DE60139149D1 - Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels - Google Patents

Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels

Info

Publication number
DE60139149D1
DE60139149D1 DE60139149T DE60139149T DE60139149D1 DE 60139149 D1 DE60139149 D1 DE 60139149D1 DE 60139149 T DE60139149 T DE 60139149T DE 60139149 T DE60139149 T DE 60139149T DE 60139149 D1 DE60139149 D1 DE 60139149D1
Authority
DE
Germany
Prior art keywords
abrasive
producing
cumulative
volume
particle size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60139149T
Other languages
German (de)
English (en)
Inventor
Katsura Ito
Hiroshi Saegusa
Tomoyuki Masuda
Fumio Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000378119A external-priority patent/JP4885352B2/ja
Priority claimed from JP2001107311A external-priority patent/JP4807905B2/ja
Application filed by Showa Denko KK filed Critical Showa Denko KK
Application granted granted Critical
Publication of DE60139149D1 publication Critical patent/DE60139149D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
DE60139149T 2000-12-12 2001-12-11 Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels Expired - Lifetime DE60139149D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000378119A JP4885352B2 (ja) 2000-12-12 2000-12-12 研磨材スラリー及び研磨微粉
JP2001107311A JP4807905B2 (ja) 2001-04-05 2001-04-05 研磨材スラリー及び研磨微粉
PCT/JP2001/010850 WO2002048279A1 (en) 2000-12-12 2001-12-11 Abrasive, abrasive slurry, and method for manufacturing abrasive

Publications (1)

Publication Number Publication Date
DE60139149D1 true DE60139149D1 (de) 2009-08-13

Family

ID=26605714

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60139149T Expired - Lifetime DE60139149D1 (de) 2000-12-12 2001-12-11 Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels

Country Status (5)

Country Link
EP (1) EP1350827B1 (OSRAM)
AT (1) ATE435267T1 (OSRAM)
DE (1) DE60139149D1 (OSRAM)
TW (1) TWI292780B (OSRAM)
WO (1) WO2002048279A1 (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004128069A (ja) 2002-09-30 2004-04-22 Fujimi Inc 研磨用組成物及びそれを用いた研磨方法
AU2003275655A1 (en) * 2002-10-25 2004-05-13 Showa Denko K.K. Polishing slurry and polished substrate
TW200724633A (en) 2005-09-30 2007-07-01 Saint Gobain Ceramics Polishing slurries and methods for utilizing same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2783330B2 (ja) 1989-11-01 1998-08-06 株式会社フジミインコーポレーテッド ガラス研磨用研磨材
JPH08252766A (ja) * 1995-03-17 1996-10-01 Fuji Electric Co Ltd 研磨砥粒およびこの研磨砥粒を用いて製造された磁気ディスク
US6294490B1 (en) * 1998-03-13 2001-09-25 Hoya Corporation Crystallized glass for information recording medium, crystallized glass substrate, and information recording medium using the crystallized glass substrate
JP3531906B2 (ja) * 1998-11-26 2004-05-31 三井金属鉱業株式会社 磁気記録媒体用結晶化ガラス基板の製造方法
JP4284771B2 (ja) * 1999-08-31 2009-06-24 住友化学株式会社 金属研磨用αアルミナ研磨材およびその製法
US6454820B2 (en) * 2000-02-03 2002-09-24 Kao Corporation Polishing composition
JP4251516B2 (ja) * 2000-05-12 2009-04-08 花王株式会社 研磨液組成物

Also Published As

Publication number Publication date
TWI292780B (OSRAM) 2008-01-21
ATE435267T1 (de) 2009-07-15
EP1350827A4 (en) 2007-06-06
EP1350827B1 (en) 2009-07-01
WO2002048279A1 (en) 2002-06-20
EP1350827A1 (en) 2003-10-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: HEYER, V., DIPL.-PHYS. DR.RER.NAT., PAT.-ANW., 806