DE60143019D1 - Vorrichtung zur behandlung mit ozon - Google Patents

Vorrichtung zur behandlung mit ozon

Info

Publication number
DE60143019D1
DE60143019D1 DE60143019T DE60143019T DE60143019D1 DE 60143019 D1 DE60143019 D1 DE 60143019D1 DE 60143019 T DE60143019 T DE 60143019T DE 60143019 T DE60143019 T DE 60143019T DE 60143019 D1 DE60143019 D1 DE 60143019D1
Authority
DE
Germany
Prior art keywords
ozone
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60143019T
Other languages
English (en)
Inventor
Kazutoshi Yamazaki
Kozo Shirato
Kazuyasu Kawashima
Akira Sato
Akihiko Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000151565A external-priority patent/JP2001330969A/ja
Priority claimed from JP2000241312A external-priority patent/JP4636659B2/ja
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Application granted granted Critical
Publication of DE60143019D1 publication Critical patent/DE60143019D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B01F23/231244—Dissolving, hollow fiber membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
    • B01F23/237613—Ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23126—Diffusers characterised by the shape of the diffuser element
    • B01F23/231267—Diffusers characterised by the shape of the diffuser element being axially stacked discs, rings or plates
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/78—Details relating to ozone treatment devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/19—Degassers
DE60143019T 2000-01-12 2001-01-12 Vorrichtung zur behandlung mit ozon Expired - Lifetime DE60143019D1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000003704 2000-01-12
JP2000136052 2000-05-09
JP2000151565A JP2001330969A (ja) 2000-05-23 2000-05-23 フォトレジスト除去装置
JP2000241312A JP4636659B2 (ja) 2000-08-09 2000-08-09 基盤洗浄装置
PCT/JP2001/000121 WO2001051187A1 (fr) 2000-01-12 2001-01-12 Appareil de traitement d'ozone

Publications (1)

Publication Number Publication Date
DE60143019D1 true DE60143019D1 (de) 2010-10-21

Family

ID=27480915

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60143019T Expired - Lifetime DE60143019D1 (de) 2000-01-12 2001-01-12 Vorrichtung zur behandlung mit ozon

Country Status (6)

Country Link
US (1) US6955758B2 (de)
EP (1) EP1254698B1 (de)
KR (1) KR20020071011A (de)
DE (1) DE60143019D1 (de)
TW (1) TWI280891B (de)
WO (1) WO2001051187A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001330969A (ja) * 2000-05-23 2001-11-30 Sekisui Chem Co Ltd フォトレジスト除去装置
US6939392B2 (en) * 2003-04-04 2005-09-06 United Technologies Corporation System and method for thermal management
US7238085B2 (en) * 2003-06-06 2007-07-03 P.C.T. Systems, Inc. Method and apparatus to process substrates with megasonic energy
US7713331B2 (en) * 2003-11-05 2010-05-11 Rheodyne, Llc Axial transfer line degassing
KR100653427B1 (ko) * 2005-04-27 2006-12-05 김선화 농작물지주대 자동생산방법 및 그 장치
KR100714489B1 (ko) 2005-06-20 2007-05-04 주식회사 오성전자 미앤더드 슬릿 안테나
US7916269B2 (en) * 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
US20090025753A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Lithographic Apparatus And Contamination Removal Or Prevention Method
US9586244B2 (en) 2010-05-01 2017-03-07 Red Bag Solutions System and method for processing waste material
US8425857B2 (en) * 2010-05-01 2013-04-23 Red Bag Solutions System and method for processing waste material
US8414684B2 (en) 2010-06-01 2013-04-09 Dionex Corporation High pressure degas assembly for chromatography system and method
DE102010041827A1 (de) 2010-09-30 2012-04-05 Krones Aktiengesellschaft Verfahren und Produktionsanlage zum Herstellen von Sterilwasser
KR101222491B1 (ko) * 2011-08-01 2013-01-16 한국기계연구원 실리콘 웨이퍼의 배치식 및 연속식 세정용 균일농도 기능수 제조장치 및 방법
US9044712B2 (en) 2011-09-12 2015-06-02 Idex Health & Science, Llc Supersaturated fluid degassing
JP6111029B2 (ja) * 2012-07-28 2017-04-05 猛 大平 液体供給装置及び生体洗浄装置
JP6168271B2 (ja) 2012-08-08 2017-07-26 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP2014194359A (ja) * 2013-03-28 2014-10-09 Kurita Water Ind Ltd 微粒子測定方法及び微粒子測定システム並びに超純水製造システム
CN107112261A (zh) * 2014-12-11 2017-08-29 瑞士艾发科技 尤其用于基体的除气的设备和方法
KR102380261B1 (ko) * 2020-04-20 2022-03-29 에스이엠 주식회사 폐 오존수 처리방법
CN111554566A (zh) * 2020-05-08 2020-08-18 四川广瑞半导体有限公司 一种外延硅片的预处理方法
CA3217446A1 (en) * 2021-05-06 2022-11-10 Mark Max MacKenzie Systems and methods of gas infusion for wastewater treatment

