ATE435267T1 - Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels - Google Patents
Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittelsInfo
- Publication number
- ATE435267T1 ATE435267T1 AT01270578T AT01270578T ATE435267T1 AT E435267 T1 ATE435267 T1 AT E435267T1 AT 01270578 T AT01270578 T AT 01270578T AT 01270578 T AT01270578 T AT 01270578T AT E435267 T1 ATE435267 T1 AT E435267T1
- Authority
- AT
- Austria
- Prior art keywords
- abrasive
- producing
- cumulative
- volume
- particle size
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
- B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000378119A JP4885352B2 (ja) | 2000-12-12 | 2000-12-12 | 研磨材スラリー及び研磨微粉 |
JP2001107311A JP4807905B2 (ja) | 2001-04-05 | 2001-04-05 | 研磨材スラリー及び研磨微粉 |
PCT/JP2001/010850 WO2002048279A1 (fr) | 2000-12-12 | 2001-12-11 | Abrasif, boue abrasive, et procede de fabrication d'un abrasif |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE435267T1 true ATE435267T1 (de) | 2009-07-15 |
Family
ID=26605714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01270578T ATE435267T1 (de) | 2000-12-12 | 2001-12-11 | Schleifmittel, schleifmittelsuspension sowie verfahren zur herstellung eines schleifmittels |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1350827B1 (de) |
AT (1) | ATE435267T1 (de) |
DE (1) | DE60139149D1 (de) |
TW (1) | TWI292780B (de) |
WO (1) | WO2002048279A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004128069A (ja) | 2002-09-30 | 2004-04-22 | Fujimi Inc | 研磨用組成物及びそれを用いた研磨方法 |
US20050287931A1 (en) * | 2002-10-25 | 2005-12-29 | Showa Denko K.K. | Polishing slurry and polished substrate |
EP1928966A2 (de) | 2005-09-30 | 2008-06-11 | Saint-Gobain Ceramics and Plastics, Inc. | Polierschlämme und ihre verwendung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2783330B2 (ja) | 1989-11-01 | 1998-08-06 | 株式会社フジミインコーポレーテッド | ガラス研磨用研磨材 |
JPH08252766A (ja) * | 1995-03-17 | 1996-10-01 | Fuji Electric Co Ltd | 研磨砥粒およびこの研磨砥粒を用いて製造された磁気ディスク |
EP0941973B1 (de) * | 1998-03-13 | 2005-11-30 | Hoya Corporation | Kristallisiertes Glas-Substrat, und Informationsaufzeichnungsmedium unter Verwendung des kristallisierten Glas-Substrats |
JP3531906B2 (ja) * | 1998-11-26 | 2004-05-31 | 三井金属鉱業株式会社 | 磁気記録媒体用結晶化ガラス基板の製造方法 |
JP4284771B2 (ja) * | 1999-08-31 | 2009-06-24 | 住友化学株式会社 | 金属研磨用αアルミナ研磨材およびその製法 |
US6454820B2 (en) * | 2000-02-03 | 2002-09-24 | Kao Corporation | Polishing composition |
JP4251516B2 (ja) * | 2000-05-12 | 2009-04-08 | 花王株式会社 | 研磨液組成物 |
-
2001
- 2001-11-28 TW TW090129453A patent/TWI292780B/zh not_active IP Right Cessation
- 2001-12-11 EP EP01270578A patent/EP1350827B1/de not_active Expired - Lifetime
- 2001-12-11 DE DE60139149T patent/DE60139149D1/de not_active Expired - Lifetime
- 2001-12-11 WO PCT/JP2001/010850 patent/WO2002048279A1/ja active Application Filing
- 2001-12-11 AT AT01270578T patent/ATE435267T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1350827A1 (de) | 2003-10-08 |
EP1350827A4 (de) | 2007-06-06 |
TWI292780B (de) | 2008-01-21 |
DE60139149D1 (de) | 2009-08-13 |
EP1350827B1 (de) | 2009-07-01 |
WO2002048279A1 (fr) | 2002-06-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |