DE60132089D1 - Vorrichtung zur behandlung von gasen miitels plasma - Google Patents

Vorrichtung zur behandlung von gasen miitels plasma

Info

Publication number
DE60132089D1
DE60132089D1 DE60132089T DE60132089T DE60132089D1 DE 60132089 D1 DE60132089 D1 DE 60132089D1 DE 60132089 T DE60132089 T DE 60132089T DE 60132089 T DE60132089 T DE 60132089T DE 60132089 D1 DE60132089 D1 DE 60132089D1
Authority
DE
Germany
Prior art keywords
miitels
gasen
plasma
treating
treating gasen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60132089T
Other languages
English (en)
Other versions
DE60132089T2 (de
Inventor
Toshiaki Ishikawa
Ryohei Hm Itatani
Mikio Deguchi
Bencherki Mebarki
Toshihiko Toda
Heitaro Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Plasma Technology Co Ltd
Original Assignee
Adtec Plasma Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Plasma Technology Co Ltd filed Critical Adtec Plasma Technology Co Ltd
Publication of DE60132089D1 publication Critical patent/DE60132089D1/de
Application granted granted Critical
Publication of DE60132089T2 publication Critical patent/DE60132089T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/70—Organic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2062—Bromine compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2064—Chlorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
DE60132089T 2000-05-29 2001-05-28 Vorrichtung zur behandlung von gasen miitels plasma Expired - Lifetime DE60132089T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000157936 2000-05-29
JP2000157936 2000-05-29
JP2001120454 2001-04-19
JP2001120454 2001-04-19
PCT/JP2001/004437 WO2001091896A1 (fr) 2000-05-29 2001-05-28 Appareil de traitement d'objets et dispositif a plasma dote de cet appareil

Publications (2)

Publication Number Publication Date
DE60132089D1 true DE60132089D1 (de) 2008-02-07
DE60132089T2 DE60132089T2 (de) 2008-12-11

Family

ID=26592779

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60132089T Expired - Lifetime DE60132089T2 (de) 2000-05-29 2001-05-28 Vorrichtung zur behandlung von gasen miitels plasma

Country Status (6)

Country Link
US (1) US7378062B2 (de)
EP (1) EP1297891B9 (de)
JP (1) JP4796733B2 (de)
KR (1) KR100755241B1 (de)
DE (1) DE60132089T2 (de)
WO (1) WO2001091896A1 (de)

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* Cited by examiner, † Cited by third party
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FR2825295B1 (fr) * 2001-05-31 2004-05-28 Air Liquide Application des plasmas denses crees a pression atmospherique au traitement d'effluents gazeux
CA2513327A1 (en) * 2003-01-31 2004-08-12 Dow Corning Ireland Limited Plasma generating electrode assembly
GB0416385D0 (en) * 2004-07-22 2004-08-25 Boc Group Plc Gas abatement
FR2886866B1 (fr) * 2005-06-09 2007-07-20 Air Liquide Procede et dispositif de traitement d'effluents gazeux de procedes industriels
FR2898066B1 (fr) * 2006-03-03 2008-08-15 L'air Liquide Procede de destruction d'effluents
GB0516695D0 (en) 2005-08-15 2005-09-21 Boc Group Plc Microwave plasma reactor
WO2007020374A1 (en) * 2005-08-15 2007-02-22 Edwards Limited Method of treating a gas stream
GB0521944D0 (en) 2005-10-27 2005-12-07 Boc Group Plc Method of treating gas
GB0602506D0 (en) * 2006-02-08 2006-03-22 Boc Group Plc Method of treating a gas stream
US20070267143A1 (en) * 2006-05-16 2007-11-22 Applied Materials, Inc. In situ cleaning of CVD system exhaust
GB0611968D0 (en) * 2006-06-16 2006-07-26 Boc Group Plc Method and apparatus for the removal of fluorine from a gas system
JP5307556B2 (ja) * 2007-01-30 2013-10-02 カンケンテクノ株式会社 ガス処理装置
JP4588726B2 (ja) 2007-02-08 2010-12-01 クリーン・テクノロジー株式会社 排ガス処理装置
JP4941448B2 (ja) * 2007-10-26 2012-05-30 豊田合成株式会社 Ｉｉｉ族窒化物半導体製造装置
JP5194026B2 (ja) * 2007-11-22 2013-05-08 株式会社アドテック プラズマ テクノロジー プラズマ処理装置
JP5501807B2 (ja) * 2009-03-31 2014-05-28 東京エレクトロン株式会社 処理装置
ES2734369T3 (es) * 2010-06-11 2019-12-05 Steris Corp Método para eliminar los esterilizantes gasesos o vaporosos de un gas portador
JP5787284B2 (ja) * 2010-06-30 2015-09-30 国立大学法人名古屋大学 反応種供給装置および表面等処理装置
JP5701525B2 (ja) * 2010-07-09 2015-04-15 エドワーズ株式会社 除害装置及び除害システム
GB2493750A (en) * 2011-08-17 2013-02-20 Edwards Ltd Apparatus for treating a gas stream
US10350572B2 (en) * 2013-03-14 2019-07-16 Florida State University Research Foundation, Inc. Simultaneous on-site production of hydrogen peroxide and nitrogen oxides from air and water in a low power flowing liquid film plasma discharge for use in agriculture
WO2015138921A1 (en) * 2014-03-14 2015-09-17 Florida State University Research Foundation, Inc. Simultaneous on-site production of hydrogen peroxide and nitrogen oxides from air and water in a low power flowing liquid film plasma discharge for use in agriculture
US9861950B2 (en) * 2013-03-14 2018-01-09 Florida State University Research Foundation, Inc. Method for reacting flowing liquid and gas in a plasma discharge reactor
ITRM20130216A1 (it) * 2013-04-10 2014-10-11 Vivex Engineering Ltd Dispositivo generatore di plasma freddo e relativo metodo di produzione di acido nitrico e di acido solforico.
ITRM20130214A1 (it) * 2013-04-10 2014-10-11 Vivex Engineering Ltd Dispositivo generatore di plasma freddo e relativo metodo di produzione di acido nitrico e di acido solforico.
JP6761342B2 (ja) 2013-04-10 2020-09-23 アムリカ メルサンタイル プライベート リミテッド 低温プラズマの発生装置、及び、関連する化学物質を製造するため方法
GB2535528A (en) * 2015-02-23 2016-08-24 Edwards Ltd Apparatus for treating gas
CN106211790B (zh) 2015-03-26 2018-06-22 韩国能源技术研究院 用于难分解性有害气体焚烧处理的节能型燃烧装置及其方法
US10556817B2 (en) 2017-01-30 2020-02-11 Florida State University Research Foundation, Inc. Gas-liquid plasma and bioreactor system and method for remediation of liquids and gases
DE102017001198A1 (de) 2017-02-09 2018-08-09 Audi Ag Vorrichtung zur lonisierung von Luft mit einem Plasmagenerator
US11504669B2 (en) 2017-05-29 2022-11-22 Kanken Techno Co., Ltd. Method for exhaust gas abatement under reduced pressure and apparatus therefor
US10988390B2 (en) 2018-09-28 2021-04-27 Florida State University Research Foundation, Inc. Gas/liquid plasma reactor with pulsed power supply and secondary direct current electrodes
KR102584515B1 (ko) * 2020-07-06 2023-10-05 세메스 주식회사 노즐, 이를 포함하는 기판 처리 장치 및 기판 처리 방법

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JP3095259B2 (ja) 1991-07-16 2000-10-03 彰 水野 Ｎｏの酸化除去方法
US5466424A (en) * 1992-12-28 1995-11-14 Bridgestone Corporation Corona discharge surface treating method
US5560890A (en) * 1993-07-28 1996-10-01 Gas Research Institute Apparatus for gas glow discharge
JP3381320B2 (ja) 1993-08-10 2003-02-24 石川島播磨重工業株式会社 フロンガス処理装置
JP3358382B2 (ja) * 1995-04-10 2002-12-16 株式会社豊田中央研究所 脱臭剤
JPH09148096A (ja) 1995-11-28 1997-06-06 Shinmeiwa Auto Eng Kk フロン分解方法
JP3494797B2 (ja) * 1996-03-29 2004-02-09 株式会社東芝 水蒸気プラズマによる有機ハロゲン化合物の分解装置
JP4010580B2 (ja) * 1996-06-19 2007-11-21 株式会社朝日工業社 放電プラズマを用いた空気中揮発性有機化合物除去装置
US5980701A (en) * 1996-09-09 1999-11-09 Battelle Memorial Institute Corona method and apparatus for altering carbon containing compounds
US6159432A (en) * 1997-01-23 2000-12-12 The Board Of Regents Of The University Of Oklahoma Conversion method for gas streams containing hydrocarbons
US6730275B2 (en) * 1997-09-05 2004-05-04 Battelle Memorial Institute Corona method and apparatus for altering carbon containing compounds
JPH11156156A (ja) * 1997-11-27 1999-06-15 Seiko Epson Corp ハロゲン系ガスの処理方法、処理装置および反応処理装置並びに半導体装置
JP2000133494A (ja) 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法

Also Published As

Publication number Publication date
US7378062B2 (en) 2008-05-27
EP1297891A4 (de) 2004-07-28
EP1297891B1 (de) 2007-12-26
EP1297891A1 (de) 2003-04-02
KR20030022136A (ko) 2003-03-15
JP4796733B2 (ja) 2011-10-19
KR100755241B1 (ko) 2007-09-04
US20040020598A1 (en) 2004-02-05
WO2001091896A1 (fr) 2001-12-06
DE60132089T2 (de) 2008-12-11
EP1297891B9 (de) 2008-07-23

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