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2655642B1 (fr) * 1989-12-11 1992-02-28 Anjou Rech Installation de traitement des eaux par une boucle de filtration tangentielle.
JPH0647105B2 (ja) * 1989-12-19 1994-06-22 株式会社荏原総合研究所 純水又は超純水の精製方法及び装置
US5061302A (en) * 1990-07-10 1991-10-29 Infilco Degremont Inc. Dissolved gas stripping apparatus
US5366619A (en) * 1993-10-13 1994-11-22 Suntory Limited Germfree drinking water dispenser
JPH07213880A (ja) 1994-01-31 1995-08-15 Japan Gore Tex Inc チューブ状膜
JP3130751B2 (ja) * 1995-01-30 2001-01-31 株式会社荏原製作所 オゾン水製造方法及び装置
JPH0994449A (ja) * 1995-10-02 1997-04-08 Shuzo Matsumura 気液接触反応装置
US5876604A (en) * 1996-10-24 1999-03-02 Compact Membrane Systems, Inc Method of gasifying or degasifying a liquid
JPH10192846A (ja) 1997-01-14 1998-07-28 Yusuke Inoue 溶存酸素富化水の製造装置
JPH10202074A (ja) * 1997-01-21 1998-08-04 Nitto Denko Corp 非対称構造フッ素樹脂チューブ及びこのチューブの製造法及びこのチューブを用いた脱気方法及び脱気装置
US5865995A (en) * 1997-04-02 1999-02-02 Nelson; William R. System for treating liquids with a gas
JPH10277370A (ja) * 1997-04-10 1998-10-20 Nitto Denko Corp スパイラル型膜モジュール
JP3662111B2 (ja) * 1997-06-24 2005-06-22 アルプス電気株式会社 洗浄液の製造方法およびそのための装置
JP3765354B2 (ja) * 1997-09-02 2006-04-12 栗田工業株式会社 水素含有超純水の製造方法
JPH11158494A (ja) 1997-11-27 1999-06-15 Kurita Water Ind Ltd 電子材料用洗浄水
JP3873434B2 (ja) * 1998-02-17 2007-01-24 住友電気工業株式会社 気体溶解用多孔質ポリテトラフルオロエチレン膜を用いた気体溶解モジュール及び気体溶解方法
JPH11333284A (ja) * 1998-05-25 1999-12-07 Nitto Denko Corp 気液接触膜装置
JP3613980B2 (ja) 1998-06-11 2005-01-26 Ｎｏｋ株式会社 膜モジュールの製造方法

Also Published As

Publication number Publication date
EP1254698B1 (de) 2010-09-08
TWI280891B (en) 2007-05-11
WO2001051187A1 (fr) 2001-07-19
EP1254698A4 (de) 2005-10-26
EP1254698A1 (de) 2002-11-06
KR20020071011A (ko) 2002-09-11
US6955758B2 (en) 2005-10-18
US20030116491A1 (en) 2003-06-26

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