27 Maske zur Herstellung von Bildschirmen

Country Status (6)

Country Link
US (1) US6866720B2 (de)
EP (1) EP1209522B1 (de)
JP (1) JP2002221912A (de)
KR (1) KR100382491B1 (de)
CN (1) CN1209681C (de)
DE (1) DE60142385D1 (de)

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KR100848972B1 (ko) * 2001-08-24 2008-07-30 다이니폰 인사츠 가부시키가이샤 진공증착용 다면부착 마스크장치
KR100490534B1 (ko) * 2001-12-05 2005-05-17 삼성에스디아이 주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
KR100472012B1 (ko) * 2001-12-17 2005-03-08 조수제 섀도우 마스크 및 그 제조 방법
US20030151118A1 (en) * 2002-02-14 2003-08-14 3M Innovative Properties Company Aperture masks for circuit fabrication
US6821348B2 (en) * 2002-02-14 2004-11-23 3M Innovative Properties Company In-line deposition processes for circuit fabrication
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
US6727125B2 (en) * 2002-04-17 2004-04-27 Sharp Laboratories Of America, Inc. Multi-pattern shadow mask system and method for laser annealing
KR100813832B1 (ko) * 2002-05-31 2008-03-17 삼성에스디아이 주식회사 증착용 마스크 프레임 조립체와 이의 제조방법
CN100464440C (zh) * 2002-06-03 2009-02-25 三星移动显示器株式会社 用于有机电致发光装置的薄层真空蒸发的掩模框组件
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
KR100480705B1 (ko) * 2002-07-03 2005-04-06 엘지전자 주식회사 유기 ｅｌ 소자 제작용 새도우 마스크 및 그 제조 방법
KR100499476B1 (ko) * 2002-07-22 2005-07-05 엘지전자 주식회사 유기 ｅｌ 소자의 새도우 마스크
US6729927B2 (en) * 2002-08-01 2004-05-04 Eastman Kodak Company Method and apparatus for making a shadow mask array
KR100698044B1 (ko) * 2002-10-19 2007-03-23 엘지.필립스 엘시디 주식회사 마스크 설계 방법 및 패널 형성 방법
KR100463532B1 (ko) * 2002-10-22 2004-12-29 엘지전자 주식회사 대면적 풀-컬러 디스플레이 패널의 제작방법
US6926840B2 (en) * 2002-12-31 2005-08-09 Eastman Kodak Company Flexible frame for mounting a deposition mask
JP4089632B2 (ja) * 2003-03-07 2008-05-28 セイコーエプソン株式会社 マスクの製造方法、マスクの製造装置、発光材料の成膜方法
KR100534580B1 (ko) * 2003-03-27 2005-12-07 삼성에스디아이 주식회사 표시장치용 증착 마스크 및 그의 제조방법
JP2005276480A (ja) * 2004-03-23 2005-10-06 Seiko Epson Corp マスク、マスクの製造方法、薄膜パターンの形成方法、電気光学装置の製造方法および電子機器
KR100659057B1 (ko) 2004-07-15 2006-12-21 삼성에스디아이 주식회사 박막 증착용 마스크 프레임 조립체 및 유기 전계 발광표시장치
KR100676177B1 (ko) * 2005-03-22 2007-02-01 엘지전자 주식회사 유기전계발광표시소자의 제조장치
KR100662558B1 (ko) * 2005-12-13 2006-12-28 삼성전자주식회사 마스크 및 이를 이용한 디스플레이장치의 제조방법
WO2007099518A1 (en) * 2006-03-03 2007-09-07 Ecole Polytechnique Federale De Lausanne (Epfl) Stencil mask for accurate pattern replication
KR100775846B1 (ko) * 2006-09-04 2007-11-13 엘지전자 주식회사 디스플레이 소자 제조용 마스크
KR100853544B1 (ko) * 2007-04-05 2008-08-21 삼성에스디아이 주식회사 평판 표시장치 박막 증착용 마스크 프레임 조립체 및 이를이용한 증착장비
KR100947442B1 (ko) 2007-11-20 2010-03-12 삼성모바일디스플레이주식회사 수직 증착형 마스크 제조장치 및 이를 이용한 수직 증착형마스크의 제조방법
TWI398533B (zh) * 2009-12-29 2013-06-11 Au Optronics Corp 蔭罩及其製作方法
KR101182440B1 (ko) * 2010-01-11 2012-09-12 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 조립체
CN102110787B (zh) * 2010-11-05 2012-07-25 四川虹视显示技术有限公司 Oled掩膜板对位方法
KR101759347B1 (ko) * 2010-12-14 2017-08-01 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 조립체 및 그 제조방법
KR101693578B1 (ko) * 2011-03-24 2017-01-10 삼성디스플레이 주식회사 증착 마스크
JP5890252B2 (ja) * 2012-05-30 2016-03-22 日本航空電子工業株式会社 電気コネクタ
US9583363B2 (en) 2012-12-31 2017-02-28 Sunedison Semiconductor Limited (Uen201334164H) Processes and apparatus for preparing heterostructures with reduced strain by radial distension
KR20140109699A (ko) * 2013-03-06 2014-09-16 삼성디스플레이 주식회사 마스크 구조체와 이를 포함하는 마스크 조립체 및 마스크 구조체 제조방법
KR20140125191A (ko) * 2013-04-18 2014-10-28 삼성디스플레이 주식회사 증착 장치
CN103235451A (zh) * 2013-04-23 2013-08-07 北京京东方光电科技有限公司 掩膜板及其制造方法
GB201311738D0 (en) * 2013-06-29 2013-08-14 British Telecomm Apparatus
CN103757589A (zh) * 2014-01-23 2014-04-30 上海和辉光电有限公司 掩膜装置、制造该掩膜装置的系统以及方法
US10323316B2 (en) * 2014-10-17 2019-06-18 Advantech Global, Ltd Multi-mask alignment system and method
US10745796B2 (en) * 2014-10-17 2020-08-18 Advantech Global, Ltd Multi-mask alignment system and method
CN105986225A (zh) * 2015-02-16 2016-10-05 上海和辉光电有限公司 Oled蒸镀用的屏蔽层及其制作方法
KR102404575B1 (ko) * 2015-10-12 2022-06-03 삼성디스플레이 주식회사 증착 장치와 이를 이용한 유기 발광 디스플레이 장치의 제조 방법
CN105568217B (zh) 2016-01-06 2017-12-05 京东方科技集团股份有限公司 金属掩模板及其制作方法
CN106527041B (zh) 2016-10-10 2018-10-09 南京中电熊猫液晶显示科技有限公司 掩膜版及其曝光方法、以及液晶显示面板
CN110767689B (zh) * 2018-10-31 2022-08-16 云谷（固安）科技有限公司 掩膜板、显示面板、其制备方法及显示终端
JP7487481B2 (ja) 2019-02-06 2024-05-21 大日本印刷株式会社 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法
CN109750257B (zh) * 2019-03-26 2021-03-26 京东方科技集团股份有限公司 掩膜板及其制造方法
KR101999360B1 (ko) * 2019-05-14 2019-07-11 주식회사 핌스 박막 증착용 마스크 조립체를 위한 복합 프레임 요소 및 그 제조 방법
CN111020477B (zh) * 2019-11-29 2021-12-21 武汉天马微电子有限公司 一种掩膜装置、蒸镀方法及显示面板
KR20210091382A (ko) * 2020-01-13 2021-07-22 삼성디스플레이 주식회사 마스크, 이의 제조 방법, 및 표시 패널 제조 방법
KR20220034993A (ko) * 2020-09-11 2022-03-21 삼성디스플레이 주식회사 증착 장치 및 증착 장치의 마스크 착좌 방법
KR102435235B1 (ko) * 2020-10-07 2022-08-24 주식회사 효산 마스크의 제조 방법 및 마스크
CN115747714A (zh) * 2022-11-24 2023-03-07 黄石全洋光电科技有限公司 一种具有分离式网框的张网机及其张网加工方法

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Also Published As

Publication number Publication date
EP1209522A2 (de) 2002-05-29
JP2002221912A (ja) 2002-08-09
EP1209522B1 (de) 2010-06-16
EP1209522A3 (de) 2004-09-29
KR100382491B1 (ko) 2003-05-09
CN1209681C (zh) 2005-07-06
US6866720B2 (en) 2005-03-15
CN1362642A (zh) 2002-08-07
US20020062785A1 (en) 2002-05-30
KR20020041654A (ko) 2002-06-03

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