DE60128441D1 - Durchlichtschirm und herstellungsverfahren - Google Patents

Durchlichtschirm und herstellungsverfahren

Info

Publication number
DE60128441D1
DE60128441D1 DE60128441T DE60128441T DE60128441D1 DE 60128441 D1 DE60128441 D1 DE 60128441D1 DE 60128441 T DE60128441 T DE 60128441T DE 60128441 T DE60128441 T DE 60128441T DE 60128441 D1 DE60128441 D1 DE 60128441D1
Authority
DE
Germany
Prior art keywords
manufacturing process
real treatment
real
treatment
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60128441T
Other languages
English (en)
Other versions
DE60128441T2 (de
Inventor
Shoichi Uchiyama
Hironori Hasei
Hiroshi Kiguchi
Satoru Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Application granted granted Critical
Publication of DE60128441D1 publication Critical patent/DE60128441D1/de
Publication of DE60128441T2 publication Critical patent/DE60128441T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/54Accessories
    • G03B21/56Projection screens
    • G03B21/60Projection screens characterised by the nature of the surface
    • G03B21/62Translucent screens
    • G03B21/625Lenticular translucent screens
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/005Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0062Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • G02B5/0205Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Overhead Projectors And Projection Screens (AREA)
DE60128441T 2000-07-03 2001-07-03 Durchlichtschirm und herstellungsverfahren Expired - Fee Related DE60128441T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000201273 2000-07-03
JP2000201273 2000-07-03
PCT/JP2001/005774 WO2002003136A1 (fr) 2000-07-03 2001-07-03 Procede de fabrication d'un ecran de transmission et ecran de transmission ainsi fabrique

Publications (2)

Publication Number Publication Date
DE60128441D1 true DE60128441D1 (de) 2007-06-28
DE60128441T2 DE60128441T2 (de) 2008-02-14

Family

ID=18698996

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60128441T Expired - Fee Related DE60128441T2 (de) 2000-07-03 2001-07-03 Durchlichtschirm und herstellungsverfahren

Country Status (6)

Country Link
US (2) US6621637B2 (de)
EP (2) EP1672424A1 (de)
KR (1) KR100521731B1 (de)
CN (1) CN1203367C (de)
DE (1) DE60128441T2 (de)
WO (1) WO2002003136A1 (de)

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US6967779B2 (en) * 1998-04-15 2005-11-22 Bright View Technologies, Inc. Micro-lens array with precisely aligned aperture mask and methods of producing same
AU7899600A (en) * 1999-10-18 2001-04-30 Bolin Sun Large sized rear projection screen
FR2836242B1 (fr) * 2002-02-18 2004-04-30 Synelec Telecom Multimedia Procede de fabrication d'un ecran de retroprojection
JP2005522736A (ja) * 2002-04-12 2005-07-28 デューク ユニヴァーシティー 投射スクリーン装置
KR100570973B1 (ko) * 2003-05-02 2006-04-13 삼성에스디아이 주식회사 광차단용 기판을 구비한 표시장치 및 그의 제조방법
EP1631797A2 (de) 2003-06-05 2006-03-08 CiDra Corporation Geschwindigkeits- und durchflussmessapparat für eine flüssigkeit mit einer unvernachlässigbaren axialen machzahl under verwendung einer sensorreihe
US8031253B2 (en) * 2003-06-24 2011-10-04 Omnivision International Holding, Ltd. Image sensor having micro-lens array separated with ridge structures and method of making
JP4241259B2 (ja) * 2003-08-06 2009-03-18 セイコーエプソン株式会社 マイクロレンズの製造方法
KR100608101B1 (ko) * 2004-03-23 2006-08-02 미래산업 주식회사 유에스비 메모리장치의 테스트 핸들러 및 픽킹장치
US7894139B2 (en) * 2004-04-28 2011-02-22 Panasonic Corporation Imaging apparatus and method for manufacturing microlens array
CN100489652C (zh) * 2004-05-15 2009-05-20 鸿富锦精密工业(深圳)有限公司 显示器屏幕
US7012754B2 (en) * 2004-06-02 2006-03-14 Micron Technology, Inc. Apparatus and method for manufacturing tilted microlenses
US7280278B2 (en) * 2004-06-02 2007-10-09 Micron Technology, Inc. Apparatus and method for manufacturing positive or negative microlenses
JP4340199B2 (ja) * 2004-07-09 2009-10-07 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法
KR100636349B1 (ko) * 2004-09-24 2006-10-19 엘지전자 주식회사 마이크로렌즈 배열 시트 및 그 제작방법
EP1810829B1 (de) * 2004-12-01 2010-07-07 FUJIFILM Corporation Struktur zur Erhöhung des Abstoßeffekts und Herstellungsverfahren dafür, Flüssigkeitsausstoßkopf und Herstellungsverfahren dafür sowie fleckenbeständiger Film
JP2006330631A (ja) * 2005-05-30 2006-12-07 Miraial Kk 背面投射型スクリーン
CN101405637A (zh) * 2005-06-29 2009-04-08 瑞弗莱克塞特公司 校准显微透镜阵列
JP2007148297A (ja) * 2005-11-30 2007-06-14 Hitachi Maxell Ltd バックライト用光学シート、バックライト及び表示装置
JP4948957B2 (ja) * 2006-10-02 2012-06-06 株式会社 日立ディスプレイズ 液晶表示装置
US7808708B2 (en) * 2007-02-01 2010-10-05 Reald Inc. Aperture correction for lenticular screens
US7508589B2 (en) * 2007-02-01 2009-03-24 Real D Soft aperture correction for lenticular screens
JP2010224200A (ja) * 2009-03-24 2010-10-07 Fujifilm Corp レンチキュラープリント形成方法
JP2011081352A (ja) * 2009-09-09 2011-04-21 Fujifilm Corp ウェハレベルレンズの製造方法、ウェハレベルレンズ及び撮像ユニット
US20120134028A1 (en) 2009-08-13 2012-05-31 Fujifilm Corporation Wafer level lens, production method of wafer level lens, and imaging unit
CN102147511B (zh) * 2010-02-10 2014-09-24 新科实业有限公司 制造聚合物微型透镜的方法及具有该聚合物透镜的准直器
JPWO2011155445A1 (ja) * 2010-06-07 2013-08-01 新日鉄住金化学株式会社 レンチキュラレンズの製造方法、レンチキュラレンズ、光学素子、及び立体表示ディスプレイ
KR20130069711A (ko) * 2010-06-07 2013-06-26 신닛테츠 수미킨 가가쿠 가부시키가이샤 렌티큘라 렌즈 시트, 그 제조 방법 및 광학 소자
TWI413585B (zh) * 2010-10-13 2013-11-01 Univ Nat Kaohsiung Applied Sci Method of manufacturing microelements using inkjet technology
JP2013178469A (ja) * 2012-02-03 2013-09-09 Nlt Technologies Ltd 光学素子
US9404797B2 (en) 2012-12-07 2016-08-02 Integrated Plasmonics Corporation Plasmonic spectroscopic sensor and cuvette therefor
US9976963B2 (en) 2012-12-21 2018-05-22 Integrated Plasmonics Corporation Microcuvette cartridge
WO2014158248A1 (en) 2013-03-12 2014-10-02 Integrated Plasmonics Corporation Optical detection system with tilted sensor
US9784986B2 (en) * 2013-03-14 2017-10-10 Integrated Plasmonics Corporation Self-aligned spatial filter
WO2014143235A1 (en) 2013-03-14 2014-09-18 Integrated Plasmonics Corporation Ambient light assisted spectroscopy
US9266352B2 (en) * 2013-08-23 2016-02-23 Xerox Corporation System and method for lenticular image printing and print media
CN107479315A (zh) * 2016-06-08 2017-12-15 深圳市光峰光电技术有限公司 一种影院观影系统
CN107128069B (zh) 2017-04-28 2019-07-02 京东方科技集团股份有限公司 调节喷墨打印装置的方法、喷墨打印方法、装置及其系统

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Publication number Priority date Publication date Assignee Title
US1942841A (en) * 1931-01-19 1934-01-09 Shimizu Takeo Daylight screen
US2378252A (en) 1942-06-30 1945-06-12 Eastman Kodak Co Projection screen
US3552822A (en) 1968-06-07 1971-01-05 Gerald Altman Rear projection screen
JP2513508Y2 (ja) 1989-08-04 1996-10-09 株式会社キクチ科学研究所 投影スクリ―ン
JP2825887B2 (ja) * 1989-12-12 1998-11-18 大日本印刷株式会社 透過形スクリーンとその製造方法
US5563738A (en) * 1993-09-03 1996-10-08 Jenmar Visual Systems Light transmitting and dispersing filter having low reflectance
JP3155717B2 (ja) 1996-10-24 2001-04-16 日本板硝子株式会社 マイクロレンズに対するレーザ加工方法
GB9800668D0 (en) * 1998-01-13 1998-03-11 Nashua Corp Enhanced microlens screens
JP4193225B2 (ja) 1998-03-16 2008-12-10 凸版印刷株式会社 レンチキュラーシートおよびその製造方法
JP3965541B2 (ja) 1998-08-27 2007-08-29 セイコーエプソン株式会社 マイクロレンズアレイの製造方法
US6297911B1 (en) 1998-08-27 2001-10-02 Seiko Epson Corporation Micro lens array, method of fabricating the same, and display device
JP2000108216A (ja) 1998-10-02 2000-04-18 Canon Inc マイクロレンズアレイの製造方法
JP3687366B2 (ja) * 1998-10-23 2005-08-24 セイコーエプソン株式会社 光学基板及びその製造方法並びに表示装置
JP3038329B1 (ja) * 1998-11-24 2000-05-08 日清紡績株式会社 レンチキュラーレンズの製造方法及び該方法によるレンズを用いた立体又は可変印刷物の製造方法

Also Published As

Publication number Publication date
CN1388917A (zh) 2003-01-01
EP1217426B1 (de) 2007-05-16
US20020149709A1 (en) 2002-10-17
EP1672424A1 (de) 2006-06-21
EP1217426A4 (de) 2003-07-16
US6839178B2 (en) 2005-01-04
US6621637B2 (en) 2003-09-16
KR20020029397A (ko) 2002-04-18
EP1217426A1 (de) 2002-06-26
WO2002003136A1 (fr) 2002-01-10
KR100521731B1 (ko) 2005-10-17
US20040012857A1 (en) 2004-01-22
DE60128441T2 (de) 2008-02-14
CN1203367C (zh) 2005-05-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